James D. Carducci

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Continuous liner for use in a processing chamber
- Patent number 12,163,218
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Monolithic modular microwave source with integrated temperature con...
- Patent number 12,144,090
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- James Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Modular microwave source with multiple metal housings
- Patent number 12,033,835
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Philip Allan Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,935,724
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monolithic modular microwave source with integrated process gas dis...
- Patent number 11,881,384
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- James Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Continuous liner for use in a processing chamber
- Patent number 11,814,724
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Modular microwave source with embedded ground surface
- Patent number 11,670,489
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,587,766
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monolithic modular microwave source with integrated temperature con...
- Patent number 11,564,292
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- James Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Continuous liner for use in a processing chamber
- Patent number 11,499,223
- Issue date Nov 15, 2022
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with electrode filaments extending from ceiling
- Patent number 11,424,104
- Issue date Aug 23, 2022
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with electrode assembly for moving substrate
- Patent number 11,355,321
- Issue date Jun 7, 2022
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric plasma process chamber
- Patent number 11,315,760
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Showerhead with interlaced gas feed and removal and methods of use
- Patent number 11,189,502
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with electrode array in ceiling
- Patent number 11,114,284
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion-ion plasma atomic layer etch process
- Patent number 11,101,113
- Issue date Aug 24, 2021
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave source with embedded ground surface
- Patent number 11,049,694
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution plate assembly for high power plasma etch processes
- Patent number 11,043,360
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,043,361
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetrical plural-coil plasma source with side RF feeds and RF dis...
- Patent number 10,811,226
- Issue date Oct 20, 2020
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for controlling temperature uniformity of a showerhead
- Patent number 10,780,447
- Issue date Sep 22, 2020
- Applied Materials, Inc.
- Richard Fovell
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Distributed electrode array for plasma processing
- Patent number 10,615,004
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,615,006
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,580,620
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,546,728
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,535,502
- Issue date Jan 14, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Processing tool with electrically switched electrode assembly
- Patent number 10,510,515
- Issue date Dec 17, 2019
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion-ion plasma atomic layer etch process and reactor
- Patent number 10,475,626
- Issue date Nov 12, 2019
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma process chamber
- Patent number 10,453,656
- Issue date Oct 22, 2019
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Distributed electrode array for plasma processing
- Patent number 10,418,225
- Issue date Sep 17, 2019
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED PROCESS GAS DIS...
- Publication number 20240186118
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- JAMES CARDUCCI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER
- Publication number 20240011153
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20230197406
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT GAP PUMPING TO PREVENT GLOW DISCHARGE AND LIGHT-UP
- Publication number 20230197495
- Publication date Jun 22, 2023
- James David CARDUCCI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER
- Publication number 20230175123
- Publication date Jun 8, 2023
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CHAMBER WITH A MULTIPHASE ROTATING GAS CROSS-FLOW AND PERIPH...
- Publication number 20230162950
- Publication date May 25, 2023
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED TEMPERATURE CON...
- Publication number 20230135935
- Publication date May 4, 2023
- Applied Materials, Inc.
- James Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA CHAMBER WITH A MULTIPHASE ROTATING CROSS-FLOW WITH UNIFORMIT...
- Publication number 20230057145
- Publication date Feb 23, 2023
- Applied Materials, Inc.
- DAISUKE SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE EDGE RING THAT EXTENDS PROCESS ENVIRONMENT BEYOND SUBSTRA...
- Publication number 20220293397
- Publication date Sep 15, 2022
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20220254606
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER
- Publication number 20220186366
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CHAMBER WITH MULTIPHASE ROTATING INDEPENDENT GAS CROSS-FLOW...
- Publication number 20220084795
- Publication date Mar 17, 2022
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER WITH A MULTIPHASE ROTATING MODULATED CROSS-FLOW
- Publication number 20220084794
- Publication date Mar 17, 2022
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Showerhead With Interlaced Gas Feed And Removal And Methods Of Use
- Publication number 20220051910
- Publication date Feb 17, 2022
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH MULTIPLE METAL HOUSINGS
- Publication number 20210391149
- Publication date Dec 16, 2021
- Applied Materials, Inc.
- Philip Allan Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE
- Publication number 20210313153
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20210313147
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED PROCESS GAS DIS...
- Publication number 20210098231
- Publication date Apr 1, 2021
- Applied Materials, Inc.
- James Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE
- Publication number 20210098236
- Publication date Apr 1, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED TEMPERATURE CON...
- Publication number 20210100076
- Publication date Apr 1, 2021
- Applied Materials, Inc.
- James Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYMMETRIC PLASMA PROCESS CHAMBER
- Publication number 20200185192
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- James D. Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ION-ION PLASMA ATOMIC LAYER ETCH PROCESS
- Publication number 20200035454
- Publication date Jan 30, 2020
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD WITH INTERLACED GAS FEED AND REMOVAL AND METHODS OF USE
- Publication number 20190311920
- Publication date Oct 10, 2019
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING
- Publication number 20190287765
- Publication date Sep 19, 2019
- Applied Materials, Inc.
- Kenneth S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS
- Publication number 20190228970
- Publication date Jul 25, 2019
- Applied Materials, Inc.
- Yang YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR SHIELDING SUBSTRATE SUPPORTS
- Publication number 20190115246
- Publication date Apr 18, 2019
- Kartik RAMASWAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Reactor Having Radial Struts for Substrate Support
- Publication number 20190085467
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING
- Publication number 20190057840
- Publication date Feb 21, 2019
- Applied Materials, Inc.
- Kenneth S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING
- Publication number 20190057841
- Publication date Feb 21, 2019
- Applied Materials, Inc.
- Kenneth S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING
- Publication number 20190051496
- Publication date Feb 14, 2019
- Applied Materials, Inc.
- Kenneth S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS

James D. Carducci

Person

Patents Grantslast 30 patents

Continuous liner for use in a processing chamber

Monolithic modular microwave source with integrated temperature con...

Modular microwave source with multiple metal housings

Symmetric VHF source for a plasma reactor

Monolithic modular microwave source with integrated process gas dis...

Continuous liner for use in a processing chamber

Modular microwave source with embedded ground surface

Symmetric VHF source for a plasma reactor

Monolithic modular microwave source with integrated temperature con...

Continuous liner for use in a processing chamber

Plasma reactor with electrode filaments extending from ceiling

Plasma reactor with electrode assembly for moving substrate

Symmetric plasma process chamber

Showerhead with interlaced gas feed and removal and methods of use

Plasma reactor with electrode array in ceiling

Ion-ion plasma atomic layer etch process

Modular microwave source with embedded ground surface

Gas distribution plate assembly for high power plasma etch processes

Symmetric VHF source for a plasma reactor

Symmetrical plural-coil plasma source with side RF feeds and RF dis...

Apparatus for controlling temperature uniformity of a showerhead

Distributed electrode array for plasma processing

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Processing tool with electrically switched electrode assembly

Ion-ion plasma atomic layer etch process and reactor

Symmetric plasma process chamber

Distributed electrode array for plasma processing

Patents Applicationslast 30 patents

MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED PROCESS GAS DIS...

CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

SUBSTRATE SUPPORT GAP PUMPING TO PREVENT GLOW DISCHARGE AND LIGHT-UP

CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER

PLASMA CHAMBER WITH A MULTIPHASE ROTATING GAS CROSS-FLOW AND PERIPH...

MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED TEMPERATURE CON...

PLASMA CHAMBER WITH A MULTIPHASE ROTATING CROSS-FLOW WITH UNIFORMIT...

SUBSTRATE EDGE RING THAT EXTENDS PROCESS ENVIRONMENT BEYOND SUBSTRA...

SYMMETRIC PLASMA PROCESS CHAMBER

CONTINUOUS LINER FOR USE IN A PROCESSING CHAMBER

PLASMA CHAMBER WITH MULTIPHASE ROTATING INDEPENDENT GAS CROSS-FLOW...

PLASMA CHAMBER WITH A MULTIPHASE ROTATING MODULATED CROSS-FLOW

Showerhead With Interlaced Gas Feed And Removal And Methods Of Use

MODULAR MICROWAVE SOURCE WITH MULTIPLE METAL HOUSINGS

MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED PROCESS GAS DIS...

MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE

MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED TEMPERATURE CON...

SYMMETRIC PLASMA PROCESS CHAMBER

ION-ION PLASMA ATOMIC LAYER ETCH PROCESS

SHOWERHEAD WITH INTERLACED GAS FEED AND REMOVAL AND METHODS OF USE

DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING

DIAMOND LIKE CARBON LAYER FORMED BY AN ELECTRON BEAM PLASMA PROCESS

METHODS AND APPARATUS FOR SHIELDING SUBSTRATE SUPPORTS

Plasma Reactor Having Radial Struts for Substrate Support

DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING

DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING

DISTRIBUTED ELECTRODE ARRAY FOR PLASMA PROCESSING