Jeff Farnsworth

Person

Los Gatos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Active secondary exposure mask to manufacture integrated circuits
- Patent number 7,014,956
- Issue date Mar 21, 2006
- Intel Corporation
- Fred Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modifying circuitry features in radiation sensitive layers with act...
- Patent number 6,942,958
- Issue date Sep 13, 2005
- Intel Corporation
- Fred Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask frame modification to eliminate process induced critical...
- Patent number 6,692,878
- Issue date Feb 17, 2004
- Intel Corporation
- Wilman Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask frame modification to eliminate process induced critical...
- Patent number 6,485,869
- Issue date Nov 26, 2002
- Intel Corporation
- Wilman Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modulation of peripheral critical dimension on photomask with diffe...
- Patent number 6,210,843
- Issue date Apr 3, 2001
- Intel Corporation
- Fred T. Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for precision determination of phase-shift in...
- Patent number 5,700,602
- Issue date Dec 23, 1997
- Intel Corporation
- Giang T. Dao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method of repairing a photolithographic mask
- Publication number 20080057410
- Publication date Mar 6, 2008
- Wen-Hao Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alternating phase shift masking
- Publication number 20070231712
- Publication date Oct 4, 2007
- Song Pang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Modifying circuitry features in radiation sensitive layers with act...
- Publication number 20040170906
- Publication date Sep 2, 2004
- Fred Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Active secondary exposure mask to manufacture integrated circuits
- Publication number 20030129502
- Publication date Jul 10, 2003
- Fred Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposed phase edge mask method for generating periodic structures w...
- Publication number 20030039893
- Publication date Feb 27, 2003
- Jeff Farnsworth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask frame modification to eliminate process induced critical...
- Publication number 20030008221
- Publication date Jan 9, 2003
- Wilman Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK FRAME MODIFICATION TO ELIMINATE PROCESS INDUCED CRITICAL...
- Publication number 20020132170
- Publication date Sep 19, 2002
- WILMAN TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jeff Farnsworth

Person

Patents Grantslast 30 patents

Active secondary exposure mask to manufacture integrated circuits

Modifying circuitry features in radiation sensitive layers with act...

Photomask frame modification to eliminate process induced critical...

Photomask frame modification to eliminate process induced critical...

Modulation of peripheral critical dimension on photomask with diffe...

Method and apparatus for precision determination of phase-shift in...

Patents Applicationslast 30 patents

Method of repairing a photolithographic mask

Alternating phase shift masking

Modifying circuitry features in radiation sensitive layers with act...

Active secondary exposure mask to manufacture integrated circuits

Exposed phase edge mask method for generating periodic structures w...

Photomask frame modification to eliminate process induced critical...

PHOTOMASK FRAME MODIFICATION TO ELIMINATE PROCESS INDUCED CRITICAL...