Iwai Tetsuhiro

Person

Fukuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 11,551,943
- Issue date Jan 10, 2023
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Tetsuhiro Iwai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,796,932
- Issue date Oct 6, 2020
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Tetsuhiro Iwai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,734,203
- Issue date Aug 4, 2020
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Tetsuhiro Iwai
- B08 - CLEANING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,672,593
- Issue date Jun 2, 2020
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Tetsuhiro Iwai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 9,842,750
- Issue date Dec 12, 2017
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Tetsuhiro Iwai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for manufacturing electronic...
- Patent number 9,786,472
- Issue date Oct 10, 2017
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Tetsuhiro Iwai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,583,355
- Issue date Feb 28, 2017
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Nobuhiro Nishizaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,401,286
- Issue date Jul 26, 2016
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Tetsuhiro Iwai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,945,411
- Issue date Feb 3, 2015
- Panasonic Corporation
- Tetsuhiro Iwai
- B44 - DECORATIVE ARTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,513,097
- Issue date Aug 20, 2013
- Panasonic Corporation
- Tetsuhiro Iwai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma dicing apparatus and method of manufacturing semiconductor c...
- Patent number 7,994,026
- Issue date Aug 9, 2011
- Panasonic Corporation
- Atsushi Harikai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,708,860
- Issue date May 4, 2010
- Panasonic Corporation
- Kiyoshi Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode member used in a plasma treating apparatus
- Patent number 7,138,034
- Issue date Nov 21, 2006
- Matsushita Electric Industrial Co., Ltd.
- Kiyoshi Arita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treating apparatus, plasma treating method and method of man...
- Patent number 7,074,720
- Issue date Jul 11, 2006
- Matsushita Electric Industrial Co., Ltd.
- Kiyoshi Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,056,831
- Issue date Jun 6, 2006
- Matsushita Electric Industrial Co., Ltd.
- Tetsuhiro Iwai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treating apparatus and plasma treating method
- Patent number 6,921,720
- Issue date Jul 26, 2005
- Matsushita Electric Industrial Co., Ltd.
- Kiyoshi Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 6,867,146
- Issue date Mar 15, 2005
- Matsushita Electric Industrial Co., Ltd.
- Kiyoshi Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for surface treatment of silicon based substrate
- Patent number 6,784,112
- Issue date Aug 31, 2004
- Matsushita Electric Industrial Co., Ltd.
- Kiyoshi Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 6,723,651
- Issue date Apr 20, 2004
- Matsushita Electric Industrial Co., Ltd.
- Kiyoshi Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method of processing
- Patent number 6,551,444
- Issue date Apr 22, 2003
- Matsushita Electric Industrial Co., Ltd.
- Tetsuhiro Iwai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor wafer turning process
- Patent number 6,511,895
- Issue date Jan 28, 2003
- Disco Corporation
- Yutaka Koma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus with improved maintainability
- Patent number 6,468,351
- Issue date Oct 22, 2002
- Matsushita Electric Industrial Co., Ltd.
- Kazuhiro Noda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process apparatus and plasma process method for substrate
- Patent number 6,340,639
- Issue date Jan 22, 2002
- Matsushita Electric Industrial Co., Ltd.
- Kiyoshi Arita
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR USING PLASMA PROCESSING...
- Publication number 20230167553
- Publication date Jun 1, 2023
- Panasonic Intellectual Property Management Co., Ltd.
- Tetsuhiro IWAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200402822
- Publication date Dec 24, 2020
- Panasonic Intellectual Porperty Management Co., Ltd.
- Tetsuhiro IWAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180130643
- Publication date May 10, 2018
- Panasonic Intellectual Property Management Co., Ltd.
- TETSUHIRO IWAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180096824
- Publication date Apr 5, 2018
- Panasonic Intellectual Property Management Co., Ltd.
- Tetsuhiro IWAI
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20180061680
- Publication date Mar 1, 2018
- Panasonic Intellectual Property Management Co., Ltd.
- Tetsuhiro IWAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180019099
- Publication date Jan 18, 2018
- Panasonic Intellectual Property Management Co., Ltd.
- Tetsuhiro IWAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20160300739
- Publication date Oct 13, 2016
- Panasonic Intellectual Property Management Co., Ltd.
- Tetsuhiro IWAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC...
- Publication number 20160240352
- Publication date Aug 18, 2016
- Panasonic Intellectual Property Management Co., Ltd.
- Tetsuhiro IWAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160118229
- Publication date Apr 28, 2016
- Panasonic Intellectual Property Management Co., Ltd.
- Tetsuhiro IWAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160118284
- Publication date Apr 28, 2016
- Panasonic Intellectual Property Management Co., Ltd.
- Tetsuhiro IWAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140332497
- Publication date Nov 13, 2014
- PANASONIC CORPORATION
- Nobuhiro NISHIZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140335696
- Publication date Nov 13, 2014
- PANASONIC CORPORATION
- Nobuhiro NISHIZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20130295775
- Publication date Nov 7, 2013
- Tetsuhiro IWAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20130180953
- Publication date Jul 18, 2013
- Tetsuhiro Iwai
- B44 - DECORATIVE ARTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100216313
- Publication date Aug 26, 2010
- Panasonic Corproation
- Tetsuhiro Iwai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DICING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR C...
- Publication number 20100048001
- Publication date Feb 25, 2010
- Atsushi Harikai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Treating Apparatus, Electrode Member for Plasma Treating App...
- Publication number 20090011120
- Publication date Jan 8, 2009
- Matsushita Electric Industrial Co., Ltd.
- Tetsuhiro Iwai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20090008035
- Publication date Jan 8, 2009
- Matsushita Electric Industrial Co., Ldt.
- Tetsuhiro Iwai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20070095477
- Publication date May 3, 2007
- Matsushita Electric Industrial Co., Ltd.
- Kiyoshi Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma treating apparatus and plasma treating method
- Publication number 20050279459
- Publication date Dec 22, 2005
- Matsushita Electric Industrial Co., Ltd.
- Kiyoshi Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20050247404
- Publication date Nov 10, 2005
- Matsushita Electric Industrial Co., Ltd.
- Tetsuhiro Iwai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20040050496
- Publication date Mar 18, 2004
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Tetsuhiro Iwai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor wafer processing apparatus
- Publication number 20030082914
- Publication date May 1, 2003
- Yutaka Koma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma treating apparatus and plasma treating method
- Publication number 20030037882
- Publication date Feb 27, 2003
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Kiyoshi Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode member for plasma treating apparatus, plasma treating app...
- Publication number 20020195202
- Publication date Dec 26, 2002
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Kiyoshi Arita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma treating apparatus, plasma treating method and method of man...
- Publication number 20020197877
- Publication date Dec 26, 2002
- Matsushita Electric Industrial Co. Ltd.
- Kiyoshi Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20020173161
- Publication date Nov 21, 2002
- Matsushita Electric Industrial Co., Ltd.
- Kiyoshi Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for surface treatment of silicon based substrate
- Publication number 20020148810
- Publication date Oct 17, 2002
- Kiyoshi Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method of processing
- Publication number 20020148561
- Publication date Oct 17, 2002
- Iwai Tetsuhiro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method
- Publication number 20020090826
- Publication date Jul 11, 2002
- MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- Kiyoshi Arita
- H01 - BASIC ELECTRIC ELEMENTS

Iwai Tetsuhiro

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing method

Plasma processing apparatus and method for manufacturing electronic...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma dicing apparatus and method of manufacturing semiconductor c...

Plasma processing apparatus

Electrode member used in a plasma treating apparatus

Plasma treating apparatus, plasma treating method and method of man...

Plasma processing apparatus and plasma processing method

Plasma treating apparatus and plasma treating method

Plasma processing method

Method for surface treatment of silicon based substrate

Plasma processing method

Plasma processing apparatus and method of processing

Semiconductor wafer turning process

Vacuum processing apparatus with improved maintainability

Plasma process apparatus and plasma process method for substrate

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND METHOD FOR USING PLASMA PROCESSING...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA DICING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR C...

Plasma Treating Apparatus, Electrode Member for Plasma Treating App...

PLASMA PROCESSING APPARATUS

Plasma processing apparatus

Plasma treating apparatus and plasma treating method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Semiconductor wafer processing apparatus

Plasma treating apparatus and plasma treating method

Electrode member for plasma treating apparatus, plasma treating app...

Plasma treating apparatus, plasma treating method and method of man...

Plasma processing method

Method for surface treatment of silicon based substrate

Plasma processing apparatus and method of processing

Plasma processing method