James Schlueter

Person

Phoenix, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical planarization for tungsten-containing substrates
- Patent number 11,066,575
- Issue date Jul 20, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing (CMP) of cobalt-containing substrate
- Patent number 10,745,589
- Issue date Aug 18, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical mechanical polishing (CMP) of cobalt-containing substrate
- Patent number 10,217,645
- Issue date Feb 26, 2019
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Barrier chemical mechanical planarization slurries using ceria-coat...
- Patent number 10,032,644
- Issue date Jul 24, 2018
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing (CMP) composition for shallow trench...
- Patent number 10,011,741
- Issue date Jul 3, 2018
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- B24 - GRINDING POLISHING
Information Patent Grant
Low dishing copper chemical mechanical planarization
- Patent number 9,978,609
- Issue date May 22, 2018
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- B24 - GRINDING POLISHING
Information Patent Grant
Barrier chemical mechanical planarization composition and method th...
- Patent number 9,574,110
- Issue date Feb 21, 2017
- Air Products and Chemicals, Inc.
- Maitland Gary Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing (CMP) composition for shallow trench...
- Patent number 9,305,476
- Issue date Apr 5, 2016
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing slurry compositions and method using...
- Patent number 9,305,806
- Issue date Apr 5, 2016
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing (CMP) composition for shallow trench...
- Patent number 9,062,230
- Issue date Jun 23, 2015
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing composition having chemical additives...
- Patent number 8,999,193
- Issue date Apr 7, 2015
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing slurry compositions and method using...
- Patent number 8,974,692
- Issue date Mar 10, 2015
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing (CMP) composition for shallow trench...
- Patent number 8,859,428
- Issue date Oct 14, 2014
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method for chemical mechanical planarization of chalcogenide materials
- Patent number 7,678,605
- Issue date Mar 16, 2010
- DuPont Air Products NanoMaterials LLC
- James Allen Schlueter
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method and apparatus for post-CMP cleaning of a semiconductor work...
- Patent number 7,195,548
- Issue date Mar 27, 2007
- Novellus Systems, Inc.
- Vishwas V. Hardikar
- B08 - CLEANING
Information Patent Grant
Method and apparatus for post-CMP cleaning of a semiconductor work...
- Patent number 7,182,673
- Issue date Feb 27, 2007
- Novellus Systems, Inc.
- Vishwas V. Hardikar
- B08 - CLEANING
Information Patent Grant
Method for manufacturing a workpiece carrier backing pad and pressu...
- Patent number 6,095,900
- Issue date Aug 1, 2000
- Speedfam-IPEC
- Clinton O. Fruitman
- B24 - GRINDING POLISHING
Information Patent Grant
Workpiece carrier with monopiece pressure plate and low gimbal point
- Patent number 5,989,104
- Issue date Nov 23, 1999
- SpeedFam-IPEC Corporation
- Inki Kim
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and apparatus for detecting removal of thin film layers dur...
- Patent number 5,872,633
- Issue date Feb 16, 1999
- Speedfam Corporation
- Paul Holzapfel
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus for conditioning polishing pads utilizing brazed diamond...
- Patent number 5,842,912
- Issue date Dec 1, 1998
- Speedfam Corporation
- Paul Holzapfel
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
With-In Die Non-Uniformities (WID-NU) In Planarization
- Publication number 20220372332
- Publication date Nov 24, 2022
- VERSUM MATERIALS US, LLC
- LU GAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Barrier Chemical Mechanical Planarization Slurries For Cobalt Films
- Publication number 20210301405
- Publication date Sep 30, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Low Temperature Mechanical Polishing Or Planarization Slurry For Su...
- Publication number 20200308452
- Publication date Oct 1, 2020
- VERSUM MATERIALS US, LLC
- Maitland G. Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical Mechanical Polishing For Copper And Through Silicon Via Ap...
- Publication number 20200277514
- Publication date Sep 3, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Barrier Slurry Removal Rate Improvement
- Publication number 20200102476
- Publication date Apr 2, 2020
- VERSUM MATERIALS US, LLC
- Lu Gan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical Mechanical Planarization For Tungsten-Containing Substrates
- Publication number 20200079976
- Publication date Mar 12, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical Mechanical Polishing (CMP) of Cobalt-Containing Substrate
- Publication number 20190172720
- Publication date Jun 6, 2019
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Polishing (CMP) of Cobalt-Containing substrate
- Publication number 20170362466
- Publication date Dec 21, 2017
- Versum Materials US, LLC
- Xiaobo Shi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Barrier Chemical Mechanical Planarization Slurries Using Ceria-Coat...
- Publication number 20160358790
- Publication date Dec 8, 2016
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
LOW DISHING COPPER CHEMICAL MECHANICAL PLANARIZATION
- Publication number 20160314989
- Publication date Oct 27, 2016
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Polishing (CMP) Composition for Shallow Trench...
- Publication number 20160177134
- Publication date Jun 23, 2016
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Polishing (CMP) of Colbalt-Containing Substrate
- Publication number 20160027657
- Publication date Jan 28, 2016
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Polishing (CMP) Composition for Shallow Trench...
- Publication number 20150247063
- Publication date Sep 3, 2015
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Polishing Slurry Compositions and Method Using...
- Publication number 20150132956
- Publication date May 14, 2015
- Air Products and Chemicals, Inc.
- Xiaobo SHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BARRIER CHEMICAL MECHANICAL PLANARIZATION COMPOSITION AND METHOD TH...
- Publication number 20150104940
- Publication date Apr 16, 2015
- Air Products and Chemicals Inc
- Maitland Gary Graham
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BARRIER CHEMICAL MECHANICAL PLANARIZATION COMPOSITION AND METHOD TH...
- Publication number 20150104941
- Publication date Apr 16, 2015
- Air Products and Chemicals Inc
- Maitland Gary Graham
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Polishing Slurry Compositions and Method Using...
- Publication number 20150004788
- Publication date Jan 1, 2015
- Air Products and Chemicals, Inc.
- Xiaobo SHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical Mechanical Polishing (CMP) Composition for Shallow Trench...
- Publication number 20140374378
- Publication date Dec 25, 2014
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Metal Compound Coated Colloidal Particles Process for Making and Us...
- Publication number 20140315386
- Publication date Oct 23, 2014
- Air Products and Chemicals, Inc.
- Hongjun Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Planarization for Tungsten-Containing Substrates
- Publication number 20140273458
- Publication date Sep 18, 2014
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR SHALLOW TRENCH...
- Publication number 20140110626
- Publication date Apr 24, 2014
- Air Products and Chemicals Inc
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Polishing Composition Having Chemical Additives...
- Publication number 20140099790
- Publication date Apr 10, 2014
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for Chemical Mechanical Planarization of Chalcogenide Materials
- Publication number 20090057834
- Publication date Mar 5, 2009
- DuPont Air Products Nanomaterials LLC
- James Allen Schlueter
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method and apparatus for post-CMP cleaning of a semiconductor work...
- Publication number 20050287928
- Publication date Dec 29, 2005
- Vishwas V. Hardikar
- B08 - CLEANING

James Schlueter

Person

Patents Grantslast 30 patents

Chemical mechanical planarization for tungsten-containing substrates

Chemical mechanical polishing (CMP) of cobalt-containing substrate

Chemical mechanical polishing (CMP) of cobalt-containing substrate

Barrier chemical mechanical planarization slurries using ceria-coat...

Chemical mechanical polishing (CMP) composition for shallow trench...

Low dishing copper chemical mechanical planarization

Barrier chemical mechanical planarization composition and method th...

Chemical mechanical polishing (CMP) composition for shallow trench...

Chemical mechanical polishing slurry compositions and method using...

Chemical mechanical polishing (CMP) composition for shallow trench...

Chemical mechanical polishing composition having chemical additives...

Chemical mechanical polishing slurry compositions and method using...

Chemical mechanical polishing (CMP) composition for shallow trench...

Method for chemical mechanical planarization of chalcogenide materials

Method and apparatus for post-CMP cleaning of a semiconductor work...

Method and apparatus for post-CMP cleaning of a semiconductor work...

Method for manufacturing a workpiece carrier backing pad and pressu...

Workpiece carrier with monopiece pressure plate and low gimbal point

Methods and apparatus for detecting removal of thin film layers dur...

Apparatus for conditioning polishing pads utilizing brazed diamond...

Patents Applicationslast 30 patents

With-In Die Non-Uniformities (WID-NU) In Planarization

Barrier Chemical Mechanical Planarization Slurries For Cobalt Films

Low Temperature Mechanical Polishing Or Planarization Slurry For Su...

Chemical Mechanical Polishing For Copper And Through Silicon Via Ap...

Barrier Slurry Removal Rate Improvement

Chemical Mechanical Planarization For Tungsten-Containing Substrates

Chemical Mechanical Polishing (CMP) of Cobalt-Containing Substrate

Chemical Mechanical Polishing (CMP) of Cobalt-Containing substrate

Barrier Chemical Mechanical Planarization Slurries Using Ceria-Coat...

LOW DISHING COPPER CHEMICAL MECHANICAL PLANARIZATION

Chemical Mechanical Polishing (CMP) Composition for Shallow Trench...

Chemical Mechanical Polishing (CMP) of Colbalt-Containing Substrate

Chemical Mechanical Polishing (CMP) Composition for Shallow Trench...

Chemical Mechanical Polishing Slurry Compositions and Method Using...

BARRIER CHEMICAL MECHANICAL PLANARIZATION COMPOSITION AND METHOD TH...

BARRIER CHEMICAL MECHANICAL PLANARIZATION COMPOSITION AND METHOD TH...

Chemical Mechanical Polishing Slurry Compositions and Method Using...

Chemical Mechanical Polishing (CMP) Composition for Shallow Trench...

Metal Compound Coated Colloidal Particles Process for Making and Us...

Chemical Mechanical Planarization for Tungsten-Containing Substrates

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR SHALLOW TRENCH...

Chemical Mechanical Polishing Composition Having Chemical Additives...

Method for Chemical Mechanical Planarization of Chalcogenide Materials

Method and apparatus for post-CMP cleaning of a semiconductor work...