Jassem Ahmed Abdallah

Person

Albany, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Rework and stripping of complex patterning layers using chemical me...
- Patent number 9,934,980
- Issue date Apr 3, 2018
- International Business Machines Corporation
- Jassem A. Abdallah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rework and stripping of complex patterning layers using chemical me...
- Patent number 9,190,285
- Issue date Nov 17, 2015
- International Business Machines Corporation
- Jassem A. Abdallah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grapho-epitaxy DSA process with dimension control of template pattern
- Patent number 9,123,658
- Issue date Sep 1, 2015
- International Business Machines Corporation
- Jassem A. Abdallah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DSA grapho-epitaxy process with etch stop material
- Patent number 8,859,433
- Issue date Oct 14, 2014
- International Business Machines Corporation
- Jassem A. Abdallah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grapho-epitaxy DSA process with dimension control of template pattern
- Patent number 8,853,085
- Issue date Oct 7, 2014
- International Business Machines Corporation
- Jassem A. Abdallah
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Simultaneous photoresist development and neutral polymer layer form...
- Patent number 8,715,917
- Issue date May 6, 2014
- International Business Machines Corporation
- Steven J. Holmes
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
REWORK AND STRIPPING OF COMPLEX PATTERNING LAYERS USING CHEMICAL ME...
- Publication number 20150371863
- Publication date Dec 24, 2015
- International Business Machines Corporation
- Jassem A. Abdallah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REWORK AND STRIPPING OF COMPLEX PATTERNING LAYERS USING CHEMICAL ME...
- Publication number 20150325450
- Publication date Nov 12, 2015
- INTERNATIONAL BUSINESS MACHINES CORPORATION
- Jassem A. Abdallah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRAPHO-EPITAXY DSA PROCESS WITH DIMENSION CONTROL OF TEMPLATE PATTERN
- Publication number 20140322917
- Publication date Oct 30, 2014
- Jassem A. Abdallah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRAPHO-EPITAXY DSA PROCESS WITH DIMENSION CONTROL OF TEMPLATE PATTERN
- Publication number 20140315390
- Publication date Oct 23, 2014
- International Business Machines Corporation
- JASSEM A. ABDALLAH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DSA GRAPHO-EPITAXY PROCESS WITH ETCH STOP MATERIAL
- Publication number 20140256145
- Publication date Sep 11, 2014
- International Business Machines Corporation
- JASSEM A. ABDALLAH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMULTANEOUS PHOTORESIST DEVELOPMENT AND NEUTRAL POLYMER LAYER FORM...
- Publication number 20140099583
- Publication date Apr 10, 2014
- International Business Machines Corporation
- Steven J. Holmes
- B82 - NANO-TECHNOLOGY

Jassem Ahmed Abdallah

Person

Patents Grantslast 30 patents

Rework and stripping of complex patterning layers using chemical me...

Rework and stripping of complex patterning layers using chemical me...

Grapho-epitaxy DSA process with dimension control of template pattern

DSA grapho-epitaxy process with etch stop material

Grapho-epitaxy DSA process with dimension control of template pattern

Simultaneous photoresist development and neutral polymer layer form...

Patents Applicationslast 30 patents

REWORK AND STRIPPING OF COMPLEX PATTERNING LAYERS USING CHEMICAL ME...

REWORK AND STRIPPING OF COMPLEX PATTERNING LAYERS USING CHEMICAL ME...

GRAPHO-EPITAXY DSA PROCESS WITH DIMENSION CONTROL OF TEMPLATE PATTERN

GRAPHO-EPITAXY DSA PROCESS WITH DIMENSION CONTROL OF TEMPLATE PATTERN

DSA GRAPHO-EPITAXY PROCESS WITH ETCH STOP MATERIAL

SIMULTANEOUS PHOTORESIST DEVELOPMENT AND NEUTRAL POLYMER LAYER FORM...