Jen-Chih Lu

Person

Tainan, TW

People

Patents Grantslast 30 patents

Information Patent Grant
FinFET and gate-all-around FET with selective high-k oxide deposition
- Patent number 12,272,736
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsung-Han Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device
- Patent number 11,848,363
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate spacer structure of FinFET device
- Patent number 11,810,963
- Issue date Nov 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,776,911
- Issue date Oct 3, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET and gate-all-around FET with insulator having hydrophobic si...
- Patent number 11,721,739
- Issue date Aug 8, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsung-Han Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gates and manufacturing methods thereof
- Patent number 11,404,555
- Issue date Aug 2, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jen-Hsiang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active device substrate and method for manufacturing the same
- Patent number 11,392,003
- Issue date Jul 19, 2022
- Au Optronics Corporation
- Cheng-Chan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polarizer substrate and display panel
- Patent number 11,181,769
- Issue date Nov 23, 2021
- Au Optronics Corporation
- Tsai-Sheng Lo
- G02 - OPTICS
Information Patent Grant
FinFET and gate-all-around FET with selective high-k oxide deposition
- Patent number 11,177,361
- Issue date Nov 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsung-Han Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Display device and manufacturing method of polarizer structure
- Patent number 11,137,634
- Issue date Oct 5, 2021
- Au Optronics Corporation
- Han-Sheng Nian
- G02 - OPTICS
Information Patent Grant
Imprint mold and method for manufacturing the same
- Patent number 11,054,740
- Issue date Jul 6, 2021
- AU OPTRONICS CORPORATION
- Sheng-Ming Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,024,582
- Issue date Jun 1, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate spacer structure of FinFET device
- Patent number 11,018,242
- Issue date May 25, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Display panel
- Patent number 11,009,743
- Issue date May 18, 2021
- AU OPTRONICS CORPORATION
- Han-Sheng Nian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Display device and manufacturing method of polarizer structure
- Patent number 10,921,637
- Issue date Feb 16, 2021
- Au Optronics Corporation
- Han-Sheng Nian
- G02 - OPTICS
Information Patent Grant
Gate spacer structure of finFET device
- Patent number 10,811,517
- Issue date Oct 20, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wire grid polarizer and display panel using the same
- Patent number 10,802,189
- Issue date Oct 13, 2020
- AU OPTRONICS CORPORATION
- Huang-Kai Shen
- G02 - OPTICS
Information Patent Grant
Semiconductor device and forming method thereof
- Patent number 10,741,654
- Issue date Aug 11, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 10,692,983
- Issue date Jun 23, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming FinFET and gate-all-around FET with selective hi...
- Patent number 10,672,879
- Issue date Jun 2, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsung-Han Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gates and manufacturing methods thereof
- Patent number 10,644,125
- Issue date May 5, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jen-Hsiang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate spacer structure of FinFET device
- Patent number 10,522,653
- Issue date Dec 31, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET device and method of forming same
- Patent number 10,319,832
- Issue date Jun 11, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including fin structures and manufacturing met...
- Patent number 10,269,968
- Issue date Apr 23, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 10,269,907
- Issue date Apr 23, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 9,947,756
- Issue date Apr 17, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Display panel with protective adhesive portion and manufacturing me...
- Patent number 9,645,428
- Issue date May 9, 2017
- AU OPTRONICS CORPORATION
- Chih-Sheng Chang
- G02 - OPTICS
Information Patent Grant
Semiconductor apparatus and cleaning unit thereof
- Patent number 7,635,417
- Issue date Dec 22, 2009
- Taiwan Semiconductor Manufacturing Co. Ltd.
- Chien-Fang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of curing seal and method of manufacturing liquid crystal pa...
- Patent number 7,385,668
- Issue date Jun 10, 2008
- Au Optronics Corporation
- Te-Kuang Liu
- G02 - OPTICS
Information Patent Grant
Method of curing seal and method of manufacturing liquid crystal pa...
- Patent number 7,061,571
- Issue date Jun 13, 2006
- Au Optronics Corporation
- Te-Kuang Liu
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION
- Publication number 20250241010
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsung-Han TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THEREOF
- Publication number 20240162308
- Publication date May 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pin Chun SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE
- Publication number 20240096986
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20230387024
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION
- Publication number 20230335612
- Publication date Oct 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsung-Han TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND FORMATION METHOD OF SEMICONDUCTOR DEVICE WITH GATE STACK
- Publication number 20230307523
- Publication date Sep 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pin-Chun SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Gates And Manufacturing Methods Thereof
- Publication number 20220344489
- Publication date Oct 27, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Jen-Hsiang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION
- Publication number 20220069098
- Publication date Mar 3, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsung-Han TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE SPACER STRUCTURE OF FINFET DEVICE
- Publication number 20210288162
- Publication date Sep 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20210280516
- Publication date Sep 9, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE DEVICE SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20210247652
- Publication date Aug 12, 2021
- AU OPTRONICS CORPORATION
- Cheng-Chan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE DEVICE AND METHOD OF SENSING FINGERPRINT
- Publication number 20210248341
- Publication date Aug 12, 2021
- AU OPTRONICS CORPORATION
- Chia-Po Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DISPLAY DEVICE AND MANUFACTURING METHOD OF POLARIZER STRUCTURE
- Publication number 20210116743
- Publication date Apr 22, 2021
- AU OPTRONICS CORPORATION
- Han-Sheng Nian
- G02 - OPTICS
Information Patent Application
Gate Spacer Structure of FinFET Device
- Publication number 20200403085
- Publication date Dec 24, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE
- Publication number 20200365697
- Publication date Nov 19, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISPLAY PANEL
- Publication number 20200326588
- Publication date Oct 15, 2020
- AU OPTRONICS CORPORATION
- Han-Sheng NIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION
- Publication number 20200303511
- Publication date Sep 24, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Han TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Gates and Manufacturing Methods Thereof
- Publication number 20200266282
- Publication date Aug 20, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Jen-Hsiang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISPLAY DEVICE AND MANUFACTURING METHOD OF POLARIZER STRUCTURE
- Publication number 20200183225
- Publication date Jun 11, 2020
- AU OPTRONICS CORPORATION
- Han-Sheng Nian
- G02 - OPTICS
Information Patent Application
POLARIZER SUBSTRATE AND DISPLAY PANEL
- Publication number 20200133061
- Publication date Apr 30, 2020
- AU OPTRONICS CORPORATION
- Tsai-Sheng Lo
- G02 - OPTICS
Information Patent Application
GATE SPACER STRUCTURE OF FINFET DEVICE
- Publication number 20200135892
- Publication date Apr 30, 2020
- Taiwan Semiconductor Manufacturing Company, Litd.
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLARIZER SUBSTRATE AND MANUFACTURING METHOD THEREOF
- Publication number 20200103572
- Publication date Apr 2, 2020
- AU OPTRONICS CORPORATION
- Wei-Chi Wang
- G02 - OPTICS
Information Patent Application
FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION
- Publication number 20200035800
- Publication date Jan 30, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Han TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Gates and Manufacturing Methods Thereof
- Publication number 20190386112
- Publication date Dec 19, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Jen-Hsiang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FinFET Device and Method of Forming Same
- Publication number 20190273150
- Publication date Sep 5, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20190229197
- Publication date Jul 25, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIRE GRID POLARIZER AND DISPLAY PANEL USING THE SAME
- Publication number 20190094435
- Publication date Mar 28, 2019
- AU OPTRONICS CORPORATION
- HUANG-KAI SHEN
- G02 - OPTICS
Information Patent Application
IMPRINT MOLD AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20190079394
- Publication date Mar 14, 2019
- AU OPTRONICS CORPORATION
- SHENG-MING HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FINFET DEVICE AND METHOD OF FORMING SAME
- Publication number 20180315831
- Publication date Nov 1, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chung-Ting Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20180301417
- Publication date Oct 18, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS

Jen-Chih Lu

Person

Patents Grantslast 30 patents

FinFET and gate-all-around FET with selective high-k oxide deposition

Method for forming semiconductor device

Gate spacer structure of FinFET device

Semiconductor device and manufacturing method thereof

FinFET and gate-all-around FET with insulator having hydrophobic si...

Metal gates and manufacturing methods thereof

Active device substrate and method for manufacturing the same

Polarizer substrate and display panel

FinFET and gate-all-around FET with selective high-k oxide deposition

Display device and manufacturing method of polarizer structure

Imprint mold and method for manufacturing the same

Semiconductor device and manufacturing method thereof

Gate spacer structure of FinFET device

Display panel

Display device and manufacturing method of polarizer structure

Gate spacer structure of finFET device

Wire grid polarizer and display panel using the same

Semiconductor device and forming method thereof

Semiconductor device and manufacturing method thereof

Method for forming FinFET and gate-all-around FET with selective hi...

Metal gates and manufacturing methods thereof

Gate spacer structure of FinFET device

FinFET device and method of forming same

Semiconductor device including fin structures and manufacturing met...

Semiconductor device and manufacturing method thereof

Semiconductor device and manufacturing method thereof

Display panel with protective adhesive portion and manufacturing me...

Semiconductor apparatus and cleaning unit thereof

Method of curing seal and method of manufacturing liquid crystal pa...

Method of curing seal and method of manufacturing liquid crystal pa...

Patents Applicationslast 30 patents

FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THEREOF

METHOD FOR FORMING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION

STRUCTURE AND FORMATION METHOD OF SEMICONDUCTOR DEVICE WITH GATE STACK

Metal Gates And Manufacturing Methods Thereof

FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION

GATE SPACER STRUCTURE OF FINFET DEVICE

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

ACTIVE DEVICE SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME

PHOTOSENSITIVE DEVICE AND METHOD OF SENSING FINGERPRINT

DISPLAY DEVICE AND MANUFACTURING METHOD OF POLARIZER STRUCTURE

Gate Spacer Structure of FinFET Device

METHOD FOR FORMING SEMICONDUCTOR DEVICE

DISPLAY PANEL

FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION

Metal Gates and Manufacturing Methods Thereof

DISPLAY DEVICE AND MANUFACTURING METHOD OF POLARIZER STRUCTURE

POLARIZER SUBSTRATE AND DISPLAY PANEL

GATE SPACER STRUCTURE OF FINFET DEVICE

POLARIZER SUBSTRATE AND MANUFACTURING METHOD THEREOF

FINFET AND GATE-ALL-AROUND FET WITH SELECTIVE HIGH-K OXIDE DEPOSITION

Metal Gates and Manufacturing Methods Thereof

FinFET Device and Method of Forming Same

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

WIRE GRID POLARIZER AND DISPLAY PANEL USING THE SAME

IMPRINT MOLD AND METHOD FOR MANUFACTURING THE SAME

FINFET DEVICE AND METHOD OF FORMING SAME

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF