James A. Tornello

Person

Cortlandt Manor, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Indium phosphide smoothing and chemical mechanical planarization pr...
- Patent number 10,262,866
- Issue date Apr 16, 2019
- International Business Machines Corporation
- Henry A. Beveridge
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Indium phosphide smoothing and chemical mechanical planarization pr...
- Patent number 9,916,985
- Issue date Mar 13, 2018
- International Business Machines Corporation
- Henry A. Beveridge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Germanium smoothing and chemical mechanical planarization processes
- Patent number 9,890,300
- Issue date Feb 13, 2018
- International Business Machines Corporation
- Tatsuyoshi Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Group III arsenide material smoothing and chemical mechanical plana...
- Patent number 9,646,841
- Issue date May 9, 2017
- International Business Machines Corporation
- Henry A. Beveridge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Germanium smoothing and chemical mechanical planarization processes
- Patent number 9,646,842
- Issue date May 9, 2017
- International Business Machines Corporation
- Tatsuyoshi Kawamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-yield method of exposing and contacting through-silicon vias
- Patent number 8,263,497
- Issue date Sep 11, 2012
- International Business Machines Corporation
- Paul S. Andry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Glass mold polishing method and structure
- Patent number 7,955,160
- Issue date Jun 7, 2011
- International Business Machines Corporation
- Michael A. Cobb
- B24 - GRINDING POLISHING
Information Patent Grant
Method of forming noble metal contacts
- Patent number 7,581,314
- Issue date Sep 1, 2009
- International Business Machines Corporation
- Hariklia Deligianni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Noble metal contacts for micro-electromechanical switches
- Patent number 7,202,764
- Issue date Apr 10, 2007
- International Business Machines Corporation
- Hariklia Deligianni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Materials and method to seal vias in silicon substrates
- Patent number 7,199,450
- Issue date Apr 3, 2007
- International Business Machines Corporation
- Jon A. Casey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Slurry for mechanical polishing (CMP) of metals and use thereof
- Patent number 6,812,193
- Issue date Nov 2, 2004
- International Business Machines Corporation
- Michael Todd Brigham
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
MEMS encapsulated structure and method of making same
- Patent number 6,800,503
- Issue date Oct 5, 2004
- International Business Machines Corporation
- Joseph T. Kocis
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Process to increase reliability CuBEOL structures
- Patent number 6,503,834
- Issue date Jan 7, 2003
- International Business Machines Corp.
- Xiaomeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for planarizing photoresist
- Patent number 6,361,402
- Issue date Mar 26, 2002
- International Business Machines Corporation
- Donald F. Canaperi
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
INDIUM PHOSPHIDE SMOOTHING AND CHEMICAL MECHANICAL PLANARIZATION PR...
- Publication number 20180166292
- Publication date Jun 14, 2018
- International Business Machines Corporation
- Henry A. Beveridge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GERMANIUM SMOOTHING AND CHEMICAL MECHANICAL PLANARIZATION PROCESSES
- Publication number 20170218229
- Publication date Aug 3, 2017
- International Business Machines Corporation
- Tatsuyoshi Kawamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
GROUP III ARSENIDE MATERIAL SMOOTHING AND CHEMICAL MECHANICAL PLANA...
- Publication number 20170110333
- Publication date Apr 20, 2017
- International Business Machines Corporation
- Henry A. Beveridge
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
INDIUM PHOSPHIDE SMOOTHING AND CHEMICAL MECHANICAL PLANARIZATION PR...
- Publication number 20170110332
- Publication date Apr 20, 2017
- International Business Machines Corporation
- Henry A. Beveridge
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
GERMANIUM SMOOTHING AND CHEMICAL MECHANICAL PLANARIZATION PROCESSES
- Publication number 20170110334
- Publication date Apr 20, 2017
- International Business Machines Corporation
- Tatsuyoshi Kawamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
HIGH-YIELD METHOD OF EXPOSING AND CONTACTING THROUGH-SILICON VIAS
- Publication number 20100178766
- Publication date Jul 15, 2010
- International Business Machines Corporation
- Paul S. Andry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GLASS MOLD POLISHING METHOD AND STRUCTURE
- Publication number 20090305616
- Publication date Dec 10, 2009
- Michael A. Cobb
- B24 - GRINDING POLISHING
Information Patent Application
MATERIALS AND METHOD TO SEAL VIAS IN SILICON SUBSTRATES
- Publication number 20060255480
- Publication date Nov 16, 2006
- International Business Machines Corporation
- Jon A. Casey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Noble metal contacts for micro-electromechanical switches
- Publication number 20060164194
- Publication date Jul 27, 2006
- Hariklia Deligianni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOBLE METAL CONTACTS FOR MICRO-ELECTROMECHANICAL SWITCHES
- Publication number 20050007217
- Publication date Jan 13, 2005
- International Business Machines Corporation
- Hariklia Deligianni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMS encapsulated structure and method of making same
- Publication number 20040097003
- Publication date May 20, 2004
- International Business Machines Corporation
- Joseph T. Kocis
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Slurry for mechanical polishing (CMP) of metals and use thereof
- Publication number 20030073593
- Publication date Apr 17, 2003
- Michael Todd Brigham
- H01 - BASIC ELECTRIC ELEMENTS

James A. Tornello

Person

Patents Grantslast 30 patents

Indium phosphide smoothing and chemical mechanical planarization pr...

Indium phosphide smoothing and chemical mechanical planarization pr...

Germanium smoothing and chemical mechanical planarization processes

Group III arsenide material smoothing and chemical mechanical plana...

Germanium smoothing and chemical mechanical planarization processes

High-yield method of exposing and contacting through-silicon vias

Glass mold polishing method and structure

Method of forming noble metal contacts

Noble metal contacts for micro-electromechanical switches

Materials and method to seal vias in silicon substrates

Slurry for mechanical polishing (CMP) of metals and use thereof

MEMS encapsulated structure and method of making same

Process to increase reliability CuBEOL structures

Method for planarizing photoresist

Patents Applicationslast 30 patents

INDIUM PHOSPHIDE SMOOTHING AND CHEMICAL MECHANICAL PLANARIZATION PR...

GERMANIUM SMOOTHING AND CHEMICAL MECHANICAL PLANARIZATION PROCESSES

GROUP III ARSENIDE MATERIAL SMOOTHING AND CHEMICAL MECHANICAL PLANA...

INDIUM PHOSPHIDE SMOOTHING AND CHEMICAL MECHANICAL PLANARIZATION PR...

GERMANIUM SMOOTHING AND CHEMICAL MECHANICAL PLANARIZATION PROCESSES

HIGH-YIELD METHOD OF EXPOSING AND CONTACTING THROUGH-SILICON VIAS

GLASS MOLD POLISHING METHOD AND STRUCTURE

MATERIALS AND METHOD TO SEAL VIAS IN SILICON SUBSTRATES

Noble metal contacts for micro-electromechanical switches

NOBLE METAL CONTACTS FOR MICRO-ELECTROMECHANICAL SWITCHES

MEMS encapsulated structure and method of making same

Slurry for mechanical polishing (CMP) of metals and use thereof