Jan Wouter BIJLSMA

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Eindhoven, NL

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Patents Grantslast 30 patents

Information Patent Grant
Method for patterning process modelling
- Patent number 11,875,101
- Issue date Jan 16, 2024
- ASML Netherlands B.V.
- Jen-Shiang Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process based metrology target design
- Patent number 10,296,681
- Issue date May 21, 2019
- ASML Netherlands B.V.
- Guangqing Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process based metrology target design
- Patent number 10,007,744
- Issue date Jun 26, 2018
- ASML Netherlands B.V.
- Guangqing Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PATTERNING PROCESS MODELLING
- Publication number 20220260921
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Jen-Shiang WANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS BASED METROLOGY TARGET DESIGN
- Publication number 20180268093
- Publication date Sep 20, 2018
- ASML NETHERLANDS B.V.
- Guangqing CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS BASED METROLOGY TARGET DESIGN
- Publication number 20160140267
- Publication date May 19, 2016
- ASML NETHERLANDS B.V.
- Guangqing CHEN
- G06 - COMPUTING CALCULATING COUNTING