Jaein AHN

Person

Seongnam-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing pad comprising window similar in hardness to polishing layer
- Patent number 11,964,360
- Issue date Apr 23, 2024
- SK ENPULSE CO., LTD.
- Sunghoon Yun
- B24 - GRINDING POLISHING
Information Patent Grant
Porous polishing pad and process for producing the same all fees
- Patent number 11,772,236
- Issue date Oct 3, 2023
- SK ENPULSE CO., LTD.
- Hye Young Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Porous polyurethane polishing pad and process for producing the same
- Patent number 11,766,759
- Issue date Sep 26, 2023
- SK ENPULSE CO., LTD.
- Hye Young Heo
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad, method for manufacturing polishing pad, and polishin...
- Patent number 11,628,535
- Issue date Apr 18, 2023
- SKC SOLMICS CO., LTD.
- Jaein Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing pad having excellent airtightness
- Patent number 11,571,783
- Issue date Feb 7, 2023
- SKC solmics Co., Ltd.
- Sunghoon Yun
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with improved fluidity of slurry and process for prep...
- Patent number 11,534,888
- Issue date Dec 27, 2022
- SKC solmics Co., Ltd.
- Sunghoon Yun
- B24 - GRINDING POLISHING
Information Patent Grant
Leakage-proof polishing pad and process for preparing the same
- Patent number 11,267,098
- Issue date Mar 8, 2022
- SKC solmics Co., Ltd.
- Sunghoon Yun
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad that minimizes occurrence of defects and process for...
- Patent number 11,000,935
- Issue date May 11, 2021
- SKC solmics Co., Ltd.
- Sunghoon Yun
- B24 - GRINDING POLISHING
Information Patent Grant
Porous polyurethane polishing pad and process for preparing a semic...
- Patent number 10,518,383
- Issue date Dec 31, 2019
- SKC Co., Ltd
- Jaein Ahn
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Porous polyurethane polishing pad and process for preparing a semic...
- Patent number 10,513,007
- Issue date Dec 24, 2019
- SKC Co., Ltd
- Jaein Ahn
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
POLISHING PAD AND METHOD FOR PREPARING SEMICONDUCTOR DEVICE USING T...
- Publication number 20220059401
- Publication date Feb 24, 2022
- SKC solmics Co., Ltd.
- Jong Wook YUN
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD HAVING EXCELLENT AIRTIGHTNESS
- Publication number 20210291314
- Publication date Sep 23, 2021
- SKC CO., LTD.
- Sunghoon YUN
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD, PREPARATION METHOD THEREOF, AND PREPARATION METHOD O...
- Publication number 20210162560
- Publication date Jun 3, 2021
- SKC CO., LTD.
- Jaein AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING PAD, PREPARATION METHOD THEREOF, AND PREPARATION METHOD O...
- Publication number 20210154797
- Publication date May 27, 2021
- SKC CO., LTD.
- Hyeyoung HEO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING PAD, METHOD FOR MANUFACTURING POLISHING PAD, AND POLISHIN...
- Publication number 20210094143
- Publication date Apr 1, 2021
- SKC CO., LTD.
- Jaein AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING PAD, METHOD FOR MANUFACTURING POLISHING PAD, AND POLISHIN...
- Publication number 20210094144
- Publication date Apr 1, 2021
- SKC CO., LTD.
- Jaein AHN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLISHING PAD THAT MINIMIZES OCCURRENCE OF DEFECTS AND PROCESS FOR...
- Publication number 20200306921
- Publication date Oct 1, 2020
- SKC CO., LTD.
- Sunghoon YUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING PAD COMPRISING WINDOW SIMILAR IN HARDNESS TO POLISHING LAYER
- Publication number 20200164483
- Publication date May 28, 2020
- SKC CO., LTD.
- Sunghoon YUN
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH IMPROVED FLUIDITY OF SLURRY AND PROCESS FOR PREP...
- Publication number 20190389033
- Publication date Dec 26, 2019
- SKC CO., LTD.
- Sunghoon YUN
- B24 - GRINDING POLISHING
Information Patent Application
POROUS POLYURETHANE POLISHING PAD AND PROCESS FOR PRODUCING THE SAME
- Publication number 20190321937
- Publication date Oct 24, 2019
- SKC CO., LTD.
- Hye Young HEO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POROUS POLISHING PAD AND PROCESS FOR PRODUCING THE SAME
- Publication number 20190314954
- Publication date Oct 17, 2019
- SKC CO., LTD.
- Hye Young HEO
- B24 - GRINDING POLISHING
Information Patent Application
LEAKAGE-PROOF POLISHING PAD AND PROCESS FOR PREPARING THE SAME
- Publication number 20190111542
- Publication date Apr 18, 2019
- SKC CO., LTD.
- Sunghoon YUN
- B24 - GRINDING POLISHING
Information Patent Application
POROUS POLYURETHANE POLISHING PAD AND PROCESS FOR PREPARING A SEMIC...
- Publication number 20180339393
- Publication date Nov 29, 2018
- SKC CO., LTD.
- Jaein AHN
- B24 - GRINDING POLISHING
Information Patent Application
POROUS POLYURETHANE POLISHING PAD AND PROCESS FOR PREPARING A SEMIC...
- Publication number 20180339394
- Publication date Nov 29, 2018
- SKC CO., LTD.
- Jaein AHN
- B24 - GRINDING POLISHING

Person

Patents Grantslast 30 patents

Polishing pad comprising window similar in hardness to polishing layer

Porous polishing pad and process for producing the same all fees

Porous polyurethane polishing pad and process for producing the same

Polishing pad, method for manufacturing polishing pad, and polishin...

Polishing pad having excellent airtightness

Polishing pad with improved fluidity of slurry and process for prep...

Leakage-proof polishing pad and process for preparing the same

Polishing pad that minimizes occurrence of defects and process for...

Porous polyurethane polishing pad and process for preparing a semic...

Porous polyurethane polishing pad and process for preparing a semic...

Patents Applicationslast 30 patents

POLISHING PAD AND METHOD FOR PREPARING SEMICONDUCTOR DEVICE USING T...

POLISHING PAD HAVING EXCELLENT AIRTIGHTNESS

POLISHING PAD, PREPARATION METHOD THEREOF, AND PREPARATION METHOD O...

POLISHING PAD, PREPARATION METHOD THEREOF, AND PREPARATION METHOD O...

POLISHING PAD, METHOD FOR MANUFACTURING POLISHING PAD, AND POLISHIN...

POLISHING PAD, METHOD FOR MANUFACTURING POLISHING PAD, AND POLISHIN...

POLISHING PAD THAT MINIMIZES OCCURRENCE OF DEFECTS AND PROCESS FOR...

POLISHING PAD COMPRISING WINDOW SIMILAR IN HARDNESS TO POLISHING LAYER

POLISHING PAD WITH IMPROVED FLUIDITY OF SLURRY AND PROCESS FOR PREP...

POROUS POLYURETHANE POLISHING PAD AND PROCESS FOR PRODUCING THE SAME

POROUS POLISHING PAD AND PROCESS FOR PRODUCING THE SAME

LEAKAGE-PROOF POLISHING PAD AND PROCESS FOR PREPARING THE SAME

POROUS POLYURETHANE POLISHING PAD AND PROCESS FOR PREPARING A SEMIC...

POROUS POLYURETHANE POLISHING PAD AND PROCESS FOR PREPARING A SEMIC...