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James T. Kelliher
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Wappingers Falls, NY, US
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last 30 patents
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Patent Grant
Method of forming sidewall spacer using dual-frequency plasma enhan...
Patent number
7,202,187
Issue date
Apr 10, 2007
International Business Machines Corporation
Ravikumar Ramachandran
H01 - BASIC ELECTRIC ELEMENTS
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last 30 patents
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Patent Application
OPTIMIZED SiCN CAPPING LAYER
Publication number
20090176367
Publication date
Jul 9, 2009
Heidi Baks
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
OPTIMIZED SiCN CAPPING LAYER
Publication number
20070155186
Publication date
Jul 5, 2007
International Business Machines Corporation
Heidi Baks
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
DUAL-FREQUENCY SILICON NITRIDE FOR SPACER APPLICATION
Publication number
20050287823
Publication date
Dec 29, 2005
International Business Machines Corporation
Ravikumar Ramachandran
H01 - BASIC ELECTRIC ELEMENTS