Jacob Sonneveld

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Patents Grantslast 30 patents

Information Patent Grant
Sensor and lithographic apparatus
- Patent number 7,459,669
- Issue date Dec 2, 2008
- ASML Netherlands B.V.
- Rob Adrianus Antonius Maria Bastiaensen
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
WAVELENGTH SELECTION MODULE, ILLUMINATION SYSTEM AND METROLOGY SYSTEM
- Publication number 20220299365
- Publication date Sep 22, 2022
- ASML NETHERLANDS B.V.
- Gerbrand VAN DER ZOUW
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Passive reticle tool, a lithographic apparatus and a method of patt...
- Publication number 20100182582
- Publication date Jul 22, 2010
- ASML NETHERLANDS B.V,
- Marcus Adrianus Van De Kerkhof
- G01 - MEASURING TESTING
Information Patent Application
Lithographic projection system and projection lens polarization sensor
- Publication number 20100118288
- Publication date May 13, 2010
- Marcus Adrianus Van De Kerkhof
- G01 - MEASURING TESTING
Information Patent Application
Lithographic Apparatus, Method for Determining at Least One Polariz...
- Publication number 20100045956
- Publication date Feb 25, 2010
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G01 - MEASURING TESTING
Information Patent Application
Sensor and lithographic apparatus
- Publication number 20070152178
- Publication date Jul 5, 2007
- ASML NETHERLANDS B.V.
- Rob Adrianus Antonius Maria Bastiaensen
- G01 - MEASURING TESTING