Jacqueline S. Wrench

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Enhancing gapfill performance of dram word line
- Patent number 12,114,488
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Yong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 12,104,243
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Amorphous silicon-based scavenging and sealing EOT
- Patent number 12,100,595
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Yong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PMOS high-k metal gates
- Patent number 12,051,734
- Issue date Jul 30, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low resistivity DRAM buried word line stack
- Patent number 12,022,650
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
V-NAND stacks with dipole regions
- Patent number 11,997,849
- Issue date May 28, 2024
- Applied Materials, Inc.
- Yong Yang
- G11 - INFORMATION STORAGE
Information Patent Grant
Treatments to enhance material structures
- Patent number 11,961,734
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatments to enhance material structures
- Patent number 11,955,332
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor structures
- Patent number 11,908,914
- Issue date Feb 20, 2024
- Applied Materials, Inc.
- Ria Someshwar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic device having an oxygen free platinum group metal film
- Patent number 11,894,233
- Issue date Feb 6, 2024
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated dipole flow for transistor
- Patent number 11,888,045
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming molybdenum contacts
- Patent number 11,869,806
- Issue date Jan 9, 2024
- Applied Materials, Inc.
- Seshadri Ganguli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for reflector film growth
- Patent number 11,776,980
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Luping Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low resistivity DRAM buried word line stack
- Patent number 11,587,936
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PMOS high-K metal gates
- Patent number 11,552,177
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxygen free deposition of platinum group metal films
- Patent number 11,488,830
- Issue date Nov 1, 2022
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liner for V-NAND word line stack
- Patent number 11,476,267
- Issue date Oct 18, 2022
- Applied Materials, Inc.
- Jacqueline S. Wrench
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for high reflectivity aluminum layers
- Patent number 11,421,318
- Issue date Aug 23, 2022
- Applied Materials, Inc.
- Jacqueline Wrench
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Treatments to enhance material structures
- Patent number 11,417,517
- Issue date Aug 16, 2022
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming impurity free metal alloy films
- Patent number 11,359,282
- Issue date Jun 14, 2022
- Applied Materials, Inc.
- Geetika Bajaj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated dipole flow for transistor
- Patent number 11,245,022
- Issue date Feb 8, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine-doped nitride films for improved high-k reliability
- Patent number 11,171,047
- Issue date Nov 9, 2021
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for gapfill in substrates
- Patent number 11,101,128
- Issue date Aug 24, 2021
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ tungsten deposition without barrier layer
- Patent number 10,991,586
- Issue date Apr 27, 2021
- Applied Materials, Inc.
- Yong Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of cobalt films with high deposition rate
- Patent number 10,559,578
- Issue date Feb 11, 2020
- Applied Materials, Inc.
- Jacqueline S. Wrench
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR FORMING IMPURITY FREE METAL ALLOY FILMS
- Publication number 20240287678
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Geetika Bajaj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
V-NAND STACKS WITH DIPOLE REGIONS
- Publication number 20240268108
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Yong Yang
- G11 - INFORMATION STORAGE
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20240266163
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE SOLID REFILL CHAMBER
- Publication number 20240218506
- Publication date Jul 4, 2024
- ASM IP HOLDING B.V.
- Eric James Shero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR SOLID SOURCE REFILL
- Publication number 20240191352
- Publication date Jun 13, 2024
- ASM IP HOLDING B.V.
- Jereld Lee Winkler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR CLEANING A VESSEL
- Publication number 20240165681
- Publication date May 23, 2024
- ASM IP HOLDING B.V.
- Jereld Lee Winkler
- B08 - CLEANING
Information Patent Application
METHODS OF FORMING SEMICONDUCTOR STRUCTURES
- Publication number 20240154018
- Publication date May 9, 2024
- Applied Materials, Inc.
- Ria Someshwar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REACTANT DELIVERY SYSTEM AND REACTOR SYSTEM INCLUDING SAME
- Publication number 20240133033
- Publication date Apr 25, 2024
- ASM IP HOLDING B.V.
- Jacqueline Wrench
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING STRUCTURE INCLUDING A DOPED ADHESION FILM
- Publication number 20230349040
- Publication date Nov 2, 2023
- ASM IP HOLDING B.V.
- Moataz Bellah Mousa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW RESISTIVITY DRAM BURIED WORD LINE STACK
- Publication number 20230141748
- Publication date May 11, 2023
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PMOS HIGH-K METAL GATES
- Publication number 20230097400
- Publication date Mar 30, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxygen Free Deposition Of Platinum Group Metal Films
- Publication number 20230025937
- Publication date Jan 26, 2023
- Applied Materials, Inc.
- Yixiong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF FORMING SEMICONDUCTOR STRUCTURES
- Publication number 20230015781
- Publication date Jan 19, 2023
- Applied Materials, Inc.
- Ria Someshwar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINER FOR V-NAND WORD LINE STACK
- Publication number 20230005945
- Publication date Jan 5, 2023
- Applied Materials, Inc.
- Jacqueline S. Wrench
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220403505
- Publication date Dec 22, 2022
- Annamalai LAKSHMANAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
V-NAND STACKS WITH DIPOLE REGIONS
- Publication number 20220384469
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Yong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING MOLYBDENUM CONTACTS
- Publication number 20220359281
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Seshadri Ganguli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCING GAPFILL PERFORMANCE OF DRAM WORD LINE
- Publication number 20220359532
- Publication date Nov 10, 2022
- Applied Materials, Inc.
- Yong Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20220328308
- Publication date Oct 13, 2022
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Resistivity DRAM Buried Word Line Stack
- Publication number 20220278108
- Publication date Sep 1, 2022
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Resistivity Metal Contact Stack
- Publication number 20220277961
- Publication date Sep 1, 2022
- Applied Materials, Inc.
- Annamalai Lakshmanan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING IMPURITY FREE METAL ALLOY FILMS
- Publication number 20220267904
- Publication date Aug 25, 2022
- Applied Materials, Inc.
- Geetika Bajaj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TREATMENTS TO ENHANCE MATERIAL STRUCTURES
- Publication number 20220262629
- Publication date Aug 18, 2022
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Amorphous Silicon-Based Scavenging And Sealing EOT
- Publication number 20220254640
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- Yong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOSFET GATE ENGINEERINNG WITH DIPOLE FILMS
- Publication number 20220254900
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- Yong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THRESHOLD VOLTAGE MODULATION FOR GATE-ALL-AROUND FET ARCHITECTURE
- Publication number 20220238680
- Publication date Jul 28, 2022
- Applied Materials, Inc.
- Steven C. H. HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR METAL FILL IN METAL GATE STACK
- Publication number 20220165852
- Publication date May 26, 2022
- Applied Materials, Inc.
- Srinivas GANDIKOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED DIPOLE FLOW FOR TRANSISTOR
- Publication number 20220115516
- Publication date Apr 14, 2022
- Applied Materials, Inc.
- Yongjing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR SEAM REDUCTION OR ELIMINATION
- Publication number 20220108916
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Yixiong YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PMOS HIGH-K METAL GATES
- Publication number 20220077298
- Publication date Mar 10, 2022
- Applied Material, Inc.
- SRINIVAS GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS

Jacqueline S. Wrench

Person

Patents Grantslast 30 patents

Enhancing gapfill performance of dram word line

Methods and apparatus for processing a substrate

Amorphous silicon-based scavenging and sealing EOT

PMOS high-k metal gates

Low resistivity DRAM buried word line stack

V-NAND stacks with dipole regions

Treatments to enhance material structures

Treatments to enhance material structures

Methods of forming semiconductor structures

Electronic device having an oxygen free platinum group metal film

Integrated dipole flow for transistor

Methods of forming molybdenum contacts

Methods for reflector film growth

Low resistivity DRAM buried word line stack

PMOS high-K metal gates

Oxygen free deposition of platinum group metal films

Liner for V-NAND word line stack

Methods and apparatus for high reflectivity aluminum layers

Treatments to enhance material structures

Methods for forming impurity free metal alloy films

Integrated dipole flow for transistor

Fluorine-doped nitride films for improved high-k reliability

Methods for gapfill in substrates

In-situ tungsten deposition without barrier layer

Deposition of cobalt films with high deposition rate

Patents Applicationslast 30 patents

METHODS FOR FORMING IMPURITY FREE METAL ALLOY FILMS

V-NAND STACKS WITH DIPOLE REGIONS

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

REMOTE SOLID REFILL CHAMBER

METHODS AND APPARATUS FOR SOLID SOURCE REFILL

METHODS AND APPARATUS FOR CLEANING A VESSEL

METHODS OF FORMING SEMICONDUCTOR STRUCTURES

REACTANT DELIVERY SYSTEM AND REACTOR SYSTEM INCLUDING SAME

METHOD OF FORMING STRUCTURE INCLUDING A DOPED ADHESION FILM

LOW RESISTIVITY DRAM BURIED WORD LINE STACK

PMOS HIGH-K METAL GATES

Oxygen Free Deposition Of Platinum Group Metal Films

METHODS OF FORMING SEMICONDUCTOR STRUCTURES

LINER FOR V-NAND WORD LINE STACK

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

V-NAND STACKS WITH DIPOLE REGIONS

METHODS OF FORMING MOLYBDENUM CONTACTS

ENHANCING GAPFILL PERFORMANCE OF DRAM WORD LINE

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

Low Resistivity DRAM Buried Word Line Stack

Low Resistivity Metal Contact Stack

METHODS FOR FORMING IMPURITY FREE METAL ALLOY FILMS

TREATMENTS TO ENHANCE MATERIAL STRUCTURES

Amorphous Silicon-Based Scavenging And Sealing EOT

MOSFET GATE ENGINEERINNG WITH DIPOLE FILMS

THRESHOLD VOLTAGE MODULATION FOR GATE-ALL-AROUND FET ARCHITECTURE

METHODS AND APPARATUS FOR METAL FILL IN METAL GATE STACK

INTEGRATED DIPOLE FLOW FOR TRANSISTOR

METHODS AND APPARATUS FOR SEAM REDUCTION OR ELIMINATION

PMOS HIGH-K METAL GATES