Izumi Arai

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mobile electronic apparatus
- Patent number 8,422,214
- Issue date Apr 16, 2013
- Kyocera Corporation
- Koichiro Furumatsu
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 6,110,287
- Issue date Aug 29, 2000
- Tokyo Electron Limited
- Izumi Arai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method
- Patent number 5,858,258
- Issue date Jan 12, 1999
- Tokyo Electron Limited
- Hiroshi Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stage having electrostatic chuck and plasma processing apparatus us...
- Patent number 5,382,311
- Issue date Jan 17, 1995
- Tokyo Electron Limited
- Kenji Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing method and apparatus
- Patent number 5,203,958
- Issue date Apr 20, 1993
- Tokyo Electron Limited
- Izumi Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for processing substrate
- Patent number 5,164,034
- Issue date Nov 17, 1992
- Tokyo Electron Limited
- Izumi Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cooling a plasma electrode system for an etching apparatus
- Patent number 5,155,331
- Issue date Oct 13, 1992
- Tokyo Electron Limited
- Takao Horiuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 5,089,083
- Issue date Feb 18, 1992
- Tokyo Electron Limited
- Hiroshi Kojima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device
- Patent number 4,978,412
- Issue date Dec 18, 1990
- Tokyo Electron Limited
- Makoto Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cooling of a plasma electrode system for an etching apparatus
- Patent number 4,963,713
- Issue date Oct 16, 1990
- Tokyo Electron Limited
- Takao Horiuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 4,931,135
- Issue date Jun 5, 1990
- Tokyo Electron Limited
- Takao Horiuchi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MOBILE ELECTRONIC APPARATUS
- Publication number 20100085689
- Publication date Apr 8, 2010
- Kyocera Corporation
- Koichiro Furumatsu
- H04 - ELECTRIC COMMUNICATION TECHNIQUE

Person

Patents Grantslast 30 patents

Mobile electronic apparatus

Plasma processing method and plasma processing apparatus

Plasma processing method

Stage having electrostatic chuck and plasma processing apparatus us...

Processing method and apparatus

Apparatus and method for processing substrate

Method for cooling a plasma electrode system for an etching apparatus

Plasma etching method

Plasma processing device

Cooling of a plasma electrode system for an etching apparatus

Etching method and etching apparatus

Patents Applicationslast 30 patents

MOBILE ELECTRONIC APPARATUS