Jack Y. Jau

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Inspection method and system
- Patent number 11,880,971
- Issue date Jan 23, 2024
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of inspecting samples with multiple beams of charged particles
- Patent number 11,430,631
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Kuo-Shih Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and system
- Patent number 11,250,559
- Issue date Feb 15, 2022
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,217,423
- Issue date Jan 4, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Local alignment point calibration method in die inspection
- Patent number 11,043,356
- Issue date Jun 22, 2021
- ASML Netherlands B.V.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and system
- Patent number 10,679,340
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,586,681
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Local alignment point calibration method in die inspection
- Patent number 10,497,538
- Issue date Dec 3, 2019
- ASML Netherlands B.V.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for fast inspecting defects
- Patent number 10,380,731
- Issue date Aug 13, 2019
- Hermes Microvision Inc.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,236,156
- Issue date Mar 19, 2019
- Hermes Microvision Inc.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and system
- Patent number 10,102,619
- Issue date Oct 16, 2018
- Hermes-Microvision, Inc.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,020,164
- Issue date Jul 10, 2018
- Hermes Microvision Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection method and system
- Patent number 9,965,844
- Issue date May 8, 2018
- Hermes Microvision Inc.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Local alignment point calibration method in die inspection
- Patent number 9,953,803
- Issue date Apr 24, 2018
- Hermes Microvision Inc.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for fast inspecting defects
- Patent number 9,541,824
- Issue date Jan 10, 2017
- Hermes-Microvision, Inc.
- Wei Fang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for fast inspecting defects
- Patent number 9,494,856
- Issue date Nov 15, 2016
- Hermes-Microvision, Inc.
- Wei Fang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system of classifying defects on a wafer
- Patent number 9,436,988
- Issue date Sep 6, 2016
- Hermes-Microvision, Inc.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dynamic focus adjustment with optical height detection apparatus in...
- Patent number 9,400,176
- Issue date Jul 26, 2016
- Hermes-Microvision, Inc.
- Joe Wang
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus
- Patent number 9,362,087
- Issue date Jun 7, 2016
- Hermes-Microvision, Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for measuring critical dimension and monitoring f...
- Patent number 9,282,293
- Issue date Mar 8, 2016
- Hermes Microvision Inc.
- Wei Fang
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Charged particle beam apparatus
- Patent number 9,190,241
- Issue date Nov 17, 2015
- Hermes-Microvision, Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 9,177,758
- Issue date Nov 3, 2015
- Hermes Microvision Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for measuring critical dimension and monitoring f...
- Patent number 9,100,553
- Issue date Aug 4, 2015
- Hermes Microvision Inc.
- Wei Fang
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Method and system for measuring critical dimension and monitoring f...
- Patent number 9,041,795
- Issue date May 26, 2015
- Hermes Microvision Inc.
- Wei Fang
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Structure and method for determining a defect in integrated circuit...
- Patent number 9,035,674
- Issue date May 19, 2015
- Hermes Microvision, Inc.
- Hong Xiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for examining a sample by using a charged particle beam
- Patent number 8,937,281
- Issue date Jan 20, 2015
- Hermes-Microvision, Inc.
- Yan Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for inspecting overlay shift defect during semiconductor man...
- Patent number 8,923,601
- Issue date Dec 30, 2014
- Hermes Microvision Inc.
- Wei Fang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam imaging assembly and imaging method thereof
- Patent number 8,884,224
- Issue date Nov 11, 2014
- Hermes-Microvision, Inc.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of classifying defects on a wafer
- Patent number 8,805,054
- Issue date Aug 12, 2014
- Hermes-Microvision, Inc.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dynamic focus adjustment with optical height detection apparatus in...
- Patent number 8,791,414
- Issue date Jul 29, 2014
- Hermes Microvision, Inc.
- Joe Wang
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
INSPECTION METHOD AND SYSTEM
- Publication number 20220245780
- Publication date Aug 4, 2022
- ASML NETHERLANDS B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION METHOD AND SYSTEM
- Publication number 20200302587
- Publication date Sep 24, 2020
- ASML Netherlands B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DYNAMIC DETERMINATION OF A SAMPLE INSPECTION RECIPE OF CHARGED PART...
- Publication number 20200286710
- Publication date Sep 10, 2020
- ASML NETHERLANDS B.V.
- Zhong-wei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20200251305
- Publication date Aug 6, 2020
- ASML NETHERLANDS B.V.
- Zhongwei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF INSPECTING SAMPLES WITH MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20200227233
- Publication date Jul 16, 2020
- ASML NETHERLANDS B.V.
- Kuo-Shih LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Local Alignment Point Calibration Method in Die Inspection
- Publication number 20200105497
- Publication date Apr 2, 2020
- ASML NETHERLANDS B.V.
- Wei FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20190279842
- Publication date Sep 12, 2019
- ASML Netherlands B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION METHOD AND SYSTEM
- Publication number 20190147579
- Publication date May 16, 2019
- HERMES MICROVISION, INC.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Local Alignment Point Calibration Method in Die Inspection
- Publication number 20180247789
- Publication date Aug 30, 2018
- Hermes Microvision Inc.
- Wei FANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus of Plural Charged-Particle Beams
- Publication number 20160284505
- Publication date Sep 29, 2016
- HERMES MICROVISION INC.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Local Alignment Point Calibration Method in Die Inspection
- Publication number 20160247660
- Publication date Aug 25, 2016
- HERMES MICROVISION INC.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20150371820
- Publication date Dec 24, 2015
- Hermes-Microvision, Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20150155133
- Publication date Jun 4, 2015
- Hermes Microvision Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20150144788
- Publication date May 28, 2015
- HERMES MICROVISION INC.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20150083912
- Publication date Mar 26, 2015
- Hermes Microvision Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF CLASSIFYING DEFECTS ON A WAFER
- Publication number 20140321730
- Publication date Oct 30, 2014
- WEI FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Dynamic Focus Adjustment with Optical Height Detection Apparatus in...
- Publication number 20140291517
- Publication date Oct 2, 2014
- JOE WANG
- G01 - MEASURING TESTING
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20140291510
- Publication date Oct 2, 2014
- Hermes-Microvision, Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR MEASURING CRITICAL DIMENSION AND MONITORING F...
- Publication number 20130202186
- Publication date Aug 8, 2013
- HERMES MICROVISION INC.
- WEI FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR MEASURING CRITICAL DIMENSION AND MONITORING F...
- Publication number 20130188037
- Publication date Jul 25, 2013
- HERMES MICROVISION INC.
- WEI FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR MEASURING CRITICAL DIMENSION AND MONITORING F...
- Publication number 20130182939
- Publication date Jul 18, 2013
- HERMES MICROVISION INC.
- WEI FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR EXAMINING A SAMPLE BY USING A CHARGED PARTICLE BEAM
- Publication number 20120273678
- Publication date Nov 1, 2012
- Yan Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR MEASURING CRITICAL DIMENSION AND MONITORING F...
- Publication number 20120212601
- Publication date Aug 23, 2012
- HERMES MICROVISION INC.
- WEI FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
STRUCTURE AND METHOD FOR DETERMINING A DEFECT IN INTEGRATED CIRCUIT...
- Publication number 20120083055
- Publication date Apr 5, 2012
- Hermes-Microvision, Inc.
- Hong XIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Inspecting Overlay Shift Defect during Semiconductor Man...
- Publication number 20120070067
- Publication date Mar 22, 2012
- HERMES MICROVISION INC.
- WEI FANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM OF CLASSIFYING DEFECTS ON A WAFER
- Publication number 20120027287
- Publication date Feb 2, 2012
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Dynamic Focus Adjustment with Optical Height Detection Apparatus in...
- Publication number 20110260055
- Publication date Oct 27, 2011
- Hermes Microvision, Inc.
- JOE WANG
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM INSPECTION METHOD
- Publication number 20110036981
- Publication date Feb 17, 2011
- Hermes Microvision, Inc.
- YAN ZHAO
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR EXAMINING A SAMPLE BY USING A CHARGED PARTICLE BEAM
- Publication number 20100327160
- Publication date Dec 30, 2010
- Yan Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Inspecting Overlay Shift Defect during Semiconductor Man...
- Publication number 20100278416
- Publication date Nov 4, 2010
- Hong Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jack Y. Jau

Person

Patents Grantslast 30 patents

Inspection method and system

Methods of inspecting samples with multiple beams of charged particles

Inspection method and system

Apparatus of plural charged-particle beams

Local alignment point calibration method in die inspection

Inspection method and system

Charged particle beam apparatus

Local alignment point calibration method in die inspection

Method and system for fast inspecting defects

Apparatus of plural charged-particle beams

Inspection method and system

Charged particle beam apparatus

Inspection method and system

Local alignment point calibration method in die inspection

Method and system for fast inspecting defects

Method and system for fast inspecting defects

Method and system of classifying defects on a wafer

Dynamic focus adjustment with optical height detection apparatus in...

Charged particle beam apparatus

Method and system for measuring critical dimension and monitoring f...

Charged particle beam apparatus

Charged particle beam apparatus

Method and system for measuring critical dimension and monitoring f...

Method and system for measuring critical dimension and monitoring f...

Structure and method for determining a defect in integrated circuit...

Method for examining a sample by using a charged particle beam

Method for inspecting overlay shift defect during semiconductor man...

Charged particle beam imaging assembly and imaging method thereof

Method and system of classifying defects on a wafer

Dynamic focus adjustment with optical height detection apparatus in...

Patents Applicationslast 30 patents

INSPECTION METHOD AND SYSTEM

INSPECTION METHOD AND SYSTEM

DYNAMIC DETERMINATION OF A SAMPLE INSPECTION RECIPE OF CHARGED PART...

CHARGED PARTICLE BEAM APPARATUS

METHODS OF INSPECTING SAMPLES WITH MULTIPLE BEAMS OF CHARGED PARTICLES

Local Alignment Point Calibration Method in Die Inspection

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

INSPECTION METHOD AND SYSTEM

Local Alignment Point Calibration Method in Die Inspection

Apparatus of Plural Charged-Particle Beams

Local Alignment Point Calibration Method in Die Inspection

Charged Particle Beam Apparatus

Charged Particle Beam Apparatus

Charged Particle Beam Apparatus

Charged Particle Beam Apparatus

METHOD AND SYSTEM OF CLASSIFYING DEFECTS ON A WAFER

Dynamic Focus Adjustment with Optical Height Detection Apparatus in...

Charged Particle Beam Apparatus

METHOD AND SYSTEM FOR MEASURING CRITICAL DIMENSION AND MONITORING F...

METHOD AND SYSTEM FOR MEASURING CRITICAL DIMENSION AND MONITORING F...

METHOD AND SYSTEM FOR MEASURING CRITICAL DIMENSION AND MONITORING F...

METHOD FOR EXAMINING A SAMPLE BY USING A CHARGED PARTICLE BEAM

METHOD AND SYSTEM FOR MEASURING CRITICAL DIMENSION AND MONITORING F...

STRUCTURE AND METHOD FOR DETERMINING A DEFECT IN INTEGRATED CIRCUIT...

Method for Inspecting Overlay Shift Defect during Semiconductor Man...

METHOD AND SYSTEM OF CLASSIFYING DEFECTS ON A WAFER

Dynamic Focus Adjustment with Optical Height Detection Apparatus in...

CHARGED PARTICLE BEAM INSPECTION METHOD

METHOD FOR EXAMINING A SAMPLE BY USING A CHARGED PARTICLE BEAM

Method for Inspecting Overlay Shift Defect during Semiconductor Man...