Jeffrey Mackey

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for characterizing thickness and topography of...
- Patent number 7,823,440
- Issue date Nov 2, 2010
- Micron Technology, Inc.
- Jeffrey L. Mackey
- G01 - MEASURING TESTING
Information Patent Grant
Optimized optical lithography illumination source for use during th...
- Patent number 7,760,329
- Issue date Jul 20, 2010
- Micron Technology, Inc.
- Jeffrey L. Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarized reticle, photolithography system, and method of fabricati...
- Patent number 7,592,107
- Issue date Sep 22, 2009
- Micron Technology, Inc.
- Jeff Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a pattern using a polarized reticle in conjunctio...
- Patent number 7,569,311
- Issue date Aug 4, 2009
- Micron Technology, Inc.
- Jeff Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic systems and methods for producing sub-diffraction...
- Patent number 7,538,858
- Issue date May 26, 2009
- Micron Technology, Inc.
- Jeffrey L. Mackey
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optimized optical lithography illumination source for use during th...
- Patent number 7,283,205
- Issue date Oct 16, 2007
- Micron Technology, Inc.
- Jeffrey L. Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarized reticle, photolithography system, and method of forming a...
- Patent number 7,150,945
- Issue date Dec 19, 2006
- Micron Technology, Inc.
- Jeff Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for controlling radiation beam characteristics...
- Patent number 7,130,022
- Issue date Oct 31, 2006
- Micron Technology, Inc.
- Jeffrey L. Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for controlling radiation beam characteristics...
- Patent number 7,053,987
- Issue date May 30, 2006
- Micron Technology, Inc.
- Jeffrey L. Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized optical lithography illumination source for use during th...
- Patent number 7,046,339
- Issue date May 16, 2006
- Micron Technology, Inc.
- William A. Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for controlling radiation beam characteristics...
- Patent number 6,894,765
- Issue date May 17, 2005
- Micron Technology, Inc.
- Jeffrey L. Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
IMAGERS WITH STRUCTURES FOR NEAR FIELD IMAGING
- Publication number 20120200749
- Publication date Aug 9, 2012
- Ulrich Boettiger
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
PHOTOLITHOGRAPHIC SYSTEMS AND METHODS FOR PRODUCING SUB-DIFFRACTION...
- Publication number 20090203216
- Publication date Aug 13, 2009
- Micron Technology, Inc.
- Jeffrey L. Mackey
- B82 - NANO-TECHNOLOGY
Information Patent Application
Metallic nanostructure color filter array and method of making the...
- Publication number 20090091644
- Publication date Apr 9, 2009
- Jeffrey L. Mackey
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
DYNAMIC ADAPTIVE COLOR FILTER ARRAY
- Publication number 20090086064
- Publication date Apr 2, 2009
- Micron Technology, Inc.
- Jeff Mackey
- G02 - OPTICS
Information Patent Application
SYSTEMS AND METHODS FOR CHARACTERIZING THICKNESS AND TOPOGRAPHY OF...
- Publication number 20090044610
- Publication date Feb 19, 2009
- Micron Technology, Inc.
- Jeffrey L. Mackey
- G01 - MEASURING TESTING
Information Patent Application
OPTIMIZED OPTICAL LITHOGRAPHY ILLUMINATION SOURCE FOR USE DURING TH...
- Publication number 20080043214
- Publication date Feb 21, 2008
- Jeffrey L. Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for rapid printing of near-field and imprint lithographic fe...
- Publication number 20070200276
- Publication date Aug 30, 2007
- Micron Technology, Inc.
- Jeff Mackey
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photolithographic systems and methods for producing sub-diffraction...
- Publication number 20070159617
- Publication date Jul 12, 2007
- Jeffrey L. Mackey
- B82 - NANO-TECHNOLOGY
Information Patent Application
Polarized reticle, photolithography system, and method of fabricati...
- Publication number 20070122720
- Publication date May 31, 2007
- Jeff Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasmonic array for maskless lithography
- Publication number 20070048628
- Publication date Mar 1, 2007
- Jeffrey L. Mackey
- G02 - OPTICS
Information Patent Application
Method of forming a pattern using a polarized reticle in conjuction...
- Publication number 20070020535
- Publication date Jan 25, 2007
- Jeff Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimized optical lithography illumination source for use during th...
- Publication number 20060216844
- Publication date Sep 28, 2006
- William A. Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and systems for controlling radiation beam characteristics...
- Publication number 20060176462
- Publication date Aug 10, 2006
- Micron Technology, Inc.
- Jeffrey L. Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimized optical lithography illumination source for use during th...
- Publication number 20060158633
- Publication date Jul 20, 2006
- Micron Technology, Inc.
- Jeffrey L. Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR CONTROLLING RADIATION BEAM CHARACTERISTICS...
- Publication number 20050200824
- Publication date Sep 15, 2005
- Micron Technology, Inc.
- Jeffrey L. Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimized optical lithography illumination source for use during th...
- Publication number 20050195379
- Publication date Sep 8, 2005
- William A. Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polarized reticle, photolithography system, and method of forming a...
- Publication number 20050105180
- Publication date May 19, 2005
- Jeff Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR CONTROLLING RADIATION BEAM CHARACTERISTICS...
- Publication number 20050078293
- Publication date Apr 14, 2005
- Jeffrey L. Mackey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jeffrey Mackey

Person

Patents Grantslast 30 patents

Systems and methods for characterizing thickness and topography of...

Optimized optical lithography illumination source for use during th...

Polarized reticle, photolithography system, and method of fabricati...

Method of forming a pattern using a polarized reticle in conjunctio...

Photolithographic systems and methods for producing sub-diffraction...

Optimized optical lithography illumination source for use during th...

Polarized reticle, photolithography system, and method of forming a...

Methods and systems for controlling radiation beam characteristics...

Methods and systems for controlling radiation beam characteristics...

Optimized optical lithography illumination source for use during th...

Methods and systems for controlling radiation beam characteristics...

Patents Applicationslast 30 patents

IMAGERS WITH STRUCTURES FOR NEAR FIELD IMAGING

PHOTOLITHOGRAPHIC SYSTEMS AND METHODS FOR PRODUCING SUB-DIFFRACTION...

Metallic nanostructure color filter array and method of making the...

DYNAMIC ADAPTIVE COLOR FILTER ARRAY

SYSTEMS AND METHODS FOR CHARACTERIZING THICKNESS AND TOPOGRAPHY OF...

OPTIMIZED OPTICAL LITHOGRAPHY ILLUMINATION SOURCE FOR USE DURING TH...

Method for rapid printing of near-field and imprint lithographic fe...

Photolithographic systems and methods for producing sub-diffraction...

Polarized reticle, photolithography system, and method of fabricati...

Plasmonic array for maskless lithography

Method of forming a pattern using a polarized reticle in conjuction...

Optimized optical lithography illumination source for use during th...

Methods and systems for controlling radiation beam characteristics...

Optimized optical lithography illumination source for use during th...

METHODS AND SYSTEMS FOR CONTROLLING RADIATION BEAM CHARACTERISTICS...

Optimized optical lithography illumination source for use during th...

Polarized reticle, photolithography system, and method of forming a...

METHODS AND SYSTEMS FOR CONTROLLING RADIATION BEAM CHARACTERISTICS...