Jeffrey V. Musser

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Boise, ID, US

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Patents Grantslast 30 patents

Information Patent Grant
High density plasma etching of metallization layer using chlorine a...
- Patent number 6,090,717
- Issue date Jul 18, 2000
- Lam Research Corporation
- Stephen F. Powell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for etching a conductive layer to improve yield
- Patent number 5,849,641
- Issue date Dec 15, 1998
- Lam Research Corporation
- David R. Arnett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlled anode for plasma dry etchers for etching sem...
- Patent number 4,859,304
- Issue date Aug 22, 1989
- Micron Technology, Inc.
- David A. Cathey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...