James N. Wiley

Person

Menlo Park, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Pellicle and pellicle assembly
- Patent number 12,066,758
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask assembly and associated methods
- Patent number 11,635,681
- Issue date Apr 25, 2023
- ASML Netherlands B.V.
- Derk Servatius Gertruda Brouns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for inspection of wafers and reticles using des...
- Patent number 11,348,222
- Issue date May 31, 2022
- KLA-Tencor Technologies Corp.
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 11,347,142
- Issue date May 31, 2022
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Guided patterning device inspection
- Patent number 11,287,748
- Issue date Mar 29, 2022
- ASML Netherlands B.V.
- Anton Bernhard Van Oosten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask assembly and associated methods
- Patent number 11,029,595
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Derk Servatius Gertruda Brouns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 10,983,431
- Issue date Apr 20, 2021
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for inspection of wafers and reticles using des...
- Patent number 10,713,771
- Issue date Jul 14, 2020
- KLA-Tencor Technologies Corp.
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pellicle and pellicle assembly
- Patent number 10,466,585
- Issue date Nov 5, 2019
- ASML Netherlands B.V.
- David Ferdinand Vles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for inspection of wafers and reticles using des...
- Patent number 9,002,497
- Issue date Apr 7, 2015
- KLA-Tencor Technologies Corp.
- William Volk
- G01 - MEASURING TESTING
Information Patent Grant
Process window signature patterns for lithography process control
- Patent number 8,318,391
- Issue date Nov 27, 2012
- ASML Netherlands B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window signature patterns for lithography process control
- Patent number 8,057,967
- Issue date Nov 15, 2011
- ASML Netherlands B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of performing mask-writer tuning and optimization
- Patent number 8,056,028
- Issue date Nov 8, 2011
- ASML Netherlands B.V.
- Yu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for detecting, sampling, analyzing, and correcting marginal...
- Patent number 7,853,920
- Issue date Dec 14, 2010
- ASML Netherlands B.V.
- Moshe E. Preil
- G01 - MEASURING TESTING
Information Patent Grant
Method for identifying and using process window signature patterns...
- Patent number 7,695,876
- Issue date Apr 13, 2010
- Brion Technologies, Inc.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Qualifying patterns, patterning processes, or patterning apparatus...
- Patent number 7,418,124
- Issue date Aug 26, 2008
- KLA-Tencor Technologies Corp.
- Ingrid B. Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for protecting surfaces of optical components
- Patent number 7,138,640
- Issue date Nov 21, 2006
- KLA-Tencor Technologies, Corporation
- Gil Delgado
- G01 - MEASURING TESTING
Information Patent Grant
Mechanisms for making and inspecting reticles
- Patent number 6,748,103
- Issue date Jun 8, 2004
- KLA Tencor
- Lance A. Glasser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for determining reticle defect printability
- Patent number 6,731,787
- Issue date May 4, 2004
- KLA-Tencor Corporation
- Anthony Vacca
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for collecting global data during a reticle i...
- Patent number 6,654,489
- Issue date Nov 25, 2003
- KLA-Tencor Technologies Corporation
- James N. Wiley
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mechanisms for making and inspecting reticles
- Patent number 6,529,621
- Issue date Mar 4, 2003
- KLA Tencor
- Lance A. Glasser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for collecting global data during a reticle i...
- Patent number 6,516,085
- Issue date Feb 4, 2003
- KLA Tencor
- James N. Wiley
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for determining reticle defect printability
- Patent number 6,381,358
- Issue date Apr 30, 2002
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for determining reticle defect printability
- Patent number 6,076,465
- Issue date Jun 20, 2000
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
PELLICLE AND PELLICLE ASSEMBLY
- Publication number 20220252974
- Publication date Aug 11, 2022
- ASML NETHERLANDS B.V.
- David Ferdinand VLES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Assembly and Associated Methods
- Publication number 20210341831
- Publication date Nov 4, 2021
- ASML NETHERLANDS B.V.
- Derk Servatius Gertruda BROUNS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE AND PELLICLE ASSEMBLY
- Publication number 20210208500
- Publication date Jul 8, 2021
- ASML NETHERLANDS B.V.
- David Ferdinand VLES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GUIDED PATTERNING DEVICE INSPECTION
- Publication number 20210041788
- Publication date Feb 11, 2021
- ASML NETHERLANDS B.V.
- Anton Bernhard VAN OOSTEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...
- Publication number 20200074619
- Publication date Mar 5, 2020
- KLA-Tencor Technologies Corporation
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PELLICLE AND PELLICLE ASSEMBLY
- Publication number 20200064731
- Publication date Feb 27, 2020
- ASML NETHERLANDS B.V.
- David Ferdinand VLES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE AND PELLICLE ASSEMBLY
- Publication number 20180364561
- Publication date Dec 20, 2018
- ASML NETHERLANDS B.V.
- David Ferdinand VLES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...
- Publication number 20180247403
- Publication date Aug 30, 2018
- KLA-Tencor Technologies Corporation
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methods and Systems for Inspection of Wafers and Reticles Using Des...
- Publication number 20150178914
- Publication date Jun 25, 2015
- KLA-Tencor Technologies Corporation
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Process Window Signature Patterns for Lithography Process Control
- Publication number 20120021343
- Publication date Jan 26, 2012
- ASML NETHERLANDS B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for identifying and using process window signature patterns...
- Publication number 20100151364
- Publication date Jun 17, 2010
- Brion Technology, Inc.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for determing reticle defect printability
- Publication number 20090324054
- Publication date Dec 31, 2009
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF PERFORMING MASK-WRITER TUNING AND OPTIMIZATION
- Publication number 20090276751
- Publication date Nov 5, 2009
- Yu Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20080133160
- Publication date Jun 5, 2008
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...
- Publication number 20080081385
- Publication date Apr 3, 2008
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20070140548
- Publication date Jun 21, 2007
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR IDENTIFYING AND USING PROCESS WINDOW SIGNATURE PATTERNS...
- Publication number 20070050749
- Publication date Mar 1, 2007
- BRION TECHNOLOGIES, INC.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for detecting, sampling, analyzing, and correcting marginal...
- Publication number 20060273266
- Publication date Dec 7, 2006
- BRION TECHNOLOGIES, INC.
- Moshe E. Preil
- G01 - MEASURING TESTING
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20050140970
- Publication date Jun 30, 2005
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methods and systems for inspection of wafers and reticles using des...
- Publication number 20050004774
- Publication date Jan 6, 2005
- William Volk
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20040096094
- Publication date May 20, 2004
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Qualifying patterns, patterning processes, or patterning apparatus...
- Publication number 20040091142
- Publication date May 13, 2004
- Ingrid B. Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mechanisms for making and inspecting reticles
- Publication number 20030142860
- Publication date Jul 31, 2003
- KLA-Tencor Technologies Corporation
- Lance A. Glasser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20030138138
- Publication date Jul 24, 2003
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Apparatus and methods for collecting global data during a reticle i...
- Publication number 20030091224
- Publication date May 15, 2003
- KLA-Tencor Technologies Corporation
- James N. Wiley
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20020126888
- Publication date Sep 12, 2002
- KLA-Tencor Corporation
- Anthony Vacca
- G01 - MEASURING TESTING

James N. Wiley

Person

Patents Grantslast 30 patents

Pellicle and pellicle assembly

Mask assembly and associated methods

Methods and systems for inspection of wafers and reticles using des...

Pellicle and pellicle assembly

Guided patterning device inspection

Mask assembly and associated methods

Pellicle and pellicle assembly

Methods and systems for inspection of wafers and reticles using des...

Pellicle and pellicle assembly

Methods and systems for inspection of wafers and reticles using des...

Process window signature patterns for lithography process control

Process window signature patterns for lithography process control

Method of performing mask-writer tuning and optimization

Method for detecting, sampling, analyzing, and correcting marginal...

Method for identifying and using process window signature patterns...

Qualifying patterns, patterning processes, or patterning apparatus...

Method and apparatus for protecting surfaces of optical components

Mechanisms for making and inspecting reticles

System and method for determining reticle defect printability

Apparatus and methods for collecting global data during a reticle i...

Mechanisms for making and inspecting reticles

Apparatus and methods for collecting global data during a reticle i...

System and method for determining reticle defect printability

System and method for determining reticle defect printability

Patents Applicationslast 30 patents

PELLICLE AND PELLICLE ASSEMBLY

Mask Assembly and Associated Methods

PELLICLE AND PELLICLE ASSEMBLY

GUIDED PATTERNING DEVICE INSPECTION

METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...

PELLICLE AND PELLICLE ASSEMBLY

PELLICLE AND PELLICLE ASSEMBLY

METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...

Methods and Systems for Inspection of Wafers and Reticles Using Des...

Process Window Signature Patterns for Lithography Process Control

Method for identifying and using process window signature patterns...

System and method for determing reticle defect printability

METHOD OF PERFORMING MASK-WRITER TUNING AND OPTIMIZATION

System and method for determining reticle defect printability

METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...

System and method for determining reticle defect printability

METHOD FOR IDENTIFYING AND USING PROCESS WINDOW SIGNATURE PATTERNS...

Method for detecting, sampling, analyzing, and correcting marginal...

System and method for determining reticle defect printability

Methods and systems for inspection of wafers and reticles using des...

System and method for determining reticle defect printability

Qualifying patterns, patterning processes, or patterning apparatus...

Mechanisms for making and inspecting reticles

System and method for determining reticle defect printability

Apparatus and methods for collecting global data during a reticle i...

System and method for determining reticle defect printability