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Jeffrey R. Stack

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  • Clayton, DE, US
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Patents Grantslast 30 patents

  • Information Patent Grant

    High-rate CMP polishing method
    • Patent number 10,857,647
    • Issue date Dec 8, 2020
    • Rohm and Haas Electronic Materials CMP Holdings
    • John Vu Nguyen
    • B24 - GRINDING POLISHING
  • Information Patent Grant

    Trapezoidal CMP groove pattern
    • Patent number 10,857,648
    • Issue date Dec 8, 2020
    • Rohm and Haas Electronic Materials CMP Holdings
    • John Vu Nguyen
    • B24 - GRINDING POLISHING
  • Information Patent Grant

    Controlled residence CMP polishing method
    • Patent number 10,861,702
    • Issue date Dec 8, 2020
    • Rohm and Haas Electronic Materials CMP Holdings
    • John Vu Nguyen
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Grant

    Biased pulse CMP groove pattern
    • Patent number 10,777,418
    • Issue date Sep 15, 2020
    • Rohm and Haas Electronic Materials CMP Holdings, I
    • John Vu Nguyen
    • B24 - GRINDING POLISHING
  • Information Patent Grant

    Uniform CMP polishing method
    • Patent number 10,586,708
    • Issue date Mar 10, 2020
    • Rohm and Haas Electronic Materials CMP Holdings, Inc.
    • John Vu Nguyen
    • B24 - GRINDING POLISHING
  • Information Patent Grant

    Method to shape the surface of chemical mechanical polishing pads
    • Patent number 9,802,293
    • Issue date Oct 31, 2017
    • Rohm and Haas Electronic Materials CMP Holdings, Inc.
    • Jeffrey James Hendron
    • B24 - GRINDING POLISHING
  • Information Patent Grant

    Curved grooving of polishing pads
    • Patent number 7,234,224
    • Issue date Jun 26, 2007
    • Rohm and Haas Electronic Materials CMP Holdings, Inc.
    • Steven Naugler
    • B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents