James K. Schaeffer

Person

Dresden, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Transistors and semiconductor devices with oxygen-diffusion barrier...
- Patent number 8,853,792
- Issue date Oct 7, 2014
- FREESCALE SEMICONDUCTOR, INC.
- Murshed M. Chowdhury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scavenging metal stack for a high-K gate dielectric
- Patent number 8,735,996
- Issue date May 27, 2014
- International Business Machines Corporation
- Takashi Ando
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of enhancing photoresist adhesion to rare earth oxides
- Patent number 8,415,212
- Issue date Apr 9, 2013
- FREESCALE SEMICONDUCTOR, INC.
- James K. Schaeffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS integration with metal gate and doped high-K oxides
- Patent number 8,309,419
- Issue date Nov 13, 2012
- FREESCALE SEMICONDUCTOR, INC.
- James K. Schaeffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with oxygen-diffusion barrier layer and method...
- Patent number 8,114,739
- Issue date Feb 14, 2012
- FREESCALE SEMICONDUCTOR, INC.
- Murshed M. Chowdhury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for making a semiconductor device using partial etching
- Patent number 7,910,442
- Issue date Mar 22, 2011
- FREESCALE SEMICONDUCTOR, INC.
- William J. Taylor, Jr.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming gate stack and structure thereof
- Patent number 7,691,701
- Issue date Apr 6, 2010
- International Business Machines Corporation
- Michael P. Belyansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a metal carbide gate with an electropos...
- Patent number 7,683,439
- Issue date Mar 23, 2010
- FREESCALE SEMICONDUCTOR, INC.
- Srikanth B. Samavedam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a dual metal gate structure
- Patent number 7,666,730
- Issue date Feb 23, 2010
- FREESCALE SEMICONDUCTOR, INC.
- Gauri V. Karve
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making metal gate transistors
- Patent number 7,655,550
- Issue date Feb 2, 2010
- FREESCALE SEMICONDUCTOR, INC.
- James K. Schaeffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with integrated resistive element and method o...
- Patent number 7,648,884
- Issue date Jan 19, 2010
- FREESCALE SEMICONDUCTOR, INC.
- Byoung W. Min
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a dual metal gate structure
- Patent number 7,445,981
- Issue date Nov 4, 2008
- FREESCALE SEMICONDUCTOR, INC.
- Gauri V. Karve
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device having an interlayer and s...
- Patent number 7,445,976
- Issue date Nov 4, 2008
- FREESCALE SEMICONDUCTOR, INC.
- James K. Schaeffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ALD gate electrode
- Patent number 7,303,983
- Issue date Dec 4, 2007
- FREESCALE SEMICONDUCTOR, INC.
- Dina H. Triyoso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treating a semiconductor surface to form a metal-contain...
- Patent number 7,132,360
- Issue date Nov 7, 2006
- FREESCALE SEMICONDUCTOR, INC.
- James K. Schaeffer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming a layer using a purging gas in a semiconductor p...
- Patent number 7,015,153
- Issue date Mar 21, 2006
- FREESCALE SEMICONDUCTOR, INC.
- Dina H. Triyoso
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to reduce impurity elements during semiconductor film deposi...
- Patent number 6,987,063
- Issue date Jan 17, 2006
- FREESCALE SEMICONDUCTOR, INC.
- Olubunmi O. Adetutu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming a semiconductor device structure a semiconductor...
- Patent number 6,949,455
- Issue date Sep 27, 2005
- FREESCALE SEMICONDUCTOR, INC.
- Daniel Thanh-Khac Pham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming a metal oxy-nitride dielectric layer by varying...
- Patent number 6,743,668
- Issue date Jun 1, 2004
- Motorola, Inc.
- James K. Schaeffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and process for forming a metal oxy-nitride...
- Patent number 6,576,967
- Issue date Jun 10, 2003
- Motorola, Inc.
- James K. Schaeffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High K dielectric film
- Patent number 6,541,280
- Issue date Apr 1, 2003
- Motorola, Inc.
- Vidya S. Kaushik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and a method therefor
- Patent number 6,518,106
- Issue date Feb 11, 2003
- Motorola, Inc.
- Tat Ngai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TRANSISTORS AND SEMICONDUCTOR DEVICES WITH OXYGEN-DIFFUSION BARRIER...
- Publication number 20120104515
- Publication date May 3, 2012
- FREESCALE SEMICONDUCTOR, INC.
- Murshed M. Chowdhury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Enhancing Photoresist Adhesion to Rare Earth Oxides
- Publication number 20110223756
- Publication date Sep 15, 2011
- James K. Schaeffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH OXYGEN-DIFFUSION BARRIER LAYER AND METHOD...
- Publication number 20110073964
- Publication date Mar 31, 2011
- FREESCALE SEMICONDUCTOR, INC.
- Murshed M. Chowdhury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS Integration with Metal Gate and Doped High-K Oxides
- Publication number 20100197128
- Publication date Aug 5, 2010
- James K. Schaeffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Modulation of Tantalum-Based Electrode Workfunction
- Publication number 20090286387
- Publication date Nov 19, 2009
- David C. Gilmer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR MAKING A SEMICONDUCTOR DEVICE USING PARTIAL ETCHING
- Publication number 20090029538
- Publication date Jan 29, 2009
- William J. Taylor, JR.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A DUAL METAL GATE STRUCTURE
- Publication number 20090004792
- Publication date Jan 1, 2009
- Gauri V. Karve
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING A METAL CARBIDE GATE WITH AN ELECTROPOS...
- Publication number 20080224185
- Publication date Sep 18, 2008
- Srikanth B. Samavedam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH INTEGRATED RESISTIVE ELEMENT AND METHOD O...
- Publication number 20080206939
- Publication date Aug 28, 2008
- Byoung W. Min
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A METHOD OF MAKING METAL GATE TRANSISTORS
- Publication number 20080001202
- Publication date Jan 3, 2008
- James K. Schaeffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal oxynitride gate
- Publication number 20070284677
- Publication date Dec 13, 2007
- Weng Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A SEMICONDUCTOR DEVICE HAVING AN INTERLAYER AND S...
- Publication number 20070272975
- Publication date Nov 29, 2007
- James K. Schaeffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALD gate electrode
- Publication number 20070166970
- Publication date Jul 19, 2007
- Dina H. Triyoso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOSFET dielectric including a diffusion barrier
- Publication number 20070096226
- Publication date May 3, 2007
- Chun-Li Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal gate transistor CMOS process and method for making
- Publication number 20060166424
- Publication date Jul 27, 2006
- James K. Schaeffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO REDUCE IMPURITY ELEMENTS DURING SEMICONDUCTOR FILM DEPOSI...
- Publication number 20050277296
- Publication date Dec 15, 2005
- Olubunmi O. Adetutu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for treating a semiconductor surface to form a metal-contain...
- Publication number 20050277294
- Publication date Dec 15, 2005
- James K. Schaeffer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming an NMOS transistor and structure thereof
- Publication number 20050095763
- Publication date May 5, 2005
- Srikanth B. Samavedam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming a semiconductor device structure a semiconductor...
- Publication number 20040063285
- Publication date Apr 1, 2004
- Daniel Thanh-Khac Pham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE IN A SEMICONDUC...
- Publication number 20040018681
- Publication date Jan 29, 2004
- Daniel Thanh-Khac Pham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor structure and process for forming a metal oxy-nitride...
- Publication number 20030205772
- Publication date Nov 6, 2003
- James K. Schaeffer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and a method therefor
- Publication number 20020175384
- Publication date Nov 28, 2002
- Tat Ngai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High K dielectric film and method for making
- Publication number 20020137317
- Publication date Sep 26, 2002
- Vidya S. Kaushik
- H01 - BASIC ELECTRIC ELEMENTS

James K. Schaeffer

Person

Patents Grantslast 30 patents

Transistors and semiconductor devices with oxygen-diffusion barrier...

Scavenging metal stack for a high-K gate dielectric

Method of enhancing photoresist adhesion to rare earth oxides

CMOS integration with metal gate and doped high-K oxides

Semiconductor device with oxygen-diffusion barrier layer and method...

Process for making a semiconductor device using partial etching

Method of forming gate stack and structure thereof

Semiconductor device having a metal carbide gate with an electropos...

Method for forming a dual metal gate structure

Method of making metal gate transistors

Semiconductor device with integrated resistive element and method o...

Method for forming a dual metal gate structure

Method of forming a semiconductor device having an interlayer and s...

ALD gate electrode

Method for treating a semiconductor surface to form a metal-contain...

Method for forming a layer using a purging gas in a semiconductor p...

Method to reduce impurity elements during semiconductor film deposi...

Method for forming a semiconductor device structure a semiconductor...

Process for forming a metal oxy-nitride dielectric layer by varying...

Semiconductor structure and process for forming a metal oxy-nitride...

High K dielectric film

Semiconductor device and a method therefor

Patents Applicationslast 30 patents

TRANSISTORS AND SEMICONDUCTOR DEVICES WITH OXYGEN-DIFFUSION BARRIER...

Method of Enhancing Photoresist Adhesion to Rare Earth Oxides

SEMICONDUCTOR DEVICE WITH OXYGEN-DIFFUSION BARRIER LAYER AND METHOD...

CMOS Integration with Metal Gate and Doped High-K Oxides

Modulation of Tantalum-Based Electrode Workfunction

PROCESS FOR MAKING A SEMICONDUCTOR DEVICE USING PARTIAL ETCHING

METHOD FOR FORMING A DUAL METAL GATE STRUCTURE

SEMICONDUCTOR DEVICE HAVING A METAL CARBIDE GATE WITH AN ELECTROPOS...

SEMICONDUCTOR DEVICE WITH INTEGRATED RESISTIVE ELEMENT AND METHOD O...

A METHOD OF MAKING METAL GATE TRANSISTORS

Metal oxynitride gate

METHOD OF FORMING A SEMICONDUCTOR DEVICE HAVING AN INTERLAYER AND S...

ALD gate electrode

MOSFET dielectric including a diffusion barrier

Metal gate transistor CMOS process and method for making

METHOD TO REDUCE IMPURITY ELEMENTS DURING SEMICONDUCTOR FILM DEPOSI...

Method for treating a semiconductor surface to form a metal-contain...

Method of forming an NMOS transistor and structure thereof

Method for forming a semiconductor device structure a semiconductor...

METHOD FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE IN A SEMICONDUC...

Semiconductor structure and process for forming a metal oxy-nitride...

Semiconductor device and a method therefor

High K dielectric film and method for making