Jang F. Chen

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Universal metrology file, protocol, and process for maskless lithog...
- Patent number 12,248,254
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Tamer Coskun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Advanced-packaging high-volume-mode digital-lithography-tool
- Patent number 12,032,284
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Shih-Hao Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maskless based lithography methods
- Patent number 11,934,107
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Shih-Hsien Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wire grid polarizer manufacturing methods using frequency doubling...
- Patent number 11,592,740
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wire grid polarizer manufacturing method
- Patent number 10,983,389
- Issue date Apr 20, 2021
- Applied Materials, Inc.
- David Markle
- G02 - OPTICS
Information Patent Grant
Freeform distortion correction
- Patent number 10,935,892
- Issue date Mar 2, 2021
- Applied Materials, Inc.
- Tamer Coskun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Micro LED array illumination source
- Patent number 10,908,507
- Issue date Feb 2, 2021
- Applied Materials, Inc.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of pattern placement correction
- Patent number 10,497,658
- Issue date Dec 3, 2019
- Applied Materials, Inc.
- Tamer Coskun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for on-the-fly digital exposure image data mo...
- Patent number 10,379,450
- Issue date Aug 13, 2019
- Applied Materials, Inc.
- Benjamin M. Johnston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of pattern placement correction
- Patent number 10,115,687
- Issue date Oct 30, 2018
- Applied Materials, Inc.
- Tamer Coskun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for on-the-fly digital exposure image data mo...
- Patent number 9,927,723
- Issue date Mar 27, 2018
- Applied Materials, Inc.
- Benjamin M. Johnston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system with monitoring optical output power
- Patent number 9,907,152
- Issue date Feb 27, 2018
- Applied Materials, Inc.
- Jeffrey Kaskey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical projection array exposure system
- Patent number 9,733,573
- Issue date Aug 15, 2017
- Applied Materials, Inc.
- David Markle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging writer system
- Patent number 9,519,226
- Issue date Dec 13, 2016
- Applied Materials, Inc.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for manufacturing multiple light emitting diodes...
- Patent number 9,507,271
- Issue date Nov 29, 2016
- Applied Materials, Inc.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pixel blending for multiple charged-particle beam lithography
- Patent number 9,405,203
- Issue date Aug 2, 2016
- Applied Materials, Inc.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of improved hierarchical XML databases
- Patent number 9,361,400
- Issue date Jun 7, 2016
- ASML Netherlands B.V.
- Leo Lilin Zhao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical projection array exposure system
- Patent number 9,250,509
- Issue date Feb 2, 2016
- Applied Materials, Inc.
- David Markle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging writer system
- Patent number 9,158,190
- Issue date Oct 13, 2015
- Applied Materials, Inc.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for manufacturing three dimensional integrated ci...
- Patent number 9,025,136
- Issue date May 5, 2015
- Applied Materials, Inc.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for handling substrates
- Patent number 8,914,143
- Issue date Dec 16, 2014
- Applied Materials, Inc.
- Jeffrey Kaskey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for performing double exposur...
- Patent number 8,910,091
- Issue date Dec 9, 2014
- ASML Netherlands B.V.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging writer system
- Patent number 8,670,106
- Issue date Mar 11, 2014
- PineBrook Imaging, Inc.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for performing model-based OPC for pattern dec...
- Patent number 8,644,589
- Issue date Feb 4, 2014
- ASML Masktools B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for performing dark field double dipole lithog...
- Patent number 8,632,930
- Issue date Jan 21, 2014
- ASML Masktools B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for model based scattering ba...
- Patent number 8,495,529
- Issue date Jul 23, 2013
- ASML Masktools B.V.
- Douglas van Den Broeke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for performing model-based OPC for pattern dec...
- Patent number 8,391,605
- Issue date Mar 5, 2013
- ASML Masktools B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical imaging writer system
- Patent number 8,253,923
- Issue date Aug 28, 2012
- Pinebrook Imaging Technology, Ltd.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for performing mask feature p...
- Patent number 8,132,130
- Issue date Mar 6, 2012
- ASML Masktools B.V.
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for generating a calibrated p...
- Patent number 8,120,753
- Issue date Feb 21, 2012
- ASML Masktools B.V.
- Gabriel Berger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ADVANCED-PACKAGING HIGH-VOLUME-MODE DIGITAL-LITHOGRAPHY-TOOL
- Publication number 20250076753
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Shih-Hao Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL LITHOGRAPHY APPARATUS WITH AUTOFOCUS POSITION CONTROL AND M...
- Publication number 20250076768
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Zhongchuan Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APRIORI APPLICATION WITH DYNAMIC DIGITAL CORRECTION (DDC) FUNCTION
- Publication number 20240404893
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Shih-Hao KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCALING FOR DIE-LAST ADVANCED IC PACKAGING
- Publication number 20240126180
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- Jang Fung CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASKLESS BASED LITHOGRAPHY METHODS
- Publication number 20240077805
- Publication date Mar 7, 2024
- Applied Materials, Inc.
- Shih-Hsien LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADVANCED-PACKAGING HIGH-VOLUME-MODE DIGITAL-LITHOGRAPHY-TOOL
- Publication number 20240027896
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Shih-Hao Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS TO IMPROVE PROCESS WINDOW AND RESOLUTION FOR DIGITAL LITHOG...
- Publication number 20230314953
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Chi-Ming TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PACKAGE IMAGING FOR DIE LOCATION CORRECTION IN DIGITAL LITHOGRAPHY
- Publication number 20230288822
- Publication date Sep 14, 2023
- Applied Materials, Inc.
- Ulrich Mueller
- G01 - MEASURING TESTING
Information Patent Application
UNIVERSAL METROLOGY FILE, PROTOCOL, AND PROCESS FOR MASKLESS LITHOG...
- Publication number 20220382171
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Tamer COSKUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WIRE GRID POLARIZER MANUFACTURING METHOD
- Publication number 20190049789
- Publication date Feb 14, 2019
- Applied Materials, Inc.
- David MARKLE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PATTERN PLACEMENT CORRECTION
- Publication number 20190019769
- Publication date Jan 17, 2019
- Applied Materials, Inc.
- Tamer COSKUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WIRE GRID POLARIZER MANUFACTURING METHODS USING FREQUENCY DOUBLING...
- Publication number 20180335694
- Publication date Nov 22, 2018
- Applied Materials, Inc.
- Jang Fung CHEN
- G02 - OPTICS
Information Patent Application
FREEFORM DISTORTION CORRECTION
- Publication number 20180329310
- Publication date Nov 15, 2018
- Applied Materials, Inc.
- Tamer COSKUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PATTERN PLACEMENT CORRECTION
- Publication number 20180226369
- Publication date Aug 9, 2018
- Applied Materials, Inc.
- Tamer COSKUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICRO LED ARRAY AS ILLUMINATION SYSTEM
- Publication number 20180188655
- Publication date Jul 5, 2018
- Applied Materials, Inc.
- Jang Fung CHEN
- G02 - OPTICS
Information Patent Application
APPARATUS AND METHODS FOR ON -THE-FLY DIGITAL EXPOSURE IMAGE DATA M...
- Publication number 20180129142
- Publication date May 10, 2018
- Applied Materials, Inc.
- Benjamin M. JOHNSTON
- G01 - MEASURING TESTING
Information Patent Application
FOCUS CENTERING METHOD FOR DIGITAL LITHOGRAPHY
- Publication number 20180024448
- Publication date Jan 25, 2018
- Applied Materials, Inc.
- Yeishin TUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICRO LED ARRAY AS ILLUMINATION SOURCE
- Publication number 20180017876
- Publication date Jan 18, 2018
- Applied Materials, Inc.
- Jang Fung CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FRUSTRATED CUBE ASSEMBLY
- Publication number 20180017781
- Publication date Jan 18, 2018
- Applied Materials, Inc.
- David MARKLE
- G02 - OPTICS
Information Patent Application
APPARATUS AND METHODS FOR ON-THE-FLY DIGITAL EXPOSURE IMAGE DATA MO...
- Publication number 20160282728
- Publication date Sep 29, 2016
- Applied Materials, Inc.
- Benjamin M. JOHNSTON
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION SYSTEM WITH MONITORING OPTICAL OUTPUT POWER
- Publication number 20160219684
- Publication date Jul 28, 2016
- Applied Materials, Inc.
- Jeffrey KASKEY
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL PROJECTION ARRAY EXPOSURE SYSTEM
- Publication number 20160124316
- Publication date May 5, 2016
- Applied Materials, Inc.
- David MARKLE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD, PROGRAM PRODUCT AND APPARATUS FOR PERFORMING DOUBLE EXPOSUR...
- Publication number 20150095858
- Publication date Apr 2, 2015
- Jang Fung Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optical Imaging Writer System
- Publication number 20140192336
- Publication date Jul 10, 2014
- PINEBROOK IMAGING, INC.
- Jang Fung CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pixel Blending For Multiple Charged-Particle Beam Lithography
- Publication number 20140192334
- Publication date Jul 10, 2014
- PINEBROOK IMAGING, INC.
- Jang Fung CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Projection Array Exposure System
- Publication number 20130321786
- Publication date Dec 5, 2013
- David MARKLE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM
- Publication number 20130207544
- Publication date Aug 15, 2013
- Pinebrook Imaging Technology, Ltd.
- Jeffrey Kaskey
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method and Apparatus for Performing Model-Based OPC for Pattern Dec...
- Publication number 20130182940
- Publication date Jul 18, 2013
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method, Program Product and Apparatus for Performing Double Exposur...
- Publication number 20130055171
- Publication date Feb 28, 2013
- ASML MASKTOOLS B.V.
- Jang Fung Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optical Imaging Writer System
- Publication number 20120307225
- Publication date Dec 6, 2012
- Pinebrook Imaging Technology, Ltd. (formerly Pinebrook Imaging Systems Corpor...
- Jang Fung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jang F. Chen

Person

Patents Grantslast 30 patents

Universal metrology file, protocol, and process for maskless lithog...

Advanced-packaging high-volume-mode digital-lithography-tool

Maskless based lithography methods

Wire grid polarizer manufacturing methods using frequency doubling...

Wire grid polarizer manufacturing method

Freeform distortion correction

Micro LED array illumination source

Method of pattern placement correction

Apparatus and methods for on-the-fly digital exposure image data mo...

Method of pattern placement correction

Apparatus and methods for on-the-fly digital exposure image data mo...

Illumination system with monitoring optical output power

Optical projection array exposure system

Optical imaging writer system

System and method for manufacturing multiple light emitting diodes...

Pixel blending for multiple charged-particle beam lithography

Method of improved hierarchical XML databases

Optical projection array exposure system

Optical imaging writer system

System and method for manufacturing three dimensional integrated ci...

Method and system for handling substrates

Method, program product and apparatus for performing double exposur...

Optical imaging writer system

Method and apparatus for performing model-based OPC for pattern dec...

Method and apparatus for performing dark field double dipole lithog...

Method, program product and apparatus for model based scattering ba...

Method and apparatus for performing model-based OPC for pattern dec...

Optical imaging writer system

Method, program product and apparatus for performing mask feature p...

Method, program product and apparatus for generating a calibrated p...

Patents Applicationslast 30 patents

ADVANCED-PACKAGING HIGH-VOLUME-MODE DIGITAL-LITHOGRAPHY-TOOL

DIGITAL LITHOGRAPHY APPARATUS WITH AUTOFOCUS POSITION CONTROL AND M...

APRIORI APPLICATION WITH DYNAMIC DIGITAL CORRECTION (DDC) FUNCTION

SCALING FOR DIE-LAST ADVANCED IC PACKAGING

MASKLESS BASED LITHOGRAPHY METHODS

ADVANCED-PACKAGING HIGH-VOLUME-MODE DIGITAL-LITHOGRAPHY-TOOL

METHODS TO IMPROVE PROCESS WINDOW AND RESOLUTION FOR DIGITAL LITHOG...

PACKAGE IMAGING FOR DIE LOCATION CORRECTION IN DIGITAL LITHOGRAPHY

UNIVERSAL METROLOGY FILE, PROTOCOL, AND PROCESS FOR MASKLESS LITHOG...

WIRE GRID POLARIZER MANUFACTURING METHOD

METHOD OF PATTERN PLACEMENT CORRECTION

WIRE GRID POLARIZER MANUFACTURING METHODS USING FREQUENCY DOUBLING...

FREEFORM DISTORTION CORRECTION

METHOD OF PATTERN PLACEMENT CORRECTION

MICRO LED ARRAY AS ILLUMINATION SYSTEM

APPARATUS AND METHODS FOR ON -THE-FLY DIGITAL EXPOSURE IMAGE DATA M...

FOCUS CENTERING METHOD FOR DIGITAL LITHOGRAPHY

MICRO LED ARRAY AS ILLUMINATION SOURCE

FRUSTRATED CUBE ASSEMBLY

APPARATUS AND METHODS FOR ON-THE-FLY DIGITAL EXPOSURE IMAGE DATA MO...

ILLUMINATION SYSTEM WITH MONITORING OPTICAL OUTPUT POWER

OPTICAL PROJECTION ARRAY EXPOSURE SYSTEM

METHOD, PROGRAM PRODUCT AND APPARATUS FOR PERFORMING DOUBLE EXPOSUR...

Optical Imaging Writer System

Pixel Blending For Multiple Charged-Particle Beam Lithography

Optical Projection Array Exposure System

ILLUMINATION SYSTEM

Method and Apparatus for Performing Model-Based OPC for Pattern Dec...

Method, Program Product and Apparatus for Performing Double Exposur...

Optical Imaging Writer System