James G. Tsacoyeanes

Person

Southbury, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method utilizing an electrooptic modulator
- Patent number 8,879,045
- Issue date Nov 4, 2014
- ASML Holding N.V.
- James G. Tsacoyeanes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system with low telecentricity error and dynamic telec...
- Patent number 8,013,979
- Issue date Sep 6, 2011
- ASML Holding N.V.
- Lev Ryzhikov
- G02 - OPTICS
Information Patent Grant
System and method utilizing an electrooptic modulator
- Patent number 7,876,420
- Issue date Jan 25, 2011
- ASML Holding N.V.
- James G. Tsacoyeanes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spatial light modulator using an integrated circuit actuator and me...
- Patent number 7,525,718
- Issue date Apr 28, 2009
- ASML Holding N.V.
- Pradeep K. Govil
- G02 - OPTICS
Information Patent Grant
Spatial light modulator using an integrated circuit actuator
- Patent number 7,385,750
- Issue date Jun 10, 2008
- ASML Holding N.V.
- Pradeep K. Govil
- G02 - OPTICS
Information Patent Grant
Advanced illumination system for use in microlithography
- Patent number 7,187,430
- Issue date Mar 6, 2007
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method utilizing an electrooptic modulator
- Patent number 7,142,353
- Issue date Nov 28, 2006
- ASML Holding N.V.
- James G. Tsacoyeanes
- G02 - OPTICS
Information Patent Grant
System and method for laser beam expansion
- Patent number 7,006,198
- Issue date Feb 28, 2006
- ASML Holding N.V.
- Walter Augustyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
DUV scanner linewidth control by mask error factor compensation
- Patent number 6,922,230
- Issue date Jul 26, 2005
- ASML Holding N.V.
- Pradeep K. Govil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for improving linewidth control in a lithography...
- Patent number 6,888,615
- Issue date May 3, 2005
- ASML Holding N.V.
- James G. Tsacoyeanes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for laser beam expansion
- Patent number 6,819,402
- Issue date Nov 16, 2004
- ASML Holding N.V.
- Walter Augustyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Advanced illumination system for use in microlithography
- Patent number 6,813,003
- Issue date Nov 2, 2004
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for improving line width control in a lithography...
- Patent number 6,784,976
- Issue date Aug 31, 2004
- ASML Holding N.V.
- Scott D. Coston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Advanced illumination system for use in microlithography
- Patent number 6,775,069
- Issue date Aug 10, 2004
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
DUV scanner linewidth control by mask error factor compensation
- Patent number 6,573,975
- Issue date Jun 3, 2003
- Pradeep K. Govil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for selective linewidth optimization during a lit...
- Patent number 6,509,952
- Issue date Jan 21, 2003
- Silicon Valley Group, Inc.
- Pradeep Kumar Govil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method Utilizing an Electrooptic Modulator
- Publication number 20110075236
- Publication date Mar 31, 2011
- ASML Holding N.V.
- James G. Tsacoyeanes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination System with Low Telecentricity Error and Dynamic Telec...
- Publication number 20090046373
- Publication date Feb 19, 2009
- ASML Holding N.V.
- Lev Ryzhikov
- G02 - OPTICS
Information Patent Application
Spatial Light Modulator Using an Integrated Circuit Actuator and Me...
- Publication number 20080231937
- Publication date Sep 25, 2008
- ASML Holding N.V.
- Pradeep K. GOVIL
- G02 - OPTICS
Information Patent Application
Advanced Illumination System for Use in Microlithography
- Publication number 20070146674
- Publication date Jun 28, 2007
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method utilizing an electrooptic modulator
- Publication number 20060164711
- Publication date Jul 27, 2006
- ASML Holding N.V.
- Pradeep K. Govil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method utilizing an electrooptic modulator
- Publication number 20060121375
- Publication date Jun 8, 2006
- ASML Holding N.V.
- James G. Tsacoyeanes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method utilizing an electrooptic modulator
- Publication number 20060087720
- Publication date Apr 27, 2006
- ASML Holding N.V.
- James G. Tsacoyeanes
- G02 - OPTICS
Information Patent Application
System and method for laser beam expansion
- Publication number 20050083505
- Publication date Apr 21, 2005
- Walter Augustyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Spatial light modulator using an integrated circuit actuator and me...
- Publication number 20050046921
- Publication date Mar 3, 2005
- ASML Holding N.V.
- Pradeep K. Govil
- G02 - OPTICS
Information Patent Application
Advanced illumination system for use in microlithography
- Publication number 20040263821
- Publication date Dec 30, 2004
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DUV scanner linewidth control by mask error factor compensation
- Publication number 20040066496
- Publication date Apr 8, 2004
- Pradeep K. Govil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Advanced illumination system for use in microlithography
- Publication number 20030227609
- Publication date Dec 11, 2003
- ASML US, Inc.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for improving line width control in a lithography...
- Publication number 20030197846
- Publication date Oct 23, 2003
- ASML US, Inc.
- Scott D. Coston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for improving linewidth control in a lithography...
- Publication number 20030197842
- Publication date Oct 23, 2003
- ASML US, Inc.
- James G. Tsacoyeanes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for laser beam expansion
- Publication number 20030117606
- Publication date Jun 26, 2003
- ASML US, Inc.
- Walter Augustyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Advanced illumination system for use in microlithography
- Publication number 20030076679
- Publication date Apr 24, 2003
- ASML US, Inc.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DUV scanner linewidth control by mask error factor compensation
- Publication number 20020145719
- Publication date Oct 10, 2002
- Pradeep K. Govil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

James G. Tsacoyeanes

Person

Patents Grantslast 30 patents

Method utilizing an electrooptic modulator

Illumination system with low telecentricity error and dynamic telec...

System and method utilizing an electrooptic modulator

Spatial light modulator using an integrated circuit actuator and me...

Spatial light modulator using an integrated circuit actuator

Advanced illumination system for use in microlithography

System and method utilizing an electrooptic modulator

System and method for laser beam expansion

DUV scanner linewidth control by mask error factor compensation

System and method for improving linewidth control in a lithography...

System and method for laser beam expansion

Advanced illumination system for use in microlithography

System and method for improving line width control in a lithography...

Advanced illumination system for use in microlithography

DUV scanner linewidth control by mask error factor compensation

Method and system for selective linewidth optimization during a lit...

Patents Applicationslast 30 patents

Method Utilizing an Electrooptic Modulator

Illumination System with Low Telecentricity Error and Dynamic Telec...

Spatial Light Modulator Using an Integrated Circuit Actuator and Me...

Advanced Illumination System for Use in Microlithography

System and method utilizing an electrooptic modulator

System and method utilizing an electrooptic modulator

System and method utilizing an electrooptic modulator

System and method for laser beam expansion

Spatial light modulator using an integrated circuit actuator and me...

Advanced illumination system for use in microlithography

DUV scanner linewidth control by mask error factor compensation

Advanced illumination system for use in microlithography

System and method for improving line width control in a lithography...

System and method for improving linewidth control in a lithography...

System and method for laser beam expansion

Advanced illumination system for use in microlithography

DUV scanner linewidth control by mask error factor compensation