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James Allan Bondur
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Walden, NY, US
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last 30 patents
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Patent Grant
Gas mixture and method for anisotropic selective etch of nitride
Patent number
4,832,787
Issue date
May 23, 1989
International Business Machines Corporation
James A. Bondur
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
RIE process for etching silicon isolation trenches and polycides wi...
Patent number
4,726,879
Issue date
Feb 23, 1988
International Business Machines Corporation
James A. Bondur
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Reactive ion etching method for producing deep dielectric isolation...
Patent number
4,139,442
Issue date
Feb 13, 1979
International Business Machines Corporation
James A. Bondur
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for forming isolated regions of silicon utilizing reactive i...
Patent number
4,104,086
Issue date
Aug 1, 1978
International Business Machines Corporation
James Allan Bondur
H01 - BASIC ELECTRIC ELEMENTS