Jeffrey P. Chamberlain

Person

Aurora, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Anionic abrasive particles treated with positively charged polyelec...
- Patent number 7,306,637
- Issue date Dec 11, 2007
- Cabot Microelectronics Corporation
- Isaac K Cherian
- B24 - GRINDING POLISHING
Information Patent Grant
CMP compositions for low-k dielectric materials
- Patent number 6,974,777
- Issue date Dec 13, 2005
- Cabot Microelectronics Corporation
- Kevin J. Moeggenborg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP method utilizing amphiphilic nonionic surfactants
- Patent number 6,936,543
- Issue date Aug 30, 2005
- Cabot Microelectronics Corporation
- David J. Schroeder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for copper CMP using polymeric complexing agents
- Patent number 6,821,897
- Issue date Nov 23, 2004
- Cabot Microelectronics Corporation
- David J. Schroeder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Anionic abrasive particles treated with positively charged polyelec...
- Patent number 6,776,810
- Issue date Aug 17, 2004
- Cabot Microelectronics Corporation
- Isaac K. Cherian
- B24 - GRINDING POLISHING
Information Patent Grant
Preequilibrium polishing method and system
- Patent number 6,726,534
- Issue date Apr 27, 2004
- Cabot Microelectronics Corporation
- Gregory H. Bogush
- B24 - GRINDING POLISHING
Information Patent Grant
Alkali metal-containing polishing system and method
- Patent number 6,612,911
- Issue date Sep 2, 2003
- Cabot Microelectronics Corporation
- Phillip Carter
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP process involving frequency analysis-based monitoring
- Patent number 6,431,953
- Issue date Aug 13, 2002
- Cabot Microelectronics Corporation
- Phillip W. Carter
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
Silicon oxide polishing method utilizing colloidal silica
- Publication number 20080220610
- Publication date Sep 11, 2008
- Cabot Microelectronics Corporation
- Benjamin Bayer
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Rate-enhanced CMP compositions for dielectric films
- Publication number 20080020680
- Publication date Jan 24, 2008
- Cabot Microelectronics Corporation
- Robert Vacassy
- B24 - GRINDING POLISHING
Information Patent Application
System for the preferential removal of silicon oxide
- Publication number 20050072524
- Publication date Apr 7, 2005
- Cabot Microelectronics Corporation
- Brian L. Mueller
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Anionic abrasive particles treated with positively charged polyelec...
- Publication number 20040229552
- Publication date Nov 18, 2004
- Cabot Microelectronics Corporation
- Isaac K. Cherian
- B24 - GRINDING POLISHING
Information Patent Application
CMP method utilizing amphiphilic nonionic surfactants
- Publication number 20030228763
- Publication date Dec 11, 2003
- Cabot Microelectronics Corporation
- David J. Schroeder
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP compositions for low-k dielectric materials
- Publication number 20030228762
- Publication date Dec 11, 2003
- Cabot Microelectronics Corporation
- Kevin J. Moeggenborg
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for copper CMP using polymeric complexing agents
- Publication number 20030124959
- Publication date Jul 3, 2003
- Cabot Microelectronics Corporation
- David J. Schroeder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Alkali metal-containing polishing system and method
- Publication number 20030082998
- Publication date May 1, 2003
- Cabot Microelectronics Corporation
- Phillip Carter
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Integrated chemical-mechanical polishing
- Publication number 20010037821
- Publication date Nov 8, 2001
- Bradley J. Staley
- B24 - GRINDING POLISHING

Jeffrey P. Chamberlain

Person

Patents Grantslast 30 patents

Anionic abrasive particles treated with positively charged polyelec...

CMP compositions for low-k dielectric materials

CMP method utilizing amphiphilic nonionic surfactants

Method for copper CMP using polymeric complexing agents

Anionic abrasive particles treated with positively charged polyelec...

Preequilibrium polishing method and system

Alkali metal-containing polishing system and method

CMP process involving frequency analysis-based monitoring

Patents Applicationslast 30 patents

Silicon oxide polishing method utilizing colloidal silica

Rate-enhanced CMP compositions for dielectric films

System for the preferential removal of silicon oxide

Anionic abrasive particles treated with positively charged polyelec...

CMP method utilizing amphiphilic nonionic surfactants

CMP compositions for low-k dielectric materials

Method for copper CMP using polymeric complexing agents

Alkali metal-containing polishing system and method

Integrated chemical-mechanical polishing