James N. Eilbeck

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Ringwood, NJ, US

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Patents Grantslast 30 patents

Information Patent Grant
Method of forming a resist pattern by radiation exposure of positiv...
- Patent number 4,650,745
- Issue date Mar 17, 1987
- Philip A. Hunt Chemical Corporation
- James N. Eilbeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working o-quinone diazide photoresist composition containi...
- Patent number 4,626,492
- Issue date Dec 2, 1986
- Olin Hunt Specialty Products, Inc.
- James N. Eilbeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY