Jacob WOODRUFF

Person

Branchburg, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing an electronic component which includes a self-...
- Patent number 12,035,546
- Issue date Jul 9, 2024
- Merck Patent GmbH
- Peer Kirsch
Information Patent Grant
Methods of vapor deposition of ruthenium using an oxygen-free co-re...
- Patent number 11,976,352
- Issue date May 7, 2024
- Merck Patent GmbH
- Jacob Woodruff
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of atomic layer deposition for selective film growth
- Patent number 11,230,764
- Issue date Jan 25, 2022
- Merck Patent GmbH
- Jean-Sébastien Lehn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ATOMIC LAYER ETCHING OF METAL OXIDES USING NOVEL CO-REACTANTS AS HA...
- Publication number 20230402290
- Publication date Dec 14, 2023
- Merck Patent GmbH
- Ravindra KANJOLIA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Forming Ruthenium-Containing Films Without A Co-Reactant
- Publication number 20230227966
- Publication date Jul 20, 2023
- Merck Patent GmbH
- Guo LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Selectively Forming Metal-Containing Films
- Publication number 20230108732
- Publication date Apr 6, 2023
- Merck Patent GmbH
- Joby ELDO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
INHERENTLY FERROELECTRIC HF-ZR CONTAINING FILMS
- Publication number 20230089523
- Publication date Mar 23, 2023
- Merck Patent GmbH
- Vijay Kris NARASIMHAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ruthenium-Containing Films Deposited On Ruthenium-Titanium Nitride...
- Publication number 20230049464
- Publication date Feb 16, 2023
- Merck Patent GmbH
- Guo LIU
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROCESS FOR THE PRODUCTION OF A MOLECULAR LAYER AND ELECTRONIC COMP...
- Publication number 20230002898
- Publication date Jan 5, 2023
- Merck Patent GmbH
- Peer KIRSCH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Compounds And Methods For Selectively Forming Metal-Containing Films
- Publication number 20220411930
- Publication date Dec 29, 2022
- Merck Patent GmbH
- Charith NANAYAKKARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RUTHENIUM PYRAZOLATE PRECURSOR FOR ATOMIC LAYER DEPOSITION AND SIMI...
- Publication number 20220341039
- Publication date Oct 27, 2022
- Merck Patent GmbH
- Guo LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITION OF HIGHLY SELECTIVE METAL FILMS
- Publication number 20210398848
- Publication date Dec 23, 2021
- The Regents of the University of California
- Ravindra KANJOLIA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF VAPOR DEPOSITION OF RUTHENIUM USING AN OXYGEN-FREE CO-RE...
- Publication number 20210047725
- Publication date Feb 18, 2021
- Merck Patent GmbH
- Jacob WOODRUFF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Atomic Layer Deposition For Selective Film Growth
- Publication number 20200283894
- Publication date Sep 10, 2020
- Merck Patent GmbH
- Jean-Sébastien LEHN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Jacob WOODRUFF

Person

Patents Grantslast 30 patents

Method for producing an electronic component which includes a self-...

Methods of vapor deposition of ruthenium using an oxygen-free co-re...

Methods of atomic layer deposition for selective film growth

Patents Applicationslast 30 patents

ATOMIC LAYER ETCHING OF METAL OXIDES USING NOVEL CO-REACTANTS AS HA...

Methods Of Forming Ruthenium-Containing Films Without A Co-Reactant

Methods Of Selectively Forming Metal-Containing Films

INHERENTLY FERROELECTRIC HF-ZR CONTAINING FILMS

Ruthenium-Containing Films Deposited On Ruthenium-Titanium Nitride...

PROCESS FOR THE PRODUCTION OF A MOLECULAR LAYER AND ELECTRONIC COMP...

Compounds And Methods For Selectively Forming Metal-Containing Films

RUTHENIUM PYRAZOLATE PRECURSOR FOR ATOMIC LAYER DEPOSITION AND SIMI...

METHOD FOR DEPOSITION OF HIGHLY SELECTIVE METAL FILMS

METHODS OF VAPOR DEPOSITION OF RUTHENIUM USING AN OXYGEN-FREE CO-RE...

Methods Of Atomic Layer Deposition For Selective Film Growth