James P. Levin

Person

South Burlington, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Test pattern layout for test photomask and method for evaluating cr...
- Patent number 9,996,000
- Issue date Jun 12, 2018
- International Business Machines Corporation
- Brian N. Caldwell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test pattern layout for test photomask and method for evaluating cr...
- Patent number 9,989,843
- Issue date Jun 5, 2018
- International Business Machines Corporation
- Brian N. Caldwell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test pattern layout for test photomask and method for evaluating cr...
- Patent number 9,372,394
- Issue date Jun 21, 2016
- International Business Machines Corporation
- Brian N. Caldwell
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method to etch chrome for photomask fabrication
- Patent number 7,754,394
- Issue date Jul 13, 2010
- International Business Machines Corporation
- Shaun B Crawford
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUVL mask structure and method of formation
- Patent number 6,777,137
- Issue date Aug 17, 2004
- International Business Machines Corporation
- Emily E. Fisch
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Single component developer for use with ghost exposure
- Patent number 6,426,177
- Issue date Jul 30, 2002
- International Business Machines Corporation
- Thomas B. Faure
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Single component developer for copolymer resists
- Patent number 6,270,949
- Issue date Aug 7, 2001
- International Business Machines Corporation
- Thomas B. Faure
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask set mismatch
- Patent number 4,388,386
- Issue date Jun 14, 1983
- International Business Machines Corporation
- Bruce D. King
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
TEST PATTERN LAYOUT FOR TEST PHOTOMASK AND METHOD FOR EVALUATING CR...
- Publication number 20160223902
- Publication date Aug 4, 2016
- International Business Machines Corporation
- Brian N. Caldwell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEST PATTERN LAYOUT FOR TEST PHOTOMASK AND METHOD FOR EVALUATING CR...
- Publication number 20160224720
- Publication date Aug 4, 2016
- International Business Machines Corporation
- Brian N. Caldwell
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TEST PATTERN LAYOUT FOR TEST PHOTOMASK AND METHOD FOR EVALUATING CR...
- Publication number 20150212405
- Publication date Jul 30, 2015
- Toppan Printing Co., Ltd.
- Brian N. Caldwell
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method to etch chrome for photomask fabrication
- Publication number 20080113275
- Publication date May 15, 2008
- International Business Machines Corporation
- Shaun B. Crawford
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUVL mask structure and method of formation
- Publication number 20040009408
- Publication date Jan 15, 2004
- International Business Machines Corporation
- Emily E. Fisch
- B82 - NANO-TECHNOLOGY
Information Patent Application
Single component developer for use with ghost exposure
- Publication number 20010005571
- Publication date Jun 28, 2001
- Thomas B. Faure
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

James P. Levin

Person

Patents Grantslast 30 patents

Test pattern layout for test photomask and method for evaluating cr...

Test pattern layout for test photomask and method for evaluating cr...

Test pattern layout for test photomask and method for evaluating cr...

Method to etch chrome for photomask fabrication

EUVL mask structure and method of formation

Single component developer for use with ghost exposure

Single component developer for copolymer resists

Mask set mismatch

Patents Applicationslast 30 patents

TEST PATTERN LAYOUT FOR TEST PHOTOMASK AND METHOD FOR EVALUATING CR...

TEST PATTERN LAYOUT FOR TEST PHOTOMASK AND METHOD FOR EVALUATING CR...

TEST PATTERN LAYOUT FOR TEST PHOTOMASK AND METHOD FOR EVALUATING CR...

Method to etch chrome for photomask fabrication

EUVL mask structure and method of formation

Single component developer for use with ghost exposure