Jean R. Vatus

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Silicon wafers by epitaxial deposition
- Patent number 11,041,253
- Issue date Jun 22, 2021
- Svagos Technik, Inc.
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
Silicon wafers by epitaxial deposition
- Patent number 9,982,363
- Issue date May 29, 2018
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
Silicon wafers by epitaxial deposition
- Patent number 9,255,346
- Issue date Feb 9, 2016
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
Methods for depositing layers having reduced interfacial contamination
- Patent number 9,058,988
- Issue date Jun 16, 2015
- Applied Materials, Inc.
- Jean R. Vatus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer processing hardware for epitaxial deposition with reduced bac...
- Patent number 8,951,351
- Issue date Feb 10, 2015
- Applied Materials, Inc.
- Kailash Kiran Patalay
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for pedestal adjustment
- Patent number 8,747,560
- Issue date Jun 10, 2014
- Applied Materials, Inc.
- Richard Collins
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus to enhance process gas temperature in a CVD re...
- Patent number 8,512,472
- Issue date Aug 20, 2013
- Applied Materials, Inc.
- Jean R. Vatus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Non-contact substrate support position sensing system and correspon...
- Patent number 8,441,640
- Issue date May 14, 2013
- Applied Materials, Inc.
- Kailash Kiran Patalay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
System and method for pedestal adjustment
- Patent number 8,398,777
- Issue date Mar 19, 2013
- Applied Materials, Inc.
- Richard O. Collins
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Apparatus for improved azimuthal thermal uniformity of a substrate
- Patent number 7,964,038
- Issue date Jun 21, 2011
- Applied Materials, Inc.
- Kailash Kiran Patalay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pre-cleaning of substrates in epitaxy chambers
- Patent number 7,651,948
- Issue date Jan 26, 2010
- Applied Materials, Inc.
- Yihwan Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of calibrating and using a semiconductor processing system
- Patent number 6,876,442
- Issue date Apr 5, 2005
- Applied Materials, Inc.
- Jean R. Vatus
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SILICON WAFERS BY EPITAXIAL DEPOSITION
- Publication number 20190003076
- Publication date Jan 3, 2019
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
SILICON WAFERS BY EPITAXIAL DEPOSITION
- Publication number 20160222544
- Publication date Aug 4, 2016
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
HIGH THROUGHPUT EPITAXIAL DEPOSITION SYSTEM FOR SINGLE CRYSTAL SOLA...
- Publication number 20140318442
- Publication date Oct 30, 2014
- Crystal Solar Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
SYSTEM AND METHOD FOR PEDESTAL ADJUSTMENT
- Publication number 20130152859
- Publication date Jun 20, 2013
- Applied Materials, Inc.
- Richard O. Collins
- C30 - CRYSTAL GROWTH
Information Patent Application
SILICON WAFERS BY EPITAXIAL DEPOSITION
- Publication number 20130032084
- Publication date Feb 7, 2013
- Crytal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
METHODS FOR DEPOSITING LAYERS HAVING REDUCED INTERFACIAL CONTAMINATION
- Publication number 20100255661
- Publication date Oct 7, 2010
- Applied Materials, Inc.
- JEAN R. VATUS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS TO ENHANCE PROCESS GAS TEMPERATURE IN A CVD RE...
- Publication number 20100120259
- Publication date May 13, 2010
- Applied Materials, Inc.
- JEAN R. VATUS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR IMPROVED AZIMUTHAL THERMAL UNIFORMITY OF...
- Publication number 20100086784
- Publication date Apr 8, 2010
- Applied Materials, Inc.
- KAILASH KIRAN PATALAY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR PEDESTAL ADJUSTMENT
- Publication number 20090272719
- Publication date Nov 5, 2009
- Applied Materials, Inc.
- Richard O. Collins
- C30 - CRYSTAL GROWTH
Information Patent Application
NON-CONTACT SUBSTRATE SUPPORT POSITION SENSING SYSTEM AND CORRESPON...
- Publication number 20090276097
- Publication date Nov 5, 2009
- Applied Materials, Inc.
- Kailash Kiran Patalay
- C30 - CRYSTAL GROWTH
Information Patent Application
Pre-cleaning of substrates in epitaxy chambers
- Publication number 20080245767
- Publication date Oct 9, 2008
- APPLIED MATERIALS, INC.
- Yihwan Kim
- C30 - CRYSTAL GROWTH
Information Patent Application
WAFER PROCESSING HARDWARE FOR EPITAXIAL DEPOSITION WITH REDUCED BAC...
- Publication number 20080066684
- Publication date Mar 20, 2008
- Applied Materials, Inc.
- KAILASH KIRAN PATALAY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatuses and methods for forming a substantially facet-free epit...
- Publication number 20040175893
- Publication date Sep 9, 2004
- APPLIED MATERIALS, INC.
- Jean R. Vatus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of calibrating and using a semiconductor processing system
- Publication number 20030151733
- Publication date Aug 14, 2003
- APPLIED MATERIALS, INC.
- Jean R. Vatus
- H01 - BASIC ELECTRIC ELEMENTS

Jean R. Vatus

Person

Patents Grantslast 30 patents

Silicon wafers by epitaxial deposition

Silicon wafers by epitaxial deposition

Silicon wafers by epitaxial deposition

Methods for depositing layers having reduced interfacial contamination

Wafer processing hardware for epitaxial deposition with reduced bac...

System and method for pedestal adjustment

Method and apparatus to enhance process gas temperature in a CVD re...

Non-contact substrate support position sensing system and correspon...

System and method for pedestal adjustment

Apparatus for improved azimuthal thermal uniformity of a substrate

Pre-cleaning of substrates in epitaxy chambers

Method of calibrating and using a semiconductor processing system

Patents Applicationslast 30 patents

SILICON WAFERS BY EPITAXIAL DEPOSITION

SILICON WAFERS BY EPITAXIAL DEPOSITION

HIGH THROUGHPUT EPITAXIAL DEPOSITION SYSTEM FOR SINGLE CRYSTAL SOLA...

SYSTEM AND METHOD FOR PEDESTAL ADJUSTMENT

SILICON WAFERS BY EPITAXIAL DEPOSITION

METHODS FOR DEPOSITING LAYERS HAVING REDUCED INTERFACIAL CONTAMINATION

METHOD AND APPARATUS TO ENHANCE PROCESS GAS TEMPERATURE IN A CVD RE...

METHODS AND APPARATUS FOR IMPROVED AZIMUTHAL THERMAL UNIFORMITY OF...

SYSTEM AND METHOD FOR PEDESTAL ADJUSTMENT

NON-CONTACT SUBSTRATE SUPPORT POSITION SENSING SYSTEM AND CORRESPON...

Pre-cleaning of substrates in epitaxy chambers

WAFER PROCESSING HARDWARE FOR EPITAXIAL DEPOSITION WITH REDUCED BAC...

Apparatuses and methods for forming a substantially facet-free epit...

Method of calibrating and using a semiconductor processing system