J. Fung Chen

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optical proximity correction method utilizing phase-edges as sub-re...
- Patent number 7,399,559
- Issue date Jul 15, 2008
- ASML Masktools B.V.
- Douglas Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction method utilizing phase-edges as sub-re...
- Patent number 7,026,081
- Issue date Apr 11, 2006
- ASML Masktools B.V.
- Douglas Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for detecting aberrations in an optical system
- Patent number 6,788,400
- Issue date Sep 7, 2004
- ASML Masktools B.V.
- J. Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for detecting aberrations in a projection lens...
- Patent number 6,753,954
- Issue date Jun 22, 2004
- ASML Masktools B.V.
- J. Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of patterning sub-0.25λ line features with high trans...
- Patent number 6,482,555
- Issue date Nov 19, 2002
- ASML Masktools Netherlands B.V.
- J. Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of providing optical proximity correction for fea...
- Patent number 6,335,130
- Issue date Jan 1, 2002
- ASML Masktools Netherlands B.V.
- J. Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of patterning sub-0.25 lambda line features with high transm...
- Patent number 6,312,854
- Issue date Nov 6, 2001
- ASML Masktools Netherlands B.V.
- J. Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fine feature edge tuning with optically-halftoned mask
- Patent number 6,114,071
- Issue date Sep 5, 2000
- ASML Masktools Netherlands B.V.
- J. Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography mask using serifs and method thereof
- Patent number 5,707,765
- Issue date Jan 13, 1998
- MicroUnity Systems Engineering, Inc.
- J. Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Optical proximity correction method utilizing phase-edges as sub-re...
- Publication number 20050271953
- Publication date Dec 8, 2005
- ASML MASKTOOLS B.V.
- Douglas Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for detecting aberrations in a projection lens...
- Publication number 20030098970
- Publication date May 29, 2003
- ASML MASKTOOLS NETHERLANDS B.V.
- J. Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical proximity correction method utilizing phase-edges as sub-re...
- Publication number 20030064298
- Publication date Apr 3, 2003
- ASML MASKTOOLS, B.V.
- Douglas Van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for detecting aberrations in an optical system
- Publication number 20020088951
- Publication date Jul 11, 2002
- J. Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of patterning sub-0.25lambda line features with high transmi...
- Publication number 20020048708
- Publication date Apr 25, 2002
- ASML MASKTOOLS NETHERLANDS B.V.
- J. Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

J. Fung Chen

Person

Patents Grantslast 30 patents

Optical proximity correction method utilizing phase-edges as sub-re...

Optical proximity correction method utilizing phase-edges as sub-re...

Method and apparatus for detecting aberrations in an optical system

Method and apparatus for detecting aberrations in a projection lens...

Method of patterning sub-0.25&#x03BB; line features with high trans...

System and method of providing optical proximity correction for fea...

Method of patterning sub-0.25 lambda line features with high transm...

Method of fine feature edge tuning with optically-halftoned mask

Photolithography mask using serifs and method thereof

Patents Applicationslast 30 patents

Optical proximity correction method utilizing phase-edges as sub-re...

Method and apparatus for detecting aberrations in a projection lens...

Optical proximity correction method utilizing phase-edges as sub-re...

Method and apparatus for detecting aberrations in an optical system

Method of patterning sub-0.25lambda line features with high transmi...

Method of patterning sub-0.25λ line features with high trans...