Jacek TYMINSKI

Person

Mountain View, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern-edge placement predictor and monitor for lithographic expos...
- Patent number 10,488,763
- Issue date Nov 26, 2019
- Nikon Corporation
- Jacek K. Tyminski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern-edge placement predictor and monitor for lithographic expos...
- Patent number 10,345,715
- Issue date Jul 9, 2019
- Nikon Corporation
- Jacek K. Tyminski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scanner based optical proximity correction system and method of use
- Patent number 10,234,756
- Issue date Mar 19, 2019
- Nikon Corporation
- Jacek Tyminski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Tuning of optical projection system to optimize image-edge placement
- Patent number 10,018,922
- Issue date Jul 10, 2018
- Nikon Corporation
- Jacek K. Tyminski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanner based optical proximity correction system and method of use
- Patent number 9,753,363
- Issue date Sep 5, 2017
- Nikon Corporation
- Jacek Tyminski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Predicting pattern critical dimensions in a lithographic exposure p...
- Patent number 9,529,253
- Issue date Dec 27, 2016
- Nikon Precision Inc.
- Jacek K. Tyminski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanner based optical proximity correction system and method of use
- Patent number 9,286,416
- Issue date Mar 15, 2016
- Nikon Corporation
- Jacek Tyminski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Predicting pattern critical dimensions in a lithographic exposure p...
- Patent number 8,572,518
- Issue date Oct 29, 2013
- Nikon Precision Inc.
- Jacek K. Tyminski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanner based optical proximity correction system and method of use
- Patent number 8,365,107
- Issue date Jan 29, 2013
- Nikon Corporation
- Jacek Tyminski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Enhanced illuminator for use in photolithographic systems
- Patent number 6,842,223
- Issue date Jan 11, 2005
- Nikon Precision Inc.
- Jacek K. Tyminski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PATTERN-EDGE PLACEMENT PREDICTOR AND MONITOR FOR LITHOGRAPHIC EXPOS...
- Publication number 20190278189
- Publication date Sep 12, 2019
- Nikon Corporation
- Jacek K. Tyminski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SCANNER BASED OPTICAL PROXIMITY CORRECTION SYSTEM AND METHOD OF USE
- Publication number 20190163050
- Publication date May 30, 2019
- Nikon Corporation
- Jacek TYMINSKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN-EDGE PLACEMENT PREDICTOR AND MONITOR FOR LITHOGRAPHIC EXPOS...
- Publication number 20180299795
- Publication date Oct 18, 2018
- Nikon Corporation
- Jacek K. Tyminski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNER BASED OPTICAL PROXIMITY CORRECTION SYSTEM AND METHOD OF USE
- Publication number 20170363951
- Publication date Dec 21, 2017
- Nikon Corporation
- Jacek TYMINSKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TUNING OF OPTICAL PROJECTION SYSTEM TO OPTIMIZE IMAGE-EDGE PLACEMENT
- Publication number 20160202619
- Publication date Jul 14, 2016
- Nikon Corporation
- Jacek K. Tyminski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNER BASED OPTICAL PROXIMITY CORRECTION SYSTEM AND METHOD OF USE
- Publication number 20160161842
- Publication date Jun 9, 2016
- Nikon Corporation
- Jacek TYMINSKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IN-SITU SCANNER EXPOSURE MONITOR
- Publication number 20130339910
- Publication date Dec 19, 2013
- Nikon Precision Inc.
- Jacek K. TYMINSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNER BASED OPTICAL PROXIMITY CORRECTION SYSTEM AND METHOD OF USE
- Publication number 20130191794
- Publication date Jul 25, 2013
- Nikon Precision Inc.
- Jacek TYMINSKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IN-SITU SCANNER EXPOSURE MONITOR
- Publication number 20120331427
- Publication date Dec 27, 2012
- Nikon Precision Inc.
- Jacek K. TYMINSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Scanner Based Optical Proximity Correction System and Method of Use
- Publication number 20100058263
- Publication date Mar 4, 2010
- Nikon Precision Inc.
- Jacek Tyminski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Enhanced illuminator for use in photolithographic systems
- Publication number 20040201831
- Publication date Oct 14, 2004
- Nikon Precision Inc., A California Corporation
- Jacek K. Tyminski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jacek TYMINSKI

Person

Patents Grantslast 30 patents

Pattern-edge placement predictor and monitor for lithographic expos...

Pattern-edge placement predictor and monitor for lithographic expos...

Scanner based optical proximity correction system and method of use

Tuning of optical projection system to optimize image-edge placement

Scanner based optical proximity correction system and method of use

Predicting pattern critical dimensions in a lithographic exposure p...

Scanner based optical proximity correction system and method of use

Predicting pattern critical dimensions in a lithographic exposure p...

Scanner based optical proximity correction system and method of use

Enhanced illuminator for use in photolithographic systems

Patents Applicationslast 30 patents

PATTERN-EDGE PLACEMENT PREDICTOR AND MONITOR FOR LITHOGRAPHIC EXPOS...

SCANNER BASED OPTICAL PROXIMITY CORRECTION SYSTEM AND METHOD OF USE

PATTERN-EDGE PLACEMENT PREDICTOR AND MONITOR FOR LITHOGRAPHIC EXPOS...

SCANNER BASED OPTICAL PROXIMITY CORRECTION SYSTEM AND METHOD OF USE

TUNING OF OPTICAL PROJECTION SYSTEM TO OPTIMIZE IMAGE-EDGE PLACEMENT

SCANNER BASED OPTICAL PROXIMITY CORRECTION SYSTEM AND METHOD OF USE

IN-SITU SCANNER EXPOSURE MONITOR

SCANNER BASED OPTICAL PROXIMITY CORRECTION SYSTEM AND METHOD OF USE

IN-SITU SCANNER EXPOSURE MONITOR

Scanner Based Optical Proximity Correction System and Method of Use

Enhanced illuminator for use in photolithographic systems