Jay P. Gupta

Person

Hillsboro, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Transistor structures including a non-planar body having variable a...
- Patent number 11,532,619
- Issue date Dec 20, 2022
- Intel Corporation
- Willy Rachmady
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for high pressure cure of flowable dielectric...
- Patent number 11,189,487
- Issue date Nov 30, 2021
- Intel Corporation
- Jonathan E. Leonard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric gap-fill material deposition
- Patent number 10,811,251
- Issue date Oct 20, 2020
- Intel Corporation
- Jeanne L. Luce
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Resistive random access memory with deuterium
- Patent number 10,573,809
- Issue date Feb 25, 2020
- Intel Corporation
- Prashant Majhi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
NANORIBBON-BASED TRANSISTOR WITH UNIFORM OXIDE
- Publication number 20240355876
- Publication date Oct 24, 2024
- Intel Corporation
- Siddharth Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICRO-LED DISPLAY ARCHITECTURE FOR HIGH VOLUME MANUFACTURING
- Publication number 20230317687
- Publication date Oct 5, 2023
- Intel Corporation
- Bhupendra KUMAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ATOMIC DIFFUSION HYBRID BONDING AND APPARATUS MADE FROM SAME
- Publication number 20230299040
- Publication date Sep 21, 2023
- Intel Corporation
- Jay Prakash Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GALLIUM NITRIDE (GAN) INTEGRATED CIRCUIT TECHNOLOGY WITH MULTI-LAYE...
- Publication number 20230069054
- Publication date Mar 2, 2023
- Intel Corporation
- Souvik GHOSH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD & APPARATUS FOR HIGH PRESSURE CURE OF FLOWABLE DIELECTRIC FILMS
- Publication number 20210287901
- Publication date Sep 16, 2021
- Intel Corporation
- Jonathan E. LEONARD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR STRUCTURES INCLUDING A NON-PLANAR BODY HAVING VARIABLE A...
- Publication number 20200312841
- Publication date Oct 1, 2020
- Intel Corporation
- Willy RACHMADY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STACKED TRANSISTORS WITH DIELECTRIC BETWEEN SOURCE/DRAIN MATERIALS...
- Publication number 20200294969
- Publication date Sep 17, 2020
- Intel Corporation
- Willy Rachmady
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC GAP-FILL MATERIAL DEPOSITION
- Publication number 20190181003
- Publication date Jun 13, 2019
- Intel Corporation
- Jeanne L. LUCE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESISTIVE RANDOM ACCESS MEMORY WITH DEUTERIUM
- Publication number 20190036020
- Publication date Jan 31, 2019
- Intel Corporation
- Prashant Majhi
- H01 - BASIC ELECTRIC ELEMENTS

Jay P. Gupta

Person

Patents Grantslast 30 patents

Transistor structures including a non-planar body having variable a...

Method and apparatus for high pressure cure of flowable dielectric...

Dielectric gap-fill material deposition

Resistive random access memory with deuterium

Patents Applicationslast 30 patents

NANORIBBON-BASED TRANSISTOR WITH UNIFORM OXIDE

MICRO-LED DISPLAY ARCHITECTURE FOR HIGH VOLUME MANUFACTURING

METHOD OF ATOMIC DIFFUSION HYBRID BONDING AND APPARATUS MADE FROM SAME

GALLIUM NITRIDE (GAN) INTEGRATED CIRCUIT TECHNOLOGY WITH MULTI-LAYE...

METHOD & APPARATUS FOR HIGH PRESSURE CURE OF FLOWABLE DIELECTRIC FILMS

TRANSISTOR STRUCTURES INCLUDING A NON-PLANAR BODY HAVING VARIABLE A...

STACKED TRANSISTORS WITH DIELECTRIC BETWEEN SOURCE/DRAIN MATERIALS...

DIELECTRIC GAP-FILL MATERIAL DEPOSITION

RESISTIVE RANDOM ACCESS MEMORY WITH DEUTERIUM