Jason M. Lawhorn

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Newark, DE, US

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Patents Grantslast 30 patents

Information Patent Grant
Polishing pad having a pressure relief channel
- Patent number 7,252,871
- Issue date Aug 7, 2007
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- T. Todd Crkvenac
- B24 - GRINDING POLISHING
Information Patent Grant
Method of forming a layered polishing pad
- Patent number 7,132,033
- Issue date Nov 7, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mark J. Boldizar
- B24 - GRINDING POLISHING
Information Patent Grant
Method of forming a polishing pad with reduced stress window
- Patent number 7,018,581
- Issue date Mar 28, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Kyle W. David
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Polishing pad having a pressure relief channel
- Publication number 20050281983
- Publication date Dec 22, 2005
- T. Todd Crkvenac
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad with reduced stress window
- Publication number 20050275135
- Publication date Dec 15, 2005
- Kyle W. David
- B24 - GRINDING POLISHING
Information Patent Application
Method of forming a layered polishing pad
- Publication number 20050189065
- Publication date Sep 1, 2005
- Mark J. Boldizar
- B24 - GRINDING POLISHING