Jan Andries Meijer

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Rotterdam, NL

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Patents Grantslast 30 patents

Information Patent Grant
Charged particle lithography system with alignment sensor and beam...
- Patent number RE49732
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Paul IJmert Scheffers
Information Patent Grant
Charged particle lithography system with alignment sensor and beam...
- Patent number 9,665,014
- Issue date May 30, 2017
- Mapper Lithography IP B.V.
- Paul Ijmert Scheffers
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Device for spot size measurement at wafer level using a knife edge...
- Patent number 9,240,306
- Issue date Jan 19, 2016
- Mapper Lithography IP B.V.
- Jan Andries Meijer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for determining a distance between two beamlets in a multi-b...
- Patent number 9,030,675
- Issue date May 12, 2015
- Mapper Lithography IP B.V.
- Jan Andries Meijer
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH SENSOR ASSEMBLY
- Publication number 20150179398
- Publication date Jun 25, 2015
- MAPPER LITHOGRAPHY IP BV
- Paul IJmert Scheffers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH ALIGNMENT SENSOR AND BEAM...
- Publication number 20150109601
- Publication date Apr 23, 2015
- MAPPER LITHOGRAPHY IP BV
- Paul IJmert Scheffers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE FOR SPOT SIZE MEASUREMENT AT WAFER LEVEL USING A KNIFE EDGE...
- Publication number 20150001423
- Publication date Jan 1, 2015
- MAPPER LITHOGRAPHY IP BV
- Jan Andries Meijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING A DISTANCE BETWEEN TWO BEAMLETS IN A MULTI-B...
- Publication number 20120293810
- Publication date Nov 22, 2012
- MAPPER LITHOGRAPHY IP BV
- Jan Andries MEIJER
- B82 - NANO-TECHNOLOGY