James L'HEUREUX

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for detecting anomalies in a semiconductor proces...
- Patent number 12,203,828
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Ryan T. Downey
- G01 - MEASURING TESTING
Information Patent Grant
Parameter sensing and computer modeling for gas delivery health mon...
- Patent number 11,768,984
- Issue date Sep 26, 2023
- Applied Materials, Inc.
- Ala Moradian
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Reduction of Br2 and Cl2 in semiconductor processes
- Patent number 11,551,917
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Joseph A. Van Gompel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for gaseous byproduct abatement and foreline cleaning
- Patent number 10,889,891
- Issue date Jan 12, 2021
- Applied Materials, Inc.
- James L'Heureux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for collection and subsequent reaction of liquid and soli...
- Patent number 10,861,681
- Issue date Dec 8, 2020
- Applied Materials, Inc.
- James L'Heureux
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method and apparatus for gas abatement
- Patent number 10,757,797
- Issue date Aug 25, 2020
- Applied Materials, Inc.
- Rongping Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hydrogen partial pressure control in a vacuum process chamber
- Patent number 10,435,787
- Issue date Oct 8, 2019
- Applied Materials, Inc.
- James L'Heureux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for gas abatement
- Patent number 10,187,966
- Issue date Jan 22, 2019
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Load lock chamber designs for high-throughput processing system
- Patent number 9,022,715
- Issue date May 5, 2015
- Applied Materials, Inc.
- Alexander S. Polyak
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR ORGANIC EFFLUENT ABATEMENT
- Publication number 20240347324
- Publication date Oct 17, 2024
- Applied Materials, Inc.
- Ryan T. DOWNEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SMART MANUFACTURING SOLUTIONS FOR WASTEWATER TREATMENT
- Publication number 20240077890
- Publication date Mar 7, 2024
- Applied Materials, Inc.
- Maxime CAYER
- B24 - GRINDING POLISHING
Information Patent Application
SYSTEM AND METHOD FOR CONTROLLING FORELINE PRESSURE
- Publication number 20240068093
- Publication date Feb 29, 2024
- Applied Materials, Inc.
- Ryan T. DOWNEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REDUCTION OF BR2 AND CL2 IN SEMICONDUCTOR PROCESSES
- Publication number 20230100659
- Publication date Mar 30, 2023
- Applied Materials, Inc.
- Joseph Van GOMPEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETECTING ANOMALIES IN A SEMICONDUCTOR PROCES...
- Publication number 20220341821
- Publication date Oct 27, 2022
- Applied Materials, Inc.
- Ryan T. DOWNEY
- G01 - MEASURING TESTING
Information Patent Application
HIGH EFFICIENCY TRAP FOR PARTICLE COLLECTION IN A VACUUM FORELINE
- Publication number 20220199380
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- James L'HEUREUX
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PARAMETER SENSING AND COMPUTER MODELING FOR GAS DELIVERY HEALTH MON...
- Publication number 20220092241
- Publication date Mar 24, 2022
- Applied Materials, Inc.
- Ala Moradian
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REDUCTION OF BR2 AND CL2 IN SEMICONDUCTOR PROCESSES
- Publication number 20200273682
- Publication date Aug 27, 2020
- Applied Materials, Inc.
- Joseph A. VAN GOMPEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYRODGEN PARTIAL PRESSURE CONTROL IN A VACUUM PROCESS CHAMBER
- Publication number 20200032392
- Publication date Jan 30, 2020
- Applied Materials, Inc.
- James L'HEUREUX
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR GASEOUS BYPRODUCT ABATEMENT AND FORELINE CLEANING
- Publication number 20190338419
- Publication date Nov 7, 2019
- Applied Materials, Inc.
- James L'HEUREUX
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR GAS ABATEMENT
- Publication number 20190246481
- Publication date Aug 8, 2019
- Applied Materials, Inc.
- Rongping WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR COLLECTION AND SUBSEQUENT REACTION OF LIQUID AND SOLI...
- Publication number 20180337027
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- James L'HEUREUX
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PLASMA ABATEMENT OF NITROUS OXIDE FROM SEMICONDUCTOR PROCESS EFFLUENTS
- Publication number 20180221816
- Publication date Aug 9, 2018
- Applied Materials, Inc.
- Joseph A. VAN GOMPEL
- G05 - CONTROLLING REGULATING
Information Patent Application
QUARTZ CRYSTAL MICROBALANCE UTILIZATION FOR FORELINE SOLIDS FORMATI...
- Publication number 20180166306
- Publication date Jun 14, 2018
- Applied Materials, Inc.
- David Muquing HOU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HYDROGEN PARTIAL PRESSURE CONTROL IN A VACUUM PROCESS CHAMBER
- Publication number 20180135171
- Publication date May 17, 2018
- Applied Materials, Inc.
- James L'HEUREUX
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR GAS ABATEMENT
- Publication number 20170027049
- Publication date Jan 26, 2017
- Applied Materials, Inc.
- Rongping WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOAD LOCK CHAMBER DESIGNS FOR HIGH-THROUGHPUT PROCESSING SYSTEM
- Publication number 20140079514
- Publication date Mar 20, 2014
- Alexander S. POLYAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED PLATFORM FOR PASSIVATING CRYSTALLINE SILICON SOLAR CELLS
- Publication number 20130171757
- Publication date Jul 4, 2013
- HARI K. PONNEKANTI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOVAL OF TRAPPED SILICON WITH A CLEANING GAS
- Publication number 20110274836
- Publication date Nov 10, 2011
- Applied Materials, Inc.
- Dung Huu Le
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

James L'HEUREUX

Person

Patents Grantslast 30 patents

Method and system for detecting anomalies in a semiconductor proces...

Parameter sensing and computer modeling for gas delivery health mon...

Reduction of Br2 and Cl2 in semiconductor processes

Apparatus for gaseous byproduct abatement and foreline cleaning

Apparatus for collection and subsequent reaction of liquid and soli...

Method and apparatus for gas abatement

Hydrogen partial pressure control in a vacuum process chamber

Method and apparatus for gas abatement

Load lock chamber designs for high-throughput processing system

Patents Applicationslast 30 patents

METHOD FOR ORGANIC EFFLUENT ABATEMENT

SMART MANUFACTURING SOLUTIONS FOR WASTEWATER TREATMENT

SYSTEM AND METHOD FOR CONTROLLING FORELINE PRESSURE

REDUCTION OF BR2 AND CL2 IN SEMICONDUCTOR PROCESSES

METHOD AND SYSTEM FOR DETECTING ANOMALIES IN A SEMICONDUCTOR PROCES...

HIGH EFFICIENCY TRAP FOR PARTICLE COLLECTION IN A VACUUM FORELINE

PARAMETER SENSING AND COMPUTER MODELING FOR GAS DELIVERY HEALTH MON...

REDUCTION OF BR2 AND CL2 IN SEMICONDUCTOR PROCESSES

HYRODGEN PARTIAL PRESSURE CONTROL IN A VACUUM PROCESS CHAMBER

APPARATUS FOR GASEOUS BYPRODUCT ABATEMENT AND FORELINE CLEANING

METHOD AND APPARATUS FOR GAS ABATEMENT

APPARATUS FOR COLLECTION AND SUBSEQUENT REACTION OF LIQUID AND SOLI...

PLASMA ABATEMENT OF NITROUS OXIDE FROM SEMICONDUCTOR PROCESS EFFLUENTS

QUARTZ CRYSTAL MICROBALANCE UTILIZATION FOR FORELINE SOLIDS FORMATI...

HYDROGEN PARTIAL PRESSURE CONTROL IN A VACUUM PROCESS CHAMBER

METHOD AND APPARATUS FOR GAS ABATEMENT

LOAD LOCK CHAMBER DESIGNS FOR HIGH-THROUGHPUT PROCESSING SYSTEM

ADVANCED PLATFORM FOR PASSIVATING CRYSTALLINE SILICON SOLAR CELLS

REMOVAL OF TRAPPED SILICON WITH A CLEANING GAS