Jason A. Kenney

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Reducing aspect ratio dependent etch with direct current bias pulsing
- Patent number 12,237,149
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Deyang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Delayed pulsing for plasma processing of wafers
- Patent number 11,817,312
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Akhil Mehrotra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to reduce polymers deposition
- Patent number 11,551,965
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Universal process kit
- Patent number 11,049,760
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Olivier Joubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetrical plural-coil plasma source with side RF feeds and RF dis...
- Patent number 10,811,226
- Issue date Oct 20, 2020
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetrical inductively coupled plasma source with coaxial RF feed...
- Patent number 10,249,470
- Issue date Apr 2, 2019
- Applied Materials, Inc.
- Jason A. Kenney
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multiple coil inductively coupled plasma source with offset frequen...
- Patent number 10,170,279
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Jason A. Kenney
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Inductively coupled plasma source with top coil over a ceiling and...
- Patent number 10,131,994
- Issue date Nov 20, 2018
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled plasma source with symmetrical RF feed
- Patent number 9,928,987
- Issue date Mar 27, 2018
- Applied Materials, Inc.
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma source with multiple dielectric windows...
- Patent number 9,896,769
- Issue date Feb 20, 2018
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetrical plural-coil plasma source with side RF feeds and RF dis...
- Patent number 9,870,897
- Issue date Jan 16, 2018
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composite edge ring
- Patent number D797691
- Issue date Sep 19, 2017
- Applied Materials, Inc.
- Olivier Joubert
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Symmetrical inductively coupled plasma source with symmetrical flow...
- Patent number 9,745,663
- Issue date Aug 29, 2017
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetrical inductively coupled plasma source with side RF feeds an...
- Patent number 9,449,794
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Three-coil inductively coupled plasma source with individually cont...
- Patent number 9,111,722
- Issue date Aug 18, 2015
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetrical inductively coupled plasma source with side RF feeds an...
- Patent number 9,082,590
- Issue date Jul 14, 2015
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Three-coil inductively coupled plasma source with individually cont...
- Patent number 9,082,591
- Issue date Jul 14, 2015
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable gas flow equalizer
- Patent number 8,398,814
- Issue date Mar 19, 2013
- Applied Materials, Inc.
- Ajit Balakrishna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
REDUCING ASPECT RATIO DEPENDENT ETCH WITH DIRECT CURRENT BIAS PULSING
- Publication number 20240162007
- Publication date May 16, 2024
- Applied Materials, Inc.
- Deyang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DELAYED PULSING FOR PLASMA PROCESSING OF WAFERS
- Publication number 20240047195
- Publication date Feb 8, 2024
- Applied Materials, Inc.
- AKHIL MEHROTRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER WITH A MULTIPHASE ROTATING MODULATED CROSS-FLOW
- Publication number 20220084794
- Publication date Mar 17, 2022
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS TO REDUCE POLYMERS DEPOSITION
- Publication number 20200185256
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- Andrew NGUYEN
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
DELAYED PULSING FOR PLASMA PROCESSING OF WAFERS
- Publication number 20200135458
- Publication date Apr 30, 2020
- Applied Materials, Inc.
- AKHIL MEHROTRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Reactor Having Radial Struts for Substrate Support
- Publication number 20190085467
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO MODULATE THE WAFER EDGE SHEATH IN A PLASMA PROCESSING CHA...
- Publication number 20180323042
- Publication date Nov 8, 2018
- Applied Materials, Inc.
- Haitao WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL RF FEED AND REAC...
- Publication number 20180218873
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE WITH SYMMETRICAL RF FEED
- Publication number 20180211811
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Symmetrical Plural-Coil Plasma Source with Side Rf Feeds and Rf Dis...
- Publication number 20180138014
- Publication date May 17, 2018
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Inductively Coupled Plasma Source with Multiple Dielectric Windows...
- Publication number 20170350018
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow...
- Publication number 20170350017
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNIVERSAL PROCESS KIT
- Publication number 20170256435
- Publication date Sep 7, 2017
- Applied Materials, Inc.
- Olivier JOUBERT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRICAL PLURAL-COIL PLASMA SOURCE WITH SIDE RF FEEDS AND RF DIS...
- Publication number 20140312766
- Publication date Oct 23, 2014
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH OFFSET FREQUEN...
- Publication number 20140265832
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Jason A. Kenney
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SIDE RF FEEDS AN...
- Publication number 20140232263
- Publication date Aug 21, 2014
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH COAXIAL RF FEED...
- Publication number 20140020838
- Publication date Jan 23, 2014
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA SOURCE WITH MULTIPLE DIELECTRIC WINDOWS...
- Publication number 20140020837
- Publication date Jan 23, 2014
- ANDREW NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL RF FEED
- Publication number 20140020839
- Publication date Jan 23, 2014
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL FLOW...
- Publication number 20140020835
- Publication date Jan 23, 2014
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVELY COUPLED PLASMA SOURCE WITH PLURAL TOP COILS OVER A CEIL...
- Publication number 20140020836
- Publication date Jan 23, 2014
- ANDREW NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SIDE RF FEEDS AN...
- Publication number 20140021861
- Publication date Jan 23, 2014
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THREE-COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH INDIVIDUALLY CONT...
- Publication number 20130278141
- Publication date Oct 24, 2013
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE-COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH INDIVIDUALLY CONT...
- Publication number 20130278142
- Publication date Oct 24, 2013
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE GAS FLOW EQUALIZER
- Publication number 20110005680
- Publication date Jan 13, 2011
- Ajit Balakrishna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS KIT HAVING REDUCED EROSION SENSITIVITY
- Publication number 20100101729
- Publication date Apr 29, 2010
- Applied Materials, Inc.
- JONG MUN KIM
- H01 - BASIC ELECTRIC ELEMENTS

Jason A. Kenney

Person

Patents Grantslast 30 patents

Reducing aspect ratio dependent etch with direct current bias pulsing

Delayed pulsing for plasma processing of wafers

Apparatus to reduce polymers deposition

Universal process kit

Symmetrical plural-coil plasma source with side RF feeds and RF dis...

Symmetrical inductively coupled plasma source with coaxial RF feed...

Multiple coil inductively coupled plasma source with offset frequen...

Inductively coupled plasma source with top coil over a ceiling and...

Inductively coupled plasma source with symmetrical RF feed

Inductively coupled plasma source with multiple dielectric windows...

Symmetrical plural-coil plasma source with side RF feeds and RF dis...

Composite edge ring

Symmetrical inductively coupled plasma source with symmetrical flow...

Symmetrical inductively coupled plasma source with side RF feeds an...

Three-coil inductively coupled plasma source with individually cont...

Symmetrical inductively coupled plasma source with side RF feeds an...

Three-coil inductively coupled plasma source with individually cont...

Tunable gas flow equalizer

Patents Applicationslast 30 patents

REDUCING ASPECT RATIO DEPENDENT ETCH WITH DIRECT CURRENT BIAS PULSING

DELAYED PULSING FOR PLASMA PROCESSING OF WAFERS

PLASMA CHAMBER WITH A MULTIPHASE ROTATING MODULATED CROSS-FLOW

APPARATUS TO REDUCE POLYMERS DEPOSITION

DELAYED PULSING FOR PLASMA PROCESSING OF WAFERS

Plasma Reactor Having Radial Struts for Substrate Support

METHOD TO MODULATE THE WAFER EDGE SHEATH IN A PLASMA PROCESSING CHA...

INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL RF FEED AND REAC...

PLASMA SOURCE WITH SYMMETRICAL RF FEED

Symmetrical Plural-Coil Plasma Source with Side Rf Feeds and Rf Dis...

Inductively Coupled Plasma Source with Multiple Dielectric Windows...

Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow...

UNIVERSAL PROCESS KIT

SYMMETRICAL PLURAL-COIL PLASMA SOURCE WITH SIDE RF FEEDS AND RF DIS...

MULTIPLE COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH OFFSET FREQUEN...

SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SIDE RF FEEDS AN...

SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH COAXIAL RF FEED...

INDUCTIVELY COUPLED PLASMA SOURCE WITH MULTIPLE DIELECTRIC WINDOWS...

INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL RF FEED

SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL FLOW...

INDUCTIVELY COUPLED PLASMA SOURCE WITH PLURAL TOP COILS OVER A CEIL...

SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SIDE RF FEEDS AN...

THREE-COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH INDIVIDUALLY CONT...

THREE-COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH INDIVIDUALLY CONT...

TUNABLE GAS FLOW EQUALIZER

PROCESS KIT HAVING REDUCED EROSION SENSITIVITY