James V. Tietz

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for verifying gas flow rates from a gas supply system into...
- Patent number 9,234,775
- Issue date Jan 12, 2016
- Lam Research Corporation
- Dean J. Larson
- G05 - CONTROLLING REGULATING
Information Patent Grant
Apparatus for delivering a process gas
- Patent number 8,521,461
- Issue date Aug 27, 2013
- Lam Research Corporation
- Iqbal A. Shareef
- G01 - MEASURING TESTING
Information Patent Grant
Methods for delivering a process gas
- Patent number 8,150,646
- Issue date Apr 3, 2012
- Lam Research Corporation
- Iqbal A. Shareef
- G01 - MEASURING TESTING
Information Patent Grant
Methods for performing transient flow prediction and verification u...
- Patent number 7,881,886
- Issue date Feb 1, 2011
- Lam Research Corporation
- Iqbal A. Shareef
- G01 - MEASURING TESTING
Information Patent Grant
Methods for performing actual flow verification
- Patent number 7,822,570
- Issue date Oct 26, 2010
- Lam Research Corporation
- Iqbal A. Shareef
- G01 - MEASURING TESTING
Information Patent Grant
Multiple frequency plasma processor method and apparatus
- Patent number 7,405,521
- Issue date Jul 29, 2008
- Lam Research Corporation
- Raj Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching low-k dielectric materials
- Patent number 7,311,852
- Issue date Dec 25, 2007
- Lam Research Corporation
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for plasma stripping using periodic modulation of gas chemis...
- Patent number 7,294,580
- Issue date Nov 13, 2007
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching of silicon carbide
- Patent number 7,166,535
- Issue date Jan 23, 2007
- Lam Research Corporation
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Article for polishing semiconductor substrates
- Patent number 7,014,538
- Issue date Mar 21, 2006
- Applied Materials, Inc.
- James V. Tietz
- B24 - GRINDING POLISHING
Information Patent Grant
Method for plasma etching using periodic modulation of gas chemistry
- Patent number 6,916,746
- Issue date Jul 12, 2005
- Lam Research Corporation
- Eric A. Hudson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for chemical mechanical planarization
- Patent number 6,413,873
- Issue date Jul 2, 2002
- Applied Materials, Inc.
- Shijian Li
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing with a polishing sheet and a support...
- Patent number 6,302,767
- Issue date Oct 16, 2001
- Applied Materials, Inc.
- James V. Tietz
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and method for grinding a semiconductor wafer surface
- Patent number 6,273,794
- Issue date Aug 14, 2001
- Applied Materials, Inc.
- James V. Tietz
- B24 - GRINDING POLISHING
Information Patent Grant
Magnetically-levitated rotor system for an RTP chamber
- Patent number 6,157,106
- Issue date Dec 5, 2000
- Applied Materials, Inc.
- James V. Tietz
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Chemical mechanical polishing with a polishing sheet and a support...
- Patent number 6,135,859
- Issue date Oct 24, 2000
- Applied Materials, Inc.
- James V. Tietz
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and method for grinding a semiconductor wafer surface
- Patent number 6,132,295
- Issue date Oct 17, 2000
- Applied Materials, Inc.
- James V. Tietz
- B24 - GRINDING POLISHING
Information Patent Grant
Co-rotating edge ring extension for use in a semiconductor processi...
- Patent number 6,133,152
- Issue date Oct 17, 2000
- Applied Materials, Inc.
- Benjamin Bierman
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method and apparatus for achieving temperature uniformity of a subs...
- Patent number 6,123,766
- Issue date Sep 26, 2000
- Applied Materials, Inc.
- Meredith J. Williams
- C30 - CRYSTAL GROWTH
Information Patent Grant
Multi-zone gas flow control in a process chamber
- Patent number 6,090,210
- Issue date Jul 18, 2000
- Applied Materials, Inc.
- David S. Ballance
- C30 - CRYSTAL GROWTH
Information Patent Grant
Reflector cover for a semiconductor processing chamber
- Patent number 6,035,100
- Issue date Mar 7, 2000
- Applied Materials, Inc.
- Benjamin Bierman
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for purging the back side of a substrate durin...
- Patent number 5,960,555
- Issue date Oct 5, 1999
- Applied Materials, Inc.
- Paul Deaton
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for gaseous substrate support
- Patent number 5,920,797
- Issue date Jul 6, 1999
- Applied Materials, Inc.
- David S. Ballance
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for purging the back side of a substrate durin...
- Patent number 5,884,412
- Issue date Mar 23, 1999
- Applied Materials, Inc.
- James V. Tietz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Lift pin and support pin apparatus for a processing chamber
- Patent number 5,879,128
- Issue date Mar 9, 1999
- Applied Materials, Inc.
- James V. Tietz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer support with graded thermal mass
- Patent number 5,848,889
- Issue date Dec 15, 1998
- Applied Materials Inc.
- James V. Tietz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas introduction showerhead for an RTP chamber with upper and lower...
- Patent number 5,781,693
- Issue date Jul 14, 1998
- Applied Materials, Inc.
- David S. Ballance
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR VERIFYING GAS FLOW RATES FROM A GAS SUPPLY SYSTEM INTO...
- Publication number 20140033828
- Publication date Feb 6, 2014
- LAM RESEARCH CORPORATION
- Dean J. Larson
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR DELIVERING A PROCESS GAS
- Publication number 20120247581
- Publication date Oct 4, 2012
- Iqbal A. Shareef
- G01 - MEASURING TESTING
Information Patent Application
METHODS FOR DELIVERING A PROCESS GAS
- Publication number 20110029268
- Publication date Feb 3, 2011
- Iqbal A. Shareef
- G01 - MEASURING TESTING
Information Patent Application
METHODS FOR PERFORMING ACTUAL FLOW VERIFICATION
- Publication number 20080115560
- Publication date May 22, 2008
- Iqbal A. Shareef
- G01 - MEASURING TESTING
Information Patent Application
Methods for verifying gas flow rates from a gas supply system into...
- Publication number 20070021935
- Publication date Jan 25, 2007
- Dean J. Larson
- G05 - CONTROLLING REGULATING
Information Patent Application
Method for plasma etching using periodic modulation of gas chemistry
- Publication number 20050136682
- Publication date Jun 23, 2005
- Lam Research Corporation
- Eric A. Hudson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multiple frequency plasma etch reactor
- Publication number 20050039682
- Publication date Feb 24, 2005
- Raj Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for plasma stripping using periodic modulation of gas chemis...
- Publication number 20040224520
- Publication date Nov 11, 2004
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fixed abrasive articles
- Publication number 20040082288
- Publication date Apr 29, 2004
- APPLIED MATERIALS, INC.
- James V. Tietz
- B24 - GRINDING POLISHING
Information Patent Application
Method of plasma etching low-k dielectric materials
- Publication number 20030024902
- Publication date Feb 6, 2003
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fixed abrasive articles
- Publication number 20020077037
- Publication date Jun 20, 2002
- James V. Tietz
- B24 - GRINDING POLISHING

James V. Tietz

Person

Patents Grantslast 30 patents

Methods for verifying gas flow rates from a gas supply system into...

Apparatus for delivering a process gas

Methods for delivering a process gas

Methods for performing transient flow prediction and verification u...

Methods for performing actual flow verification

Multiple frequency plasma processor method and apparatus

Method of plasma etching low-k dielectric materials

Method for plasma stripping using periodic modulation of gas chemis...

Plasma etching of silicon carbide

Article for polishing semiconductor substrates

Method for plasma etching using periodic modulation of gas chemistry

System for chemical mechanical planarization

Chemical mechanical polishing with a polishing sheet and a support...

Apparatus and method for grinding a semiconductor wafer surface

Magnetically-levitated rotor system for an RTP chamber

Chemical mechanical polishing with a polishing sheet and a support...

Apparatus and method for grinding a semiconductor wafer surface

Co-rotating edge ring extension for use in a semiconductor processi...

Method and apparatus for achieving temperature uniformity of a subs...

Multi-zone gas flow control in a process chamber

Reflector cover for a semiconductor processing chamber

Method and apparatus for purging the back side of a substrate durin...

Method for gaseous substrate support

Method and apparatus for purging the back side of a substrate durin...

Lift pin and support pin apparatus for a processing chamber

Semiconductor wafer support with graded thermal mass

Gas introduction showerhead for an RTP chamber with upper and lower...

Patents Applicationslast 30 patents

METHODS FOR VERIFYING GAS FLOW RATES FROM A GAS SUPPLY SYSTEM INTO...

APPARATUS FOR DELIVERING A PROCESS GAS

METHODS FOR DELIVERING A PROCESS GAS

METHODS FOR PERFORMING ACTUAL FLOW VERIFICATION

Methods for verifying gas flow rates from a gas supply system into...

Method for plasma etching using periodic modulation of gas chemistry

Multiple frequency plasma etch reactor

Method for plasma stripping using periodic modulation of gas chemis...

Fixed abrasive articles

Method of plasma etching low-k dielectric materials

Fixed abrasive articles