James W. Thackeray

Person

Braintree, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photoacid-generating monomer, polymer derived therefrom, photoresis...
- Patent number 11,947,258
- Issue date Apr 2, 2024
- Rohm and Hass Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomers, polymers and lithographic compositions comprising same
- Patent number 11,932,713
- Issue date Mar 19, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salts and photoresists comprising same
- Patent number 11,880,134
- Issue date Jan 23, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 11,852,972
- Issue date Dec 26, 2023
- Rohm and Haas Electronic Materials LLC
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid-generating monomer, polymer derived therefrom, photoresis...
- Patent number 11,613,519
- Issue date Mar 28, 2023
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Zwitterion compounds and photoresists comprising same
- Patent number 11,505,565
- Issue date Nov 22, 2022
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salts and photoresists comprising same
- Patent number 11,448,960
- Issue date Sep 20, 2022
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Iodine-containing polymers for chemically amplified resist composit...
- Patent number 10,901,316
- Issue date Jan 26, 2021
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iodine-containing photoacid generators and compositions comprising...
- Patent number 10,831,100
- Issue date Nov 10, 2020
- Rohm and Haas Electronic Materials, LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Iodine-containing polymers for chemically amplified resist composit...
- Patent number 10,495,968
- Issue date Dec 3, 2019
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid generators and photoresists comprising same
- Patent number 10,248,020
- Issue date Apr 2, 2019
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid-cleavable monomer and polymers including the same
- Patent number 10,095,109
- Issue date Oct 9, 2018
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Self-assembled structures, method of manufacture thereof and articl...
- Patent number 10,078,261
- Issue date Sep 18, 2018
- Rohm and Haas Electronic Materials LLC
- Sangho Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers and photoresist compositions
- Patent number 9,983,477
- Issue date May 29, 2018
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymer and associated layered article, and device-forming method
- Patent number 9,957,339
- Issue date May 1, 2018
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Block copolymer and associated photoresist composition and method o...
- Patent number 9,815,930
- Issue date Nov 14, 2017
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nanoparticle-polymer resists
- Patent number 9,696,624
- Issue date Jul 4, 2017
- Rohm and Haas Electronic Materials LLC
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer comprising repeat units with photoacid-generating functiona...
- Patent number 9,606,434
- Issue date Mar 28, 2017
- Rohm and Haas Electronic Materials, LLC
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid-generating copolymer and associated photoresist compositi...
- Patent number 9,581,901
- Issue date Feb 28, 2017
- Rohm and Haas Electronic Materials LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and associated method of forming an electro...
- Patent number 9,557,642
- Issue date Jan 31, 2017
- Rohm and Haas Electronic Materials LLC
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition and associated method of forming an electro...
- Patent number 9,551,930
- Issue date Jan 24, 2017
- Rohm and Haas Electronic Materials LLC
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer comprising repeat units with photoacid-generating functiona...
- Patent number 9,527,936
- Issue date Dec 27, 2016
- Rohm and Haas Electronic Materials LLC
- Vipul Jain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming electronic devices including filling porous feat...
- Patent number 9,508,549
- Issue date Nov 29, 2016
- Dow Global Technologies LLC
- Jong Keun Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Acid generators and photoresists comprising same
- Patent number 9,499,513
- Issue date Nov 22, 2016
- Rohm and Haas Electronic Materials LLC
- James F. Cameron
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer comprising repeat units with photoacid-generating functiona...
- Patent number 9,469,705
- Issue date Oct 18, 2016
- Rohm and Haas Electronic Materials LLC
- Vipul Jain
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition and associated method of forming an electro...
- Patent number 9,470,976
- Issue date Oct 18, 2016
- Rohm and Haas Electronic Materials LLC
- Paul J. LaBeaume
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Self-assembled structures, method of manufacture thereof and articl...
- Patent number 9,447,220
- Issue date Sep 20, 2016
- Rohm and Haas Electronic Materials LLC
- Sangho Cho
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Self-assembled structures, method of manufacture thereof and articl...
- Patent number 9,405,189
- Issue date Aug 2, 2016
- Rohm and Haas Electronic Materials LLC
- Sangho Cho
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoacid-generating copolymer and associated photoresist compositi...
- Patent number 9,229,319
- Issue date Jan 5, 2016
- Rohm and Haas Electronic Materials LLC
- Vipul Jain
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Self-assembled structures, method of manufacture thereof and articl...
- Patent number 9,223,214
- Issue date Dec 29, 2015
- The Texas A&M University System
- Sangho Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIS...
- Publication number 20230212112
- Publication date Jul 6, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220137506
- Publication date May 5, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220091506
- Publication date Mar 24, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Ke Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220019143
- Publication date Jan 20, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMERS AND PHOTORESIST COMPOSITIONS
- Publication number 20210108065
- Publication date Apr 15, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Yang SONG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
IODINE-CONTAINING POLYMERS FOR CHEMICALLY AMPLIFIED RESIST COMPOSIT...
- Publication number 20200218149
- Publication date Jul 9, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACID GENERATORS AND PHOTORESISTS COMPRISING SAME
- Publication number 20190227433
- Publication date Jul 25, 2019
- Rohm and Haas Electronic Materials L.L.C.
- James W. THACKERAY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOMERS, POLYMERS AND LITHOGRAPHIC COMPOSITIONS COMPRISING SAME
- Publication number 20190202955
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALTS AND PHOTORESISTS COMPRISING SAME
- Publication number 20190163058
- Publication date May 30, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALTS AND PHOTORESISTS COMPRISING SAME
- Publication number 20190163055
- Publication date May 30, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ZWITTERION COMPOUNDS AND PHOTORESISTS COMPRISING SAME
- Publication number 20190161509
- Publication date May 30, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Application
IODINE-CONTAINING PHOTOACID GENERATORS AND COMPOSITIONS COMPRISING...
- Publication number 20190155152
- Publication date May 23, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Application
IODINE-CONTAINING POLYMERS FOR CHEMICALLY AMPLIFIED RESIST COMPOSIT...
- Publication number 20180362752
- Publication date Dec 20, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACID-CLEAVABLE MONOMER AND POLYMERS INCLUDING THE SAME
- Publication number 20180284605
- Publication date Oct 4, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COPOLYMER AND ASSOCIATED LAYERED ARTICLE, AND DEVICE-FORMING METHOD
- Publication number 20180252645
- Publication date Sep 6, 2018
- The University of Queensland
- James W. Thackeray
- B07 - SEPARATING SOLIDS FROM SOLIDS SORTING
Information Patent Application
NANOPARTICLE - POLYMER RESISTS
- Publication number 20170261853
- Publication date Sep 14, 2017
- Rohm and Haas Electronic Materials L.L.C.
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIS...
- Publication number 20170248844
- Publication date Aug 31, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COPOLYMER AND ASSOCIATED LAYERED ARTICLE, AND DEVICE-FORMING METHOD
- Publication number 20170037171
- Publication date Feb 9, 2017
- Rohm and Haas Electronic Materials L.L.C.
- James W. Thackeray
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
BLOCK COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION AND METHOD O...
- Publication number 20170037178
- Publication date Feb 9, 2017
- The University of Queensland
- James W. Thackeray
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NANOPARTICLE - POLYMER RESISTS
- Publication number 20170031244
- Publication date Feb 2, 2017
- The University of Queensland
- James W. Thackeray
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PORE-FILL COMPOSITIONS
- Publication number 20160185984
- Publication date Jun 30, 2016
- DOW GLOBAL TECHNOLOGIES LLC
- Emad Aqad
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHODS OF FORMING ELECTRONIC DEVICES
- Publication number 20160189953
- Publication date Jun 30, 2016
- DOW GLOBAL TECHNOLOGIES LLC
- Jong Keun Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONA...
- Publication number 20160102158
- Publication date Apr 14, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Paul J. LaBeaume
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRO...
- Publication number 20160103392
- Publication date Apr 14, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONA...
- Publication number 20160102157
- Publication date Apr 14, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Vipul Jain
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRO...
- Publication number 20160103391
- Publication date Apr 14, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Paul J. LaBeaume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACID GENERATORS AND PHOTORESISTS COMPRISING SAME
- Publication number 20160002199
- Publication date Jan 7, 2016
- Rohm and Haas Electronic Materials, L.L.C.
- James F. Cameron
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITI...
- Publication number 20150177615
- Publication date Jun 25, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Vipul Jain
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITI...
- Publication number 20150177613
- Publication date Jun 25, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Vipul Jain
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COPOLYMER WITH ACID-LABILE GROUP, PHOTORESIST COMPOSITION, COATED S...
- Publication number 20150177614
- Publication date Jun 25, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Owendi Ongayi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

James W. Thackeray

Person

Patents Grantslast 30 patents

Photoacid-generating monomer, polymer derived therefrom, photoresis...

Monomers, polymers and lithographic compositions comprising same

Salts and photoresists comprising same

Photoresist compositions and pattern formation methods

Photoacid-generating monomer, polymer derived therefrom, photoresis...

Zwitterion compounds and photoresists comprising same

Salts and photoresists comprising same

Iodine-containing polymers for chemically amplified resist composit...

Iodine-containing photoacid generators and compositions comprising...

Iodine-containing polymers for chemically amplified resist composit...

Acid generators and photoresists comprising same

Acid-cleavable monomer and polymers including the same

Self-assembled structures, method of manufacture thereof and articl...

Polymers and photoresist compositions

Copolymer and associated layered article, and device-forming method

Block copolymer and associated photoresist composition and method o...

Nanoparticle-polymer resists

Polymer comprising repeat units with photoacid-generating functiona...

Photoacid-generating copolymer and associated photoresist compositi...

Photoresist composition and associated method of forming an electro...

Photoresist composition and associated method of forming an electro...

Polymer comprising repeat units with photoacid-generating functiona...

Methods of forming electronic devices including filling porous feat...

Acid generators and photoresists comprising same

Polymer comprising repeat units with photoacid-generating functiona...

Photoresist composition and associated method of forming an electro...

Self-assembled structures, method of manufacture thereof and articl...

Self-assembled structures, method of manufacture thereof and articl...

Photoacid-generating copolymer and associated photoresist compositi...

Self-assembled structures, method of manufacture thereof and articl...

Patents Applicationslast 30 patents

PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIS...

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

POLYMERS AND PHOTORESIST COMPOSITIONS

IODINE-CONTAINING POLYMERS FOR CHEMICALLY AMPLIFIED RESIST COMPOSIT...

ACID GENERATORS AND PHOTORESISTS COMPRISING SAME

MONOMERS, POLYMERS AND LITHOGRAPHIC COMPOSITIONS COMPRISING SAME

SALTS AND PHOTORESISTS COMPRISING SAME

SALTS AND PHOTORESISTS COMPRISING SAME

ZWITTERION COMPOUNDS AND PHOTORESISTS COMPRISING SAME

IODINE-CONTAINING PHOTOACID GENERATORS AND COMPOSITIONS COMPRISING...

IODINE-CONTAINING POLYMERS FOR CHEMICALLY AMPLIFIED RESIST COMPOSIT...

ACID-CLEAVABLE MONOMER AND POLYMERS INCLUDING THE SAME

COPOLYMER AND ASSOCIATED LAYERED ARTICLE, AND DEVICE-FORMING METHOD

NANOPARTICLE - POLYMER RESISTS

PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIS...

COPOLYMER AND ASSOCIATED LAYERED ARTICLE, AND DEVICE-FORMING METHOD

BLOCK COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION AND METHOD O...

NANOPARTICLE - POLYMER RESISTS

PORE-FILL COMPOSITIONS

METHODS OF FORMING ELECTRONIC DEVICES

POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONA...

PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRO...

POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONA...

PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRO...

ACID GENERATORS AND PHOTORESISTS COMPRISING SAME

PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITI...

PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITI...

COPOLYMER WITH ACID-LABILE GROUP, PHOTORESIST COMPOSITION, COATED S...