Jaesoon Lim

Person

Seoul, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Capacitor and memory device
- Patent number 12,029,027
- Issue date Jul 2, 2024
- Samsung Electronics Co., Ltd.
- Cheoljin Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor and DRAM device including the same
- Patent number 11,678,476
- Issue date Jun 13, 2023
- Samsung Electronics Co., Ltd.
- Cheoljin Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal compounds and methods of fabricating semiconductor devices us...
- Patent number 11,524,973
- Issue date Dec 13, 2022
- Samsung Electronics Co., Ltd.
- Seung-Min Ryu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Niobium compound and method of forming thin film
- Patent number 11,466,043
- Issue date Oct 11, 2022
- Samsung Electronics Co., Ltd.
- Soyoung Lee
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Aluminum compound and method for manufacturing semiconductor device...
- Patent number 11,332,486
- Issue date May 17, 2022
- Samsung Electronics Co., Ltd.
- Gyu-Hee Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cobalt precursor and methods for manufacture using the same
- Patent number 11,254,698
- Issue date Feb 22, 2022
- Samsung Electronics Co., Ltd.
- Soyoung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 11,081,389
- Issue date Aug 3, 2021
- Samsung Electronics Co., Ltd.
- Seung-min Ryu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tungsten precursor and method of forming Tungsten containing layer...
- Patent number 10,900,119
- Issue date Jan 26, 2021
- Samsung Electronics Co., Ltd.
- Soyoung Lee
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of fabricating semiconductor device
- Patent number 10,847,362
- Issue date Nov 24, 2020
- Samsung Electronics Co., Ltd.
- Gyu-Hee Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor devices including a dielectric layer
- Patent number 7,989,877
- Issue date Aug 2, 2011
- Samsung Electronics Co., Ltd.
- Jaesoon Lim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CAPACITOR AND MEMORY DEVICE
- Publication number 20240315003
- Publication date Sep 19, 2024
- Samsung Electronics Co., Ltd.
- Cheoljin CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20240162281
- Publication date May 16, 2024
- Samsung Electronics Co., Ltd.
- Intak JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DE...
- Publication number 20240021427
- Publication date Jan 18, 2024
- Samsung Electronics Co., Ltd.
- Jungmin Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING CAPACITOR AND METHOD OF MANUFACTURING DRAM ELEMEN...
- Publication number 20230363135
- Publication date Nov 9, 2023
- Samsung Electronics Co., Ltd.
- Jimin CHAE
Information Patent Application
CAPACITOR AND MEMORY DEVICE
- Publication number 20230328958
- Publication date Oct 12, 2023
- Samsung Electronics Co., Ltd.
- Cheoljin CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SELECTIVELY FORMING COBALT METAL LAYER BY USING COBALT CO...
- Publication number 20230257409
- Publication date Aug 17, 2023
- Samsung Electronics Co., Ltd.
- Soyoung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITOR AND DRAM DEVICE INCLUDING THE SAME
- Publication number 20220093603
- Publication date Mar 24, 2022
- Samsung Electronics Co., Ltd.
- Cheoljin CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NIOBIUM COMPOUND AND METHOD OF FORMING THIN FILM
- Publication number 20210040130
- Publication date Feb 11, 2021
- ADEKA CORPORATION
- Soyoung LEE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF SELECTIVELY FORMING COBALT METAL LAYER BY USING COBALT CO...
- Publication number 20210032279
- Publication date Feb 4, 2021
- Samsung Electronics Co., Ltd.
- Soyoung LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL COMPOUNDS AND METHODS OF FABRICATING SEMICONDUCTOR DEVICES US...
- Publication number 20200361970
- Publication date Nov 19, 2020
- Samsung Electronics Co., Ltd.
- SEUNG-MIN RYU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COBALT PRECURSOR AND METHODS FOR MANUFACTURE USING THE SAME
- Publication number 20200339618
- Publication date Oct 29, 2020
- Samsung Electronics Co., Ltd.
- Soyoung Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20200273747
- Publication date Aug 27, 2020
- Samsung Electronics Co., Ltd.
- Seung-min RYU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN COMPOUND, TIN PRECURSOR COMPOUND FOR FORMING A TIN-CONTAINING L...
- Publication number 20200231610
- Publication date Jul 23, 2020
- Samsung Electronics Co., Ltd.
- Seung-Min RYU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALUMINUM COMPOUND AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE...
- Publication number 20200207790
- Publication date Jul 2, 2020
- Samsung Electronics Co., Ltd.
- Gyu-Hee Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20190304770
- Publication date Oct 3, 2019
- Samsung Electronics Co., Ltd.
- Gyu-Hee PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN PRECURSOR AND METHOD OF FORMING TUNGSTEN CONTAINING LAYER...
- Publication number 20180363131
- Publication date Dec 20, 2018
- Samsung Electronics Co., Ltd.
- Soyoung Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor devices including a dielectric layer
- Publication number 20100127319
- Publication date May 27, 2010
- Jaesoon Lim
- H01 - BASIC ELECTRIC ELEMENTS

Jaesoon Lim

Person

Patents Grantslast 30 patents

Capacitor and memory device

Capacitor and DRAM device including the same

Metal compounds and methods of fabricating semiconductor devices us...

Niobium compound and method of forming thin film

Aluminum compound and method for manufacturing semiconductor device...

Cobalt precursor and methods for manufacture using the same

Method of manufacturing semiconductor device

Tungsten precursor and method of forming Tungsten containing layer...

Method of fabricating semiconductor device

Semiconductor devices including a dielectric layer

Patents Applicationslast 30 patents

CAPACITOR AND MEMORY DEVICE

SEMICONDUCTOR DEVICE

METHOD OF FORMING FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DE...

METHOD OF FORMING CAPACITOR AND METHOD OF MANUFACTURING DRAM ELEMEN...

CAPACITOR AND MEMORY DEVICE

METHOD OF SELECTIVELY FORMING COBALT METAL LAYER BY USING COBALT CO...

CAPACITOR AND DRAM DEVICE INCLUDING THE SAME

NIOBIUM COMPOUND AND METHOD OF FORMING THIN FILM

METHOD OF SELECTIVELY FORMING COBALT METAL LAYER BY USING COBALT CO...

METAL COMPOUNDS AND METHODS OF FABRICATING SEMICONDUCTOR DEVICES US...

COBALT PRECURSOR AND METHODS FOR MANUFACTURE USING THE SAME

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

TIN COMPOUND, TIN PRECURSOR COMPOUND FOR FORMING A TIN-CONTAINING L...

ALUMINUM COMPOUND AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE...

METHOD OF FABRICATING SEMICONDUCTOR DEVICE

TUNGSTEN PRECURSOR AND METHOD OF FORMING TUNGSTEN CONTAINING LAYER...

Semiconductor devices including a dielectric layer