Jairaj J. PAYYAPILLY

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Sunnyvale, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for in-situ protection liners for high aspect...
- Patent number 11,373,877
- Issue date Jun 28, 2022
- Applied Materials, Inc.
- Daisuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching oxide-nitride stacks using C4F6H2
- Patent number 9,748,366
- Issue date Aug 29, 2017
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch processes for opening mask layers
- Patent number 9,305,804
- Issue date Apr 5, 2016
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch processes for boron-doped carbonaceous mask layers
- Patent number 8,778,207
- Issue date Jul 15, 2014
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND APPARATUS FOR IN-SITU PROTECTION LINERS FOR HIGH ASPECT...
- Publication number 20210320012
- Publication date Oct 14, 2021
- Applied Materials, Inc.
- Daisuke SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING OXIDE-NITRIDE STACKS USING C4F6H2
- Publication number 20150097276
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Jong Mun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCH PROCESSES FOR OPENING MASK LAYERS
- Publication number 20150099367
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Jong Mun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCHING OXIDE LAYERS USING PROCESS GAS PULSING
- Publication number 20130224960
- Publication date Aug 29, 2013
- Applied Materials, Inc.
- Jairaj Payyapilly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING HIGH ASPECT RATIO FEATURES IN A DIELECTRIC LAYER
- Publication number 20130122712
- Publication date May 16, 2013
- Jong Mun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCH PROCESSES FOR BORON-DOPED CARBONACEOUS MASK LAYERS
- Publication number 20130109188
- Publication date May 2, 2013
- Jong Mun KIM
- H01 - BASIC ELECTRIC ELEMENTS