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Misato, JP
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last 30 patents
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Patent Grant
Method of processing resist onto substrate and resist processing ap...
Patent number
6,097,469
Issue date
Aug 1, 2000
Tokyo Electron Limited
Hidetami Yaegashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of processing resist utilizing alkaline component monitoring
Patent number
6,017,663
Issue date
Jan 25, 2000
Tokyo Electron Limited
Hidetami Yaegashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of processing resist utilizing alkaline component monitoring
Patent number
5,932,380
Issue date
Aug 3, 1999
Tokyo Electron Limited
Hidetami Yaegashi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY