Iwao Higashikawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern forming method and pattern forming apparatus
- Patent number 6,806,941
- Issue date Oct 19, 2004
- Kabushiki Kaisha Toshiba
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and light exposure apparatus
- Patent number 6,765,673
- Issue date Jul 20, 2004
- Kabushiki Kaisha Toshiba
- Iwao Higashikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat treating method and heat treating apparatus
- Patent number 6,680,462
- Issue date Jan 20, 2004
- Kabushiki Kaisha Toshiba
- Hideaki Sakurai
- F26 - DRYING
Information Patent Grant
Method of producing exposure mask
- Patent number 6,635,549
- Issue date Oct 21, 2003
- Kabushiki Kaisha Toshiba
- Suigen Kyoh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Exposure method for making precision patterns on a substrate
- Patent number 6,542,237
- Issue date Apr 1, 2003
- Kabushiki Kaisha Toshiba
- Suigen Kyoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat treating method and heat treating apparatus
- Patent number 6,495,807
- Issue date Dec 17, 2002
- Kabushiki Kaisha Toshiba
- Hideaki Sakurai
- F26 - DRYING
Information Patent Grant
Heat treatment method and a heat treatment apparatus for controllin...
- Patent number 6,483,083
- Issue date Nov 19, 2002
- Kabushiki Kaisha Toshiba
- Hideaki Sakurai
- G01 - MEASURING TESTING
Information Patent Grant
Method of manufacturing a semiconductor device, method of manufactu...
- Patent number 6,340,542
- Issue date Jan 22, 2002
- Kabushiki Kaisha Toshiba
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and pattern forming apparatus
- Patent number 6,335,145
- Issue date Jan 1, 2002
- Kabushiki Kaisha Toshiba
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat treating method and heat treating apparatus
- Patent number 6,333,493
- Issue date Dec 25, 2001
- Kabushiki Kaisha Toshiba
- Hideaki Sakurai
- F26 - DRYING
Information Patent Grant
Exposure method utilizing partial exposure stitch area
- Patent number 6,333,138
- Issue date Dec 25, 2001
- Kabushiki Kaisha Toshiba
- Iwao Higashikawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for forming pattern
- Patent number 6,319,637
- Issue date Nov 20, 2001
- Kabushiki Kaisha Toshiba
- Iwao Higashikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heat treatment method and a heat treatment apparatus for controllin...
- Patent number 6,265,696
- Issue date Jul 24, 2001
- Kabushiki Kaisha Toshiba
- Hideaki Sakurai
- G05 - CONTROLLING REGULATING
Information Patent Grant
Pattern forming method and pattern forming apparatus
- Patent number 6,165,652
- Issue date Dec 26, 2000
- Kabushiki Kaisha Toshiba
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 6,040,114
- Issue date Mar 21, 2000
- Kabushiki Kaisha Toshiba
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark, manufacturing method thereof, exposing method using...
- Patent number 5,969,428
- Issue date Oct 19, 1999
- Kabushiki Kaisha Toshiba
- Hiroshi Nomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask and method and apparatus for manufacturing the same
- Patent number 5,907,393
- Issue date May 25, 1999
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement system and measurement method
- Patent number 5,851,842
- Issue date Dec 22, 1998
- Kabushiki Kaisha Toshiba
- Ryota Katsumata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alignment mark for use in making semiconductor devices
- Patent number 5,847,468
- Issue date Dec 8, 1998
- Kabushiki Kaisha Toshiba
- Hiroshi Nomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron-beam lithography system and method for drawing nanometer-o...
- Patent number 5,767,521
- Issue date Jun 16, 1998
- Kabushiki Kaisha Toshiba
- Shiro Takeno
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure mask and method and apparatus for manufacturing the same
- Patent number 5,728,494
- Issue date Mar 17, 1998
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask and method and apparatus for manufacturing the same
- Patent number 5,629,115
- Issue date May 13, 1997
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist patterns and method of forming resist patterns
- Patent number 5,374,502
- Issue date Dec 20, 1994
- Sortec Corporation
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist patterns and method of forming resist patterns
- Patent number 5,326,672
- Issue date Jul 5, 1994
- Sortec Corporation
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 5,262,282
- Issue date Nov 16, 1993
- Kabushiki Kaisha Toshiba
- Katsuhiko Hieda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming flattened film
- Patent number 4,510,173
- Issue date Apr 9, 1985
- Kabushiki Kaisha Toshiba
- Iwao Higashikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method for organic material layers
- Patent number 4,473,437
- Issue date Sep 25, 1984
- Tokyo Shibaura Denki Kabushiki Kaisha
- Iwao Higashikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of preparing resist pattern
- Patent number 4,264,715
- Issue date Apr 28, 1981
- Vlsi Technology Research Association
- Akira Miura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20100081091
- Publication date Apr 1, 2010
- Koji HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL ELEMENT AND OPTICAL APPARATUS
- Publication number 20090141378
- Publication date Jun 4, 2009
- Kazuo TAWARAYAMA
- G02 - OPTICS
Information Patent Application
Heat treating method and heat treating apparatus
- Publication number 20030052119
- Publication date Mar 20, 2003
- Kabushiki Kaisha Toshiba
- Hideaki Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treating method and heat treating apparatus
- Publication number 20020063123
- Publication date May 30, 2002
- Kabushiki Kaisha Toshiba
- Hideaki Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern forming method and pattern forming apparatus
- Publication number 20020045132
- Publication date Apr 18, 2002
- Soichi Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of producing exposure mask
- Publication number 20020037625
- Publication date Mar 28, 2002
- Kabushiki Kaisha Toshiba
- Suigen Kyoh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Heat treatment method and a heat treatment apparatus for controllin...
- Publication number 20010027971
- Publication date Oct 11, 2001
- Kabushiki Kaisha Toshiba
- Hideaki Sakurai
- G01 - MEASURING TESTING

Iwao Higashikawa

Person

Patents Grantslast 30 patents

Pattern forming method and pattern forming apparatus

Pattern forming method and light exposure apparatus

Heat treating method and heat treating apparatus

Method of producing exposure mask

Exposure method for making precision patterns on a substrate

Heat treating method and heat treating apparatus

Heat treatment method and a heat treatment apparatus for controllin...

Method of manufacturing a semiconductor device, method of manufactu...

Pattern forming method and pattern forming apparatus

Heat treating method and heat treating apparatus

Exposure method utilizing partial exposure stitch area

Method for forming pattern

Heat treatment method and a heat treatment apparatus for controllin...

Pattern forming method and pattern forming apparatus

Pattern forming method

Alignment mark, manufacturing method thereof, exposing method using...

Exposure mask and method and apparatus for manufacturing the same

Measurement system and measurement method

Alignment mark for use in making semiconductor devices

Electron-beam lithography system and method for drawing nanometer-o...

Exposure mask and method and apparatus for manufacturing the same

Exposure mask and method and apparatus for manufacturing the same

Resist patterns and method of forming resist patterns

Resist patterns and method of forming resist patterns

Pattern forming method

Method for forming flattened film

Dry etching method for organic material layers

Method of preparing resist pattern

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

OPTICAL ELEMENT AND OPTICAL APPARATUS

Heat treating method and heat treating apparatus

Heat treating method and heat treating apparatus

Pattern forming method and pattern forming apparatus

Method of producing exposure mask

Heat treatment method and a heat treatment apparatus for controllin...