Jay R. Wallace

Person

Danvers, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Compact low angle ion beam extraction assembly and processing appar...
- Patent number 12,191,117
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate halo arrangement for improved process uniformity
- Patent number 12,106,943
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and system including high angle extraction optics
- Patent number 11,948,781
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Christopher Campbell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable extraction assembly for wide angle ion beam
- Patent number 11,495,430
- Issue date Nov 8, 2022
- Applied Materials, Inc.
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and system including high angle extraction optics
- Patent number 11,361,935
- Issue date Jun 14, 2022
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas injection system for ion beam device
- Patent number 10,062,548
- Issue date Aug 28, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Jay Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas injection system for ion beam device
- Patent number 9,865,433
- Issue date Jan 9, 2018
- Varian Semiconductor Equipment Associats, Inc.
- Jay Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanner for GCIB system
- Patent number 8,791,430
- Issue date Jul 29, 2014
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced maintenance chemical oxide removal (COR) processing system
- Patent number 8,409,399
- Issue date Apr 2, 2013
- Tokyo Electron Limited
- Arthur H. LaFlamme
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
High throughput chemical treatment system and method of operating
- Patent number 8,323,410
- Issue date Dec 4, 2012
- Tokyo Electron Limited
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High throughput processing system for chemical treatment and therma...
- Patent number 8,303,716
- Issue date Nov 6, 2012
- Tokyo Electron Limited
- Jay R. Wallace
- B08 - CLEANING
Information Patent Grant
Substrate support for high throughput chemical treatment system
- Patent number 8,287,688
- Issue date Oct 16, 2012
- Tokyo Electron Limited
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heater assembly for high throughput chemical treatment system
- Patent number 8,115,140
- Issue date Feb 14, 2012
- Tokyo Electron Limited
- Charles R. Launsby
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing system and method for chemically treating a substrate
- Patent number 7,964,058
- Issue date Jun 21, 2011
- Tokyo Electron Limited
- Thomas Hamelin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing system and method for treating a substrate
- Patent number 7,651,583
- Issue date Jan 26, 2010
- Tokyo Electron Limited
- Martin Kent
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing system and method for treating a substrate
- Patent number 7,462,564
- Issue date Dec 9, 2008
- Tokyo Electron Limited
- Thomas Hamelin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for improved baffle plate
- Patent number 7,461,614
- Issue date Dec 9, 2008
- Tokyo Electron Limited
- Steven T Fink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical processing system and method
- Patent number 7,462,243
- Issue date Dec 9, 2008
- Tokyo Electron Limited
- Arthur H Laflamme, Jr.
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for thermally insulating adjacent temperature...
- Patent number 7,214,274
- Issue date May 8, 2007
- Tokyo Electron Limited
- Jay Wallace
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for providing vacuum isolation
- Patent number 7,083,161
- Issue date Aug 1, 2006
- Tokyo Electron Limited
- Jay Wallace
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Processing system and method for thermally treating a substrate
- Patent number 7,079,760
- Issue date Jul 18, 2006
- Tokyo Electron Limited
- Thomas Hamelin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing system and method for treating a substrate
- Patent number 7,029,536
- Issue date Apr 18, 2006
- Tokyo Electron Limited
- Thomas Hamelin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing system and method for chemically treating a substrate
- Patent number 6,951,821
- Issue date Oct 4, 2005
- Tokyo Electron Limited
- Thomas Hamelin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electronic device processing equipment having contact gasket betwee...
- Patent number 6,695,318
- Issue date Feb 24, 2004
- Tokyo Electron Limited
- Stephen N. Golovato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching system and etching chamber
- Patent number 6,558,506
- Issue date May 6, 2003
- Tokyo Electron Limited
- Richard J. Freeman
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FASTENING ASSEMBLY FOR BEAM BLOCKER IN ION PROCESSING APPARATUS
- Publication number 20230197422
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Kevin T. Ryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPACT LOW ANGLE ION BEAM EXTRACTION ASSEMBLY AND PROCESSING APPAR...
- Publication number 20230124509
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY
- Publication number 20220384156
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS
- Publication number 20220148843
- Publication date May 12, 2022
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE EXTRACTION ASSEMBLY FOR WIDE ANGLE ION BEAM
- Publication number 20220020557
- Publication date Jan 20, 2022
- Applied Materials, Inc.
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS
- Publication number 20210391155
- Publication date Dec 16, 2021
- Applied Materials, Inc.
- Christopher Campbell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY
- Publication number 20190272983
- Publication date Sep 5, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Jay Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOVABLE SUBSTRATE PLANE STRUCTURE RING
- Publication number 20180122670
- Publication date May 3, 2018
- Ernest E. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS INJECTION SYSTEM FOR ION BEAM DEVICE
- Publication number 20170062185
- Publication date Mar 2, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Jay Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH THROUGHPUT PROCESSING SYSTEM FOR CHEMICAL TREATMENT AND THERMA...
- Publication number 20130061878
- Publication date Mar 14, 2013
- TOKYO ELECTRON LIMITED
- Jay R. Wallace
- B08 - CLEANING
Information Patent Application
SCANNER FOR GCIB SYSTEM
- Publication number 20120223249
- Publication date Sep 6, 2012
- TEL Epion Inc.
- Matthew C. GWINN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT EXCHANGER AND ASSOCIATED METHODS
- Publication number 20120125581
- Publication date May 24, 2012
- 7AC Technologies, Inc.
- Mark Allen
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
PROCESSING SYSTEM AND METHOD FOR CHEMICALLY TREATING A SUBSTRATE
- Publication number 20110204029
- Publication date Aug 25, 2011
- TOKYO ELECTRON LIMITED
- Thomas Hamelin
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SUBSTRATE SUPPORT FOR HIGH THROUGHPUT CHEMICAL TREATMENT SYSTEM
- Publication number 20100024981
- Publication date Feb 4, 2010
- TOKYO ELECTRON LIMITED
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH THROUGHPUT PROCESSING SYSTEM FOR CHEMICAL TREATMENT AND THERMA...
- Publication number 20100024982
- Publication date Feb 4, 2010
- TOKYO ELECTRON LIMITED
- Jay R. Wallace
- B08 - CLEANING
Information Patent Application
HEATER ASSEMBLY FOR HIGH THROUGHPUT CHEMICAL TREATMENT SYSTEM
- Publication number 20100025389
- Publication date Feb 4, 2010
- TOKYO ELECTRON LIMITED
- Charles R. Launsby
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH THROUGHPUT CHEMICAL TREATMENT SYSTEM AND METHOD OF OPERATING
- Publication number 20100025367
- Publication date Feb 4, 2010
- TOKYO ELECTRON LIMITED
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduced Maintenance Chemical Oxide Removal (COR) Processing System
- Publication number 20090226633
- Publication date Sep 10, 2009
- TOKYO ELECTRON LIMITED
- Arthur H. LaFlamme, JR.
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Processing system and method for treating a substrate
- Publication number 20060134919
- Publication date Jun 22, 2006
- TOKYO ELECTRON LIMITED
- Thomas Hamelin
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Chemical processing system and method
- Publication number 20060090850
- Publication date May 4, 2006
- TOKYO ELECTRON LIMITED
- Arthur H. Laflamme
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing system and method for treating a substrate
- Publication number 20050269030
- Publication date Dec 8, 2005
- TOKYO ELECTRON LIMITED
- Martin Kent
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for providing vacuum isolation
- Publication number 20050218365
- Publication date Oct 6, 2005
- TOKYO ELECTRON LIMITED
- Jay R. Wallace
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
Processing system and method for chemically treating a substrate
- Publication number 20050211386
- Publication date Sep 29, 2005
- TOKYO ELECTRON LIMITED
- Thomas Hamelin
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method and apparatus for improved baffle plate
- Publication number 20050098265
- Publication date May 12, 2005
- TOKYO ELECTRON LIMITED
- Steven T. Fink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for thermally insulating adjacent temperature...
- Publication number 20040182324
- Publication date Sep 23, 2004
- TOKYO ELECTRON LIMITED
- Jay Wallace
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Reduced maintenance chemical oxide removal (COR) processing system
- Publication number 20040182315
- Publication date Sep 23, 2004
- TOKYO ELECTRON LIMITED
- Arthur H. Laflamme
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Processing system and method for treating a substrate
- Publication number 20040185670
- Publication date Sep 23, 2004
- TOKYO ELECTRON LIMITED
- Thomas Hamelin
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Processing system and method for thermally treating a substrate
- Publication number 20040184792
- Publication date Sep 23, 2004
- TOKYO ELECTRON LIMITED
- Thomas Hamelin
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Processing system and method for chemically treating a substrate
- Publication number 20040182417
- Publication date Sep 23, 2004
- TOKYO ELECTRON LIMITED
- Thomas Hamelin
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Electronic device processing equipment having contact gasket betwee...
- Publication number 20020093148
- Publication date Jul 18, 2002
- TOKYO ELECTRON LIMITED
- Stephen N. Golovato
- H01 - BASIC ELECTRIC ELEMENTS

Jay R. Wallace

Person

Patents Grantslast 30 patents

Compact low angle ion beam extraction assembly and processing appar...

Substrate halo arrangement for improved process uniformity

Apparatus and system including high angle extraction optics

Tunable extraction assembly for wide angle ion beam

Apparatus and system including high angle extraction optics

Gas injection system for ion beam device

Gas injection system for ion beam device

Scanner for GCIB system

Reduced maintenance chemical oxide removal (COR) processing system

High throughput chemical treatment system and method of operating

High throughput processing system for chemical treatment and therma...

Substrate support for high throughput chemical treatment system

Heater assembly for high throughput chemical treatment system

Processing system and method for chemically treating a substrate

Processing system and method for treating a substrate

Processing system and method for treating a substrate

Method and apparatus for improved baffle plate

Chemical processing system and method

Method and apparatus for thermally insulating adjacent temperature...

Method and apparatus for providing vacuum isolation

Processing system and method for thermally treating a substrate

Processing system and method for treating a substrate

Processing system and method for chemically treating a substrate

Electronic device processing equipment having contact gasket betwee...

Etching system and etching chamber

Patents Applicationslast 30 patents

FASTENING ASSEMBLY FOR BEAM BLOCKER IN ION PROCESSING APPARATUS

COMPACT LOW ANGLE ION BEAM EXTRACTION ASSEMBLY AND PROCESSING APPAR...

SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY

APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS

TUNABLE EXTRACTION ASSEMBLY FOR WIDE ANGLE ION BEAM

APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS

SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY

REMOVABLE SUBSTRATE PLANE STRUCTURE RING

GAS INJECTION SYSTEM FOR ION BEAM DEVICE

HIGH THROUGHPUT PROCESSING SYSTEM FOR CHEMICAL TREATMENT AND THERMA...

SCANNER FOR GCIB SYSTEM

HEAT EXCHANGER AND ASSOCIATED METHODS

PROCESSING SYSTEM AND METHOD FOR CHEMICALLY TREATING A SUBSTRATE

SUBSTRATE SUPPORT FOR HIGH THROUGHPUT CHEMICAL TREATMENT SYSTEM

HIGH THROUGHPUT PROCESSING SYSTEM FOR CHEMICAL TREATMENT AND THERMA...

HEATER ASSEMBLY FOR HIGH THROUGHPUT CHEMICAL TREATMENT SYSTEM

HIGH THROUGHPUT CHEMICAL TREATMENT SYSTEM AND METHOD OF OPERATING

Reduced Maintenance Chemical Oxide Removal (COR) Processing System

Processing system and method for treating a substrate

Chemical processing system and method

Processing system and method for treating a substrate

Method and apparatus for providing vacuum isolation

Processing system and method for chemically treating a substrate

Method and apparatus for improved baffle plate

Method and apparatus for thermally insulating adjacent temperature...

Reduced maintenance chemical oxide removal (COR) processing system

Processing system and method for treating a substrate

Processing system and method for thermally treating a substrate

Processing system and method for chemically treating a substrate

Electronic device processing equipment having contact gasket betwee...