Itsuko Sakai

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,672,615
- Issue date Jun 2, 2020
- TOSHIBA MEMORY CORPORATION
- Yosuke Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 10,026,622
- Issue date Jul 17, 2018
- TOSHIBA MEMORY CORPORATION
- Mitsuhiro Omura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 8,580,652
- Issue date Nov 12, 2013
- Kabushiki Kaisha Toshiba
- Atsuko Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge detection method for transparent substrate by detecting non-li...
- Patent number 8,339,615
- Issue date Dec 25, 2012
- Kabushiki Kaisha Toshiba
- Masayuki Dohi
- G01 - MEASURING TESTING
Information Patent Grant
Capacitive coupling plasma processing apparatus
- Patent number 7,767,055
- Issue date Aug 3, 2010
- Tokyo Electron Limited
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method for conservation of processing gases
- Patent number 7,628,931
- Issue date Dec 8, 2009
- Tokyo Electron Limited
- Masashi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,368,876
- Issue date May 6, 2008
- Tokyo Electron Limited
- Toshihiro Hayami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus
- Patent number 7,186,315
- Issue date Mar 6, 2007
- Tokyo Electron Limited
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 7,182,879
- Issue date Feb 27, 2007
- Kabushiki Kaisha Toshiba
- Itsuko Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High speed silicon etching method
- Patent number 7,022,616
- Issue date Apr 4, 2006
- Tokyo Electron Limited
- Takanori Mimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas circulating-processing apparatus
- Patent number 6,938,638
- Issue date Sep 6, 2005
- Kabushiki Kaisha Toshiba
- Hiroshi Kubota
- G05 - CONTROLLING REGULATING
Information Patent Grant
Gas recirculation flow control method and apparatus for use in vacu...
- Patent number 6,782,907
- Issue date Aug 31, 2004
- Ebara Corporation
- Hiroyuki Kawasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus with reduced parasitic capacity and los...
- Patent number 6,780,278
- Issue date Aug 24, 2004
- Kabushiki Kaisha Toshiba
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device using recirculation...
- Patent number 6,689,699
- Issue date Feb 10, 2004
- Kabushiki Kaisha Toshiba
- Itsuko Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method
- Patent number 6,642,149
- Issue date Nov 4, 2003
- Tokyo Electron Limited
- Tomoki Suemasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process apparatus
- Patent number 5,717,294
- Issue date Feb 10, 1998
- Kabushiki Kaisha Toshiba
- Itsuko Sakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged beam apparatus having cleaning function and method of clean...
- Patent number 5,539,211
- Issue date Jul 23, 1996
- Kabushiki Kaisha Toshiba
- Kenji Ohtoshi
- B08 - CLEANING
Information Patent Grant
Charged beam irradiating apparatus having a cleaning means and a me...
- Patent number 5,466,942
- Issue date Nov 14, 1995
- Kabushiki Kaisha Toshiba
- Itsuko Sakai
- B08 - CLEANING
Information Patent Grant
Method of cleaning a charged beam apparatus
- Patent number 5,312,519
- Issue date May 17, 1994
- Kabushiki Kaisha Toshiba
- Itsuko Sakai
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
Plasma Processing Apparatus and Plasma Processing Method
- Publication number 20180012768
- Publication date Jan 11, 2018
- Kabushiki Kaisha Toshiba
- Yosuke SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20170271170
- Publication date Sep 21, 2017
- Kabushiki Kaisha Toshiba
- Mitsuhiro OMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20120315758
- Publication date Dec 13, 2012
- Noriko SAKURAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20110068476
- Publication date Mar 24, 2011
- Atsuko KAWASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE DETECTION METHOD
- Publication number 20100027032
- Publication date Feb 4, 2010
- Kabushiki Kaisha Toshiba
- Masayuki Dohi
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE TRANSFERRING APPARATUS, SUBSTRATE PROCESSING APPARATUS, A...
- Publication number 20070227033
- Publication date Oct 4, 2007
- TOKYO ELECTRON LIMITED
- Yoshiyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device
- Publication number 20060231877
- Publication date Oct 19, 2006
- Keiichi Takenaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor manufacturing apparatus and manufacturing method of s...
- Publication number 20060137988
- Publication date Jun 29, 2006
- Kabushiki Kaisha Toshiba
- Katsunori Yahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20060128093
- Publication date Jun 15, 2006
- Keiichi Takenaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitive coupling plasma processing apparatus
- Publication number 20060118044
- Publication date Jun 8, 2006
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing method for conservation of processing gases
- Publication number 20050279731
- Publication date Dec 22, 2005
- TOKYO ELECTRON LIMITED
- Masashi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050011452
- Publication date Jan 20, 2005
- TOKYO ELECTRON LIMITED
- Toshihiro Hayami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20040244688
- Publication date Dec 9, 2004
- TOKYO ELECTRON LIMITED
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus with reduced parasitic capacity and los...
- Publication number 20040238126
- Publication date Dec 2, 2004
- KABUSHIKI KAISHA TOSHIBA
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device including trench capacitor and manufacturing m...
- Publication number 20040188739
- Publication date Sep 30, 2004
- Keiichi Takenaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20040168766
- Publication date Sep 2, 2004
- Kabushiki Kaisha Toshiba
- Itsuko Sakai
- B08 - CLEANING
Information Patent Application
High speed silicon etching method
- Publication number 20040097079
- Publication date May 20, 2004
- Takanori Mimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma treatment apparatus
- Publication number 20040020431
- Publication date Feb 5, 2004
- TOKYO ELECTRON LIMITED
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20030054647
- Publication date Mar 20, 2003
- Tomoki Suemasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas recirculation flow control method and apparatus for use in vacu...
- Publication number 20020134439
- Publication date Sep 26, 2002
- Hiroyuki Kawasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas circulating-processing apparatus
- Publication number 20020134429
- Publication date Sep 26, 2002
- Hiroshi Kubota
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma processing apparatus with reduced parasitic capacity and los...
- Publication number 20020042204
- Publication date Apr 11, 2002
- Hisataka Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing apparatus and method for manufacturing a s...
- Publication number 20020034880
- Publication date Mar 21, 2002
- Kabushiki Kaisha Toshiba
- Itsuko Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method
- Publication number 20010051232
- Publication date Dec 13, 2001
- Kabushiki Kaisha Toshiba
- Itsuko Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas recovery system and gas recovery method
- Publication number 20010015133
- Publication date Aug 23, 2001
- Itsuko Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Itsuko Sakai

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Method for manufacturing semiconductor device

Semiconductor device and manufacturing method thereof

Edge detection method for transparent substrate by detecting non-li...

Capacitive coupling plasma processing apparatus

Processing method for conservation of processing gases

Plasma processing apparatus

Plasma treatment apparatus

Plasma processing method

High speed silicon etching method

Gas circulating-processing apparatus

Gas recirculation flow control method and apparatus for use in vacu...

Plasma processing apparatus with reduced parasitic capacity and los...

Method for manufacturing a semiconductor device using recirculation...

Plasma processing method

Plasma process apparatus

Charged beam apparatus having cleaning function and method of clean...

Charged beam irradiating apparatus having a cleaning means and a me...

Method of cleaning a charged beam apparatus

Patents Applicationslast 30 patents

Plasma Processing Apparatus and Plasma Processing Method

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

EDGE DETECTION METHOD

SUBSTRATE TRANSFERRING APPARATUS, SUBSTRATE PROCESSING APPARATUS, A...

Semiconductor device

Semiconductor manufacturing apparatus and manufacturing method of s...

Method of manufacturing semiconductor device

Capacitive coupling plasma processing apparatus

Processing method for conservation of processing gases

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus with reduced parasitic capacity and los...

Semiconductor device including trench capacitor and manufacturing m...

Plasma processing method

High speed silicon etching method

Plasma treatment apparatus

Plasma processing method

Gas recirculation flow control method and apparatus for use in vacu...

Gas circulating-processing apparatus

Plasma processing apparatus with reduced parasitic capacity and los...

Semiconductor processing apparatus and method for manufacturing a s...

Plasma processing method

Gas recovery system and gas recovery method