Izuru Matsuda

Person

Ibaraki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and apparatus
- Patent number 7,513,214
- Issue date Apr 7, 2009
- Matsushita Electric Industrial Co., Ltd.
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and apparatus
- Patent number 7,406,925
- Issue date Aug 5, 2008
- Matsushita Electric Industrial Co., Ltd.
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Membrane with bumps, method of manufacturing the same, and method o...
- Patent number 7,292,056
- Issue date Nov 6, 2007
- Matsushita Electric Industrial Co., Ltd.
- Izuru Matsuda
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing method and apparatus thereof
- Patent number 6,864,640
- Issue date Mar 8, 2005
- Matsushita Electric Industrial Co., Ltd.
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 6,830,653
- Issue date Dec 14, 2004
- Matsushita Electric Industrial Co., Ltd.
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and apparatus
- Patent number 6,808,759
- Issue date Oct 26, 2004
- Matsushita Electric Industrial Co., Ltd.
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for plasma processing
- Patent number 6,648,976
- Issue date Nov 18, 2003
- Matsushita Electric Industrial Co., Ltd.
- Izuru Matsuda
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Substrate detecting method and device
- Patent number 6,642,533
- Issue date Nov 4, 2003
- Matsushita Electric Industrial Co., Ltd.
- Hideo Haraguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate dechucking device and substrate dechucking method
- Patent number 6,447,613
- Issue date Sep 10, 2002
- Matsushita Electric Industrial Co., Ltd.
- Hideo Haraguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for positioning a disk-shaped object
- Patent number 6,340,281
- Issue date Jan 22, 2002
- Matsushita Electric Industrial Co., Ltd.
- Hideo Haraguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer handling apparatus
- Patent number 6,276,892
- Issue date Aug 21, 2001
- Matsushita Electric Industrial Co., Ltd.
- Hideo Haraguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate temperature control method and device
- Patent number 6,254,683
- Issue date Jul 3, 2001
- Matsushita Electric Industrial Co., Ltd.
- Izuru Matsuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate handling method and apparatus, and attractive force inspe...
- Patent number 6,255,223
- Issue date Jul 3, 2001
- Matsushita Electric Industrial Co., Ltd.
- Izuru Matsuda
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Dry etching apparatus
- Patent number 5,514,243
- Issue date May 7, 1996
- Matsushita Electric Industrial Co., Ltd.
- Izuru Matsuda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Membrane with bumps, method of manufacturing the same, and method o...
- Publication number 20060076967
- Publication date Apr 13, 2006
- Izuru Matsuda
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing method and apparatus
- Publication number 20050082005
- Publication date Apr 21, 2005
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method and apparatus
- Publication number 20050011453
- Publication date Jan 20, 2005
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method and apparatus
- Publication number 20030026920
- Publication date Feb 6, 2003
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processsing method and apparatus thereof
- Publication number 20020047541
- Publication date Apr 25, 2002
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and apparatus
- Publication number 20020038791
- Publication date Apr 4, 2002
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate detecting method and device
- Publication number 20010009641
- Publication date Jul 26, 2001
- Matsushita Electric Industrial Co. Ltd.
- Hideo Haraguchi
- H01 - BASIC ELECTRIC ELEMENTS

Izuru Matsuda

Person

Patents Grantslast 30 patents

Plasma processing method and apparatus

Plasma processing method and apparatus

Membrane with bumps, method of manufacturing the same, and method o...

Plasma processing method and apparatus thereof

Plasma processing method and apparatus

Plasma processing method and apparatus

Apparatus and method for plasma processing

Substrate detecting method and device

Substrate dechucking device and substrate dechucking method

Method and apparatus for positioning a disk-shaped object

Wafer handling apparatus

Substrate temperature control method and device

Substrate handling method and apparatus, and attractive force inspe...

Dry etching apparatus

Patents Applicationslast 30 patents

Membrane with bumps, method of manufacturing the same, and method o...

Plasma processing method and apparatus

Plasma processing method and apparatus

Plasma processing method and apparatus

Plasma processsing method and apparatus thereof

Plasma processing method and apparatus

Substrate detecting method and device