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Jeffrey John LOMBARDO
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Roxbury, CT, US
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last 30 patents
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Patent Grant
Apparatus for and method of in-situ particle removal in a lithograp...
Patent number
11,550,231
Issue date
Jan 10, 2023
ASML Holding N.V.
Jeffrey John Lombardo
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Alignment mark for two-dimensional alignment in an alignment system
Patent number
11,156,928
Issue date
Oct 26, 2021
ASML Holding N.V.
Gerrit Johannes Nijmeijer
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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last 30 patents
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Patent Application
APPARATUS FOR AND METHOD OF IN-SITU PARTICLE REMOVAL IN A LITHOGRAP...
Publication number
20220075277
Publication date
Mar 10, 2022
ASML Holding N.V.
Jeffrey John LOMBARDO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Alignment Mark For Two-Dimensional Alignment In An Alignment System
Publication number
20200124995
Publication date
Apr 23, 2020
ASML Holding N.V.
Gerrit Johannes NIJMEIJER
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY