J. Casey Donaher

Person

Westford, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
System and method for optimizing a lithography exposure process
- Patent number 11,531,279
- Issue date Dec 20, 2022
- Onto Innovation Inc.
- Elvino da Silveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conformal stage
- Patent number 11,353,800
- Issue date Jun 7, 2022
- Onto Innovation Inc.
- J. Casey Donaher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for optimizing a lithography exposure process
- Patent number 11,126,096
- Issue date Sep 21, 2021
- Onto Innovation, Inc.
- Elvino Da Silveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Planar motor system with increased efficiency
- Patent number 9,625,832
- Issue date Apr 18, 2017
- Rudolph Technologies, Inc.
- J. Casey Donaher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for estimating field curvature
- Patent number 8,760,624
- Issue date Jun 24, 2014
- Rudolph Technologies, Inc.
- J. Casey Donaher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System metrology core
- Patent number 8,395,783
- Issue date Mar 12, 2013
- Rudolph Technologies, Inc.
- J. Casey Donaher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment system for use in lithography utilizing a spherical refle...
- Patent number 5,483,345
- Issue date Jan 9, 1996
- MRS Technology, Inc.
- J. Casey Donaher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS
- Publication number 20220075282
- Publication date Mar 10, 2022
- Onto Innovation, Inc.
- Elvino da Silveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONFORMAL STAGE
- Publication number 20200401055
- Publication date Dec 24, 2020
- Onto Innovation, Inc.
- J. Casey DONAHER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEPARATED AXIS LITHOGRAPHIC TOOL
- Publication number 20200333713
- Publication date Oct 22, 2020
- Onto Innovation, Inc.
- J. Casey DONAHER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH RESOLUTION STAGE POSITIONER
- Publication number 20200286764
- Publication date Sep 10, 2020
- Onto Innovation, Inc.
- J. Casey DONAHER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS
- Publication number 20200233320
- Publication date Jul 23, 2020
- Onto Innovation, Inc.
- Elvino DA SILVEIRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Planar Motor System With Increased Efficiency
- Publication number 20150309425
- Publication date Oct 29, 2015
- Rudolph Technologies, Inc.
- J. Casey Donaher
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
Multiple-Blade Device for Substrate Edge Protection during Photolit...
- Publication number 20150277239
- Publication date Oct 1, 2015
- Rudolph Technologies, Inc.
- James H. Greer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Blade for Substrate Edge Protection During Photolithography
- Publication number 20150234281
- Publication date Aug 20, 2015
- Rudolph Technologies, Inc.
- Steven D. Gardner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Estimating Field Curvature
- Publication number 20120015460
- Publication date Jan 19, 2012
- Azores Corp.
- J. Casey Donaher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System Metrology Core
- Publication number 20120015461
- Publication date Jan 19, 2012
- Azores Corp.
- J. Casey Donaher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

J. Casey Donaher

Person

Patents Grantslast 30 patents

System and method for optimizing a lithography exposure process

Conformal stage

System and method for optimizing a lithography exposure process

Planar motor system with increased efficiency

System and method for estimating field curvature

System metrology core

Alignment system for use in lithography utilizing a spherical refle...

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS

CONFORMAL STAGE

SEPARATED AXIS LITHOGRAPHIC TOOL

HIGH RESOLUTION STAGE POSITIONER

SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS

Planar Motor System With Increased Efficiency

Multiple-Blade Device for Substrate Edge Protection during Photolit...

Blade for Substrate Edge Protection During Photolithography

System and Method for Estimating Field Curvature

System Metrology Core