Jan Bernard Plechelmus VAN SCHOOT

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method for controlling a lithographic system
- Patent number 12,099,306
- Issue date Sep 24, 2024
- ASML Netherlands B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical system for projection lithography
- Patent number 11,327,403
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Tian Gang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,684,551
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus and method
- Patent number 10,558,126
- Issue date Feb 11, 2020
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,317,802
- Issue date Jun 11, 2019
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Beam delivery for EUV lithography
- Patent number 10,289,006
- Issue date May 14, 2019
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection system
- Patent number 10,248,027
- Issue date Apr 2, 2019
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,031,423
- Issue date Jul 24, 2018
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus, spectral purity filter and device manufactu...
- Patent number 10,001,709
- Issue date Jun 19, 2018
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic system
- Patent number 9,989,863
- Issue date Jun 5, 2018
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for generating radiation
- Patent number 9,986,628
- Issue date May 29, 2018
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method and apparatus
- Patent number 9,958,787
- Issue date May 1, 2018
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 9,860,966
- Issue date Jan 2, 2018
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 9,835,950
- Issue date Dec 5, 2017
- ASML Netherland B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actuation mechanism, optical apparatus, lithography apparatus and m...
- Patent number 9,785,051
- Issue date Oct 10, 2017
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,746,778
- Issue date Aug 29, 2017
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation source
- Patent number 9,632,419
- Issue date Apr 25, 2017
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,618,859
- Issue date Apr 11, 2017
- ASML Netherlands B.V.
- Adrianus Hendrik Koevoets
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, spectral purity filter and device manufactu...
- Patent number 9,594,306
- Issue date Mar 14, 2017
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Source-collector device, lithographic apparatus, and device manufac...
- Patent number 9,411,238
- Issue date Aug 9, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation source, lithographic apparatus and device manufacturing m...
- Patent number 9,414,477
- Issue date Aug 9, 2016
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Optical apparatus for conditioning a radiation beam for use by an o...
- Patent number 9,372,413
- Issue date Jun 21, 2016
- ASML Netherlands B.V.
- Gosse Charles De Vries
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 9,366,967
- Issue date Jun 14, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Module and method for producing extreme ultraviolet radiation
- Patent number 9,363,879
- Issue date Jun 7, 2016
- ASML Netherlands B.V.
- Tjarko Adriaan Rudolf Van Empel
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multilayer mirror
- Patent number 9,329,503
- Issue date May 3, 2016
- ASML Netherlands B.V.
- Vadim Iourievich Timoshkov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,316,929
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,285,685
- Issue date Mar 15, 2016
- ASML NETHERLANDS B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method with correct...
- Patent number 9,170,500
- Issue date Oct 27, 2015
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G02 - OPTICS
Information Patent Grant
Projection system and lithographic apparatus
- Patent number 9,164,401
- Issue date Oct 20, 2015
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system, lithographic apparatus and method of forming a...
- Patent number 9,134,629
- Issue date Sep 15, 2015
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method for Controlling a Lithographic System
- Publication number 20220163895
- Publication date May 26, 2022
- ASML Netherlands B,V.
- Oscar Franciscus Jozephus NOORDMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL SYSTEM FOR PROJECTION LITHOGRAPHY
- Publication number 20210263421
- Publication date Aug 26, 2021
- Carl Zeiss SMT GMBH
- Tian Gang
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20190310555
- Publication date Oct 10, 2019
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20180299784
- Publication date Oct 18, 2018
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION SYSTEM
- Publication number 20170363965
- Publication date Dec 21, 2017
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20170315449
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20170176868
- Publication date Jun 22, 2017
- Jan Bernard Plechelmus VAN SCHOOT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...
- Publication number 20170160646
- Publication date Jun 8, 2017
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC SYSTEM
- Publication number 20170052456
- Publication date Feb 23, 2017
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus VAN SCHOOT
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Radiation Source
- Publication number 20160334711
- Publication date Nov 17, 2016
- ASML NETHERLANDS B.V.
- Markus Franciscus Antonius EURLINGS
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20160195818
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
Beam Delivery for EUV Lithography
- Publication number 20150334813
- Publication date Nov 19, 2015
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus VAN SCHOOT
- G02 - OPTICS
Information Patent Application
Method and Apparatus for Generating Radiation
- Publication number 20150296602
- Publication date Oct 15, 2015
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND M...
- Publication number 20150277233
- Publication date Oct 1, 2015
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus Van Schoot
- G01 - MEASURING TESTING
Information Patent Application
Lithographic Method and Apparatus
- Publication number 20150253679
- Publication date Sep 10, 2015
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION SOURCE
- Publication number 20150146182
- Publication date May 28, 2015
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus Van Schoot
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MODULE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION
- Publication number 20150077729
- Publication date Mar 19, 2015
- ASML NETHERLANDS B.V.
- Tjarko Adriaan Rudolf VAN EMPEL
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFAC...
- Publication number 20140375974
- Publication date Dec 25, 2014
- Andrei Mikhailovich Yakunin
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
RADIATION SOURCE
- Publication number 20140368802
- Publication date Dec 18, 2014
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic Apparatus and Device Manufacturing Method
- Publication number 20140340659
- Publication date Nov 20, 2014
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140293248
- Publication date Oct 2, 2014
- ASML NETHERLANDS B.V.
- Bob STREEFKERK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation Source
- Publication number 20140253894
- Publication date Sep 11, 2014
- ASML Netherland B.V.
- Jan Bernard Plechelmus Van Schoot
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...
- Publication number 20140085619
- Publication date Mar 27, 2014
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV Exposure Apparatus
- Publication number 20130141707
- Publication date Jun 6, 2013
- ASML NETHERLANDS B.V.
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHODS TO CONTROL EUV EXPOSURE DOSE AND EUV LITHOGRAPHIC METHODS A...
- Publication number 20130077073
- Publication date Mar 28, 2013
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus VAN SCHOOT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayer Mirror
- Publication number 20130057840
- Publication date Mar 7, 2013
- ASML Netherland B.V.
- Vadim Iourievich Timoshkov
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050264790
- Publication date Dec 1, 2005
- ASML NETHERLANDS B.V.
- Maurice Henricus Franciscus Janssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, device manufac...
- Publication number 20030038225
- Publication date Feb 27, 2003
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jan Bernard Plechelmus VAN SCHOOT

Person

Patents Grantslast 30 patents

Method for controlling a lithographic system

Illumination optical system for projection lithography

EUV exposure apparatus with reflective elements having reduced infl...

Lithographic apparatus and method

EUV exposure apparatus with reflective elements having reduced infl...

Beam delivery for EUV lithography

Projection system

EUV exposure apparatus with reflective elements having reduced infl...

Lithographic apparatus, spectral purity filter and device manufactu...

Lithographic system

Method and apparatus for generating radiation

Lithographic method and apparatus

Radiation source

Radiation source

Actuation mechanism, optical apparatus, lithography apparatus and m...

EUV exposure apparatus with reflective elements having reduced infl...

Radiation source

Lithographic apparatus and device manufacturing method

Lithographic apparatus, spectral purity filter and device manufactu...

Source-collector device, lithographic apparatus, and device manufac...

Radiation source, lithographic apparatus and device manufacturing m...

Optical apparatus for conditioning a radiation beam for use by an o...

Radiation source

Module and method for producing extreme ultraviolet radiation

Multilayer mirror

EUV exposure apparatus with reflective elements having reduced infl...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method with correct...

Projection system and lithographic apparatus

Illumination system, lithographic apparatus and method of forming a...

Patents Applicationslast 30 patents

Method for Controlling a Lithographic System

ILLUMINATION OPTICAL SYSTEM FOR PROJECTION LITHOGRAPHY

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

PROJECTION SYSTEM

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

LITHOGRAPHIC APPARATUS AND METHOD

Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...

LITHOGRAPHIC SYSTEM

Radiation Source

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

Beam Delivery for EUV Lithography

Method and Apparatus for Generating Radiation

ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND M...

Lithographic Method and Apparatus

RADIATION SOURCE

MODULE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION

SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFAC...

RADIATION SOURCE

Lithographic Apparatus and Device Manufacturing Method

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Radiation Source

Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...

EUV Exposure Apparatus

METHODS TO CONTROL EUV EXPOSURE DOSE AND EUV LITHOGRAPHIC METHODS A...

Multilayer Mirror

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method, device manufac...