Jan Evert VAN DER Werf

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Device manufacturing method, lithographic apparatus and device manu...
- Patent number 7,630,060
- Issue date Dec 8, 2009
- ASML Netherlands B.V.
- Joost Jeroen Ottens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,505,116
- Issue date Mar 17, 2009
- ASML Netherlands B.V.
- Jan Evert Van Der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Holographic mask for lithographic apparatus and device manufacturin...
- Patent number 7,499,149
- Issue date Mar 3, 2009
- ASML Netherlands B.V.
- Bernardus Hendrikus Wilhelmus Hendriks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device manufacturing method, device manufactured thereby and a mask...
- Patent number 7,492,443
- Issue date Feb 17, 2009
- ASML Netherlands B.V.
- Jan Evert Van Der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and device man...
- Patent number 7,459,690
- Issue date Dec 2, 2008
- ASML Netherlands B.V.
- Jan Evert Van Der Werf
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for inspecting a patterned part of a sample
- Patent number 7,453,577
- Issue date Nov 18, 2008
- ASML Netherlands B.V.
- Jan Evert Van Der Werf
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus, device manufacturing method and radiation s...
- Patent number 7,309,869
- Issue date Dec 18, 2007
- ASML Netherlands B.V.
- Ralph Kurt
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method of detecting mask defects, a computer program and reference...
- Patent number 7,307,712
- Issue date Dec 11, 2007
- ASML Netherlands B.V.
- Jan Evert Van Der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment system and lithographic apparatus equipped with such an a...
- Patent number 7,283,236
- Issue date Oct 16, 2007
- ASML Netherlands B.V.
- Cristian Presura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring overlay
- Patent number 7,277,185
- Issue date Oct 2, 2007
- ASML Netherlands B.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and radiation s...
- Patent number 7,105,837
- Issue date Sep 12, 2006
- ASML Netherlands B.V.
- Ralph Kurt
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method of measuring alignment of a substrate with respect to a refe...
- Patent number 7,095,499
- Issue date Aug 22, 2006
- ASML Netherlands B.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and device man...
- Patent number 7,075,620
- Issue date Jul 11, 2006
- ASML Netherlands B.V.
- Jan Evert Van Der Werf
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,012,673
- Issue date Mar 14, 2006
- ASML Netherlands B.V.
- Aleksey Yurievich Kolesnychenko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 6,963,391
- Issue date Nov 8, 2005
- ASML Netherlands B.V.
- Jan Evert Van Der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring overlay
- Patent number 6,937,344
- Issue date Aug 30, 2005
- ASML Netherlands B.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring alignment of a substrate with respect to a refe...
- Patent number 6,937,334
- Issue date Aug 30, 2005
- ASML Netherlands B.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and device man...
- Patent number 6,888,151
- Issue date May 3, 2005
- ASML Netherlands B.V.
- Mark Kroon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device manufacturing method, device manufactured thereby and a mask...
- Patent number 6,879,374
- Issue date Apr 12, 2005
- ASML Netherlands B.V.
- Jan Evert Van Der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and device man...
- Patent number 6,747,282
- Issue date Jun 8, 2004
- ASML Netherlands B.V.
- Mark Kroon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method, and device man...
- Patent number 6,721,389
- Issue date Apr 13, 2004
- ASML Netherlands B.V.
- Jan E. Van Der Werf
- G01 - MEASURING TESTING
Information Patent Grant
Interferometer system with two wavelengths, and lithographic appara...
- Patent number 6,122,058
- Issue date Sep 19, 2000
- ASM Lithography B.V.
- Jan E. Van Der Werf
- G01 - MEASURING TESTING
Information Patent Grant
Differential interferometer system and lithographic step-and-scan a...
- Patent number 6,046,792
- Issue date Apr 4, 2000
- U.S. Philips Corporation
- Jan E. Van Der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment device and lithographic apparatus provided with such a de...
- Patent number 5,917,604
- Issue date Jun 29, 1999
- U.S. Philips Corporation
- Peter Dirksen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining the radiation dose in a lithographic apparatus
- Patent number 5,910,847
- Issue date Jun 8, 1999
- U.S. Philips Corporation
- Jan E. van der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of repetitively imaging a mask pattern on a substrate, and a...
- Patent number 5,674,650
- Issue date Oct 7, 1997
- U.S. Philips Corporation
- Peter Dirksen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of repetitively imaging a mask pattern on a substrate, and a...
- Patent number 5,673,101
- Issue date Sep 30, 1997
- U.S. Philips Corporation
- Manfred G. Tenner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-source unit for generating a beam having two directions o...
- Patent number 5,485,272
- Issue date Jan 16, 1996
- U.S. Philips Corporation
- Peter Dirksen
- G02 - OPTICS
Information Patent Grant
Imaging apparatus having a focus-error and/or tilt detection device
- Patent number 5,191,200
- Issue date Mar 2, 1993
- U.S. Philips Corp.
- Jan E. van der Werf
- G02 - OPTICS
Information Patent Grant
Apparatus for pre-aligning substrate preparatory to fine alignment
- Patent number 5,026,166
- Issue date Jun 25, 1991
- U.S. Philips Corporation
- Jan E. van der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL READ-OUT
- Publication number 20090041077
- Publication date Feb 12, 2009
- Koninklijke Philips Electronic, N.V.
- Ole Klembt Andersen
- G11 - INFORMATION STORAGE
Information Patent Application
Device manufacturing method, lithographic apparatus and device manu...
- Publication number 20080212053
- Publication date Sep 4, 2008
- ASML NETHERLANDS B.V.
- Joost Jeroen Ottens
- B82 - NANO-TECHNOLOGY
Information Patent Application
Optical pick-up unit
- Publication number 20070115782
- Publication date May 24, 2007
- Koninklijke Philips Electronic, N.V.
- Ole Klembt Andersen
- G11 - INFORMATION STORAGE
Information Patent Application
Alignment of Holographic Images on Detector
- Publication number 20070103753
- Publication date May 10, 2007
- Koninklijke Philips Electronics N.V.
- Coen Theodorus Hubertus Liedenbaum
- G11 - INFORMATION STORAGE
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20060219931
- Publication date Oct 5, 2006
- ASML NETHERLANDS B.V.
- Jan E. Van Der Werf
- G01 - MEASURING TESTING
Information Patent Application
Inspection apparatus, sample and inspection method
- Publication number 20060126074
- Publication date Jun 15, 2006
- ASML NETHERLANDS B.V.
- Jan Evert Van Der Werf
- G01 - MEASURING TESTING
Information Patent Application
Alignment system and lithographic apparatus equipped with such an a...
- Publication number 20060001879
- Publication date Jan 5, 2006
- ASML NETHERLANDS B.V.
- Cristian Presura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050280795
- Publication date Dec 22, 2005
- ASML NETHERLANDS B.V.
- Jan Evert Van Der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method and radiation s...
- Publication number 20050253091
- Publication date Nov 17, 2005
- ASML NETHERLANDS B.V.
- Ralph Kurt
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of measuring alignment of a substrate with respect to a refe...
- Publication number 20050231698
- Publication date Oct 20, 2005
- ASML NETHERLANDS B.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of measuring overlay
- Publication number 20050231732
- Publication date Oct 20, 2005
- ASML NETHERLANDS B.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and mask
- Publication number 20050019675
- Publication date Jan 27, 2005
- ASML NETHERLANDS B.V.
- Bernardus Hendrikus Wilhelmus Hendriks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050002004
- Publication date Jan 6, 2005
- ASML NITHERLANDS B.V.
- Aleksey Yurievich Kolesnychenko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20040211922
- Publication date Oct 28, 2004
- ASML NETHERLANDS B.V.
- Mark Kroon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20040190677
- Publication date Sep 30, 2004
- ASML NETHERLANDS B.V.
- Jan E. Van Der Werf
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20040189966
- Publication date Sep 30, 2004
- ASML NETHERLANDS B.V.
- Jan Evert Van Der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20030001107
- Publication date Jan 2, 2003
- ASML NETHERLANDS B.V.
- Mark Kroon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device manufacturing method, device manufactured thereby and a mask...
- Publication number 20030003383
- Publication date Jan 2, 2003
- ASML NETHERLANDS B.V.
- Jan Evert Van Der Werf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of measuring alignment of a substrate with respect to a refe...
- Publication number 20020080365
- Publication date Jun 27, 2002
- Koninklijke Philips Electronics N.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of measuring overlay
- Publication number 20020080364
- Publication date Jun 27, 2002
- Koninklijke Philips Electronics N.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, device manufacturing method, and device man...
- Publication number 20020037461
- Publication date Mar 28, 2002
- Jan E. Van Der Werf
- G01 - MEASURING TESTING

Jan Evert VAN DER Werf

Person

Patents Grantslast 30 patents

Device manufacturing method, lithographic apparatus and device manu...

Lithographic apparatus and device manufacturing method

Holographic mask for lithographic apparatus and device manufacturin...

Device manufacturing method, device manufactured thereby and a mask...

Lithographic apparatus, device manufacturing method, and device man...

Apparatus and method for inspecting a patterned part of a sample

Lithographic apparatus, device manufacturing method and radiation s...

Method of detecting mask defects, a computer program and reference...

Alignment system and lithographic apparatus equipped with such an a...

Method of measuring overlay

Lithographic apparatus, device manufacturing method and radiation s...

Method of measuring alignment of a substrate with respect to a refe...

Lithographic apparatus, device manufacturing method, and device man...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Method of measuring overlay

Method of measuring alignment of a substrate with respect to a refe...

Lithographic apparatus, device manufacturing method, and device man...

Device manufacturing method, device manufactured thereby and a mask...

Lithographic apparatus, device manufacturing method, and device man...

Lithographic apparatus, device manufacturing method, and device man...

Interferometer system with two wavelengths, and lithographic appara...

Differential interferometer system and lithographic step-and-scan a...

Alignment device and lithographic apparatus provided with such a de...

Method of determining the radiation dose in a lithographic apparatus

Method of repetitively imaging a mask pattern on a substrate, and a...

Method of repetitively imaging a mask pattern on a substrate, and a...

Radiation-source unit for generating a beam having two directions o...

Imaging apparatus having a focus-error and/or tilt detection device

Apparatus for pre-aligning substrate preparatory to fine alignment

Patents Applicationslast 30 patents

OPTICAL READ-OUT

Device manufacturing method, lithographic apparatus and device manu...

Optical pick-up unit

Alignment of Holographic Images on Detector

Lithographic apparatus, device manufacturing method, and device man...

Inspection apparatus, sample and inspection method

Alignment system and lithographic apparatus equipped with such an a...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method and radiation s...

Method of measuring alignment of a substrate with respect to a refe...

Method of measuring overlay

Lithographic apparatus, device manufacturing method, and mask

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method, and device man...

Lithographic apparatus, device manufacturing method, and device man...

Lithographic apparatus and device manufacturing method

Lithographic apparatus, device manufacturing method, and device man...

Device manufacturing method, device manufactured thereby and a mask...

Method of measuring alignment of a substrate with respect to a refe...

Method of measuring overlay

Lithographic apparatus, device manufacturing method, and device man...