Jen-Shiang Wang

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for improving a process for a patterning process
- Patent number 11,977,336
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Jen-Shiang Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for patterning process modelling
- Patent number 11,875,101
- Issue date Jan 16, 2024
- ASML Netherlands B.V.
- Jen-Shiang Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Etch bias characterization and method of using the same
- Patent number 11,675,274
- Issue date Jun 13, 2023
- ASML Netherlands B.V.
- Yongfa Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of tuning process models
- Patent number 11,614,690
- Issue date Mar 28, 2023
- ASML Netherlands B.V.
- Mu Feng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 11,580,274
- Issue date Feb 14, 2023
- ASML Netherlands B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for determining stochastic variation of printed patterns
- Patent number 11,567,413
- Issue date Jan 31, 2023
- ASML Netherlands B.V.
- Chang An Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selection of substrate measurement recipes
- Patent number 10,983,440
- Issue date Apr 20, 2021
- ASML Netherlands B.V.
- Jen-Shiang Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining process models by machine learning
- Patent number 10,948,831
- Issue date Mar 16, 2021
- ASML Netherlands B.V.
- Ya Luo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate measurement recipe configuration to improve device matching
- Patent number 10,691,029
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Ning Gu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process based metrology target design
- Patent number 10,296,681
- Issue date May 21, 2019
- ASML Netherlands B.V.
- Guangqing Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process based metrology target design
- Patent number 10,007,744
- Issue date Jun 26, 2018
- ASML Netherlands B.V.
- Guangqing Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus
- Patent number 9,903,823
- Issue date Feb 27, 2018
- ASML Netherlands B.V.
- Yen-Wen Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for design of a metrology target
- Patent number 9,804,504
- Issue date Oct 31, 2017
- ASML Netherlands B.V.
- Guangqing Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling a lithographic apparatus, device manufacturin...
- Patent number 9,696,635
- Issue date Jul 4, 2017
- ASML Netherlands B.V.
- Adrianus Fransiscus Petrus Engelen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for design of a metrology target
- Patent number 9,494,874
- Issue date Nov 15, 2016
- ASML Netherlands B.V.
- Guangqing Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for design of a metrology target
- Patent number 9,355,200
- Issue date May 31, 2016
- ASML Netherlands B.V.
- Guangqing Chen
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR CONVERTING METROLOGY DATA
- Publication number 20240377343
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Yunbo GUO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING ROUNDED CONTOURS FOR LITHOGRAPHY RELATED PATTERNS
- Publication number 20240272543
- Publication date Aug 15, 2024
- ASML NETHERLANDS B.V.
- Wen LYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCH BIAS CHARACTERIZATION AND METHOD OF USING THE SAME
- Publication number 20230314958
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- Yongfa FAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS, METHODS, AND PRODUCTS FOR DETERMINING PRINTING PROBABILITY...
- Publication number 20230244152
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Jen-Shiang WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
- Publication number 20230185990
- Publication date Jun 15, 2023
- ASML NETHERLANDS B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MACHINE LEARNING BASED IMAGE GENERATION FOR MODEL BASE ALIGNMENTS
- Publication number 20220404712
- Publication date Dec 22, 2022
- ASML NETHERLANDS B.V.
- Qiang ZHANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
UTILIZE MACHINE LEARNING IN SELECTING HIGH QUALITY AVERAGED SEM IMA...
- Publication number 20220351359
- Publication date Nov 3, 2022
- ASML NETHERLANDS B.V.
- Chen ZHANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS FOR IMPROVING PROCESS BASED CONTOUR INFORMATION OF STRUCTUR...
- Publication number 20220299881
- Publication date Sep 22, 2022
- ASML NETHERLANDS B.V.
- Yunan ZHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TRAINING MACHINE LEARNING MODEL FOR IMPROVING PATTERNING...
- Publication number 20220284344
- Publication date Sep 8, 2022
- ASML NETHERLANDS B.V.
- Ziyang MA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR PATTERNING PROCESS MODELLING
- Publication number 20220260921
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Jen-Shiang WANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING PATTERN IN A PATTERNING PROCESS
- Publication number 20220179321
- Publication date Jun 9, 2022
- ASML NETHERLANDS B.V.
- Ziyang MA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING STOCHASTIC VARIATION OF PRINTED PATTERNS
- Publication number 20220137514
- Publication date May 5, 2022
- ASML NETHERLANDS B.V.
- Chang An WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODELING POST-EXPOSURE PROCESSES
- Publication number 20210294218
- Publication date Sep 23, 2021
- ASML NETHERLANDS B.V.
- Yongfa FAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING PROCESS MODELS BY MACHINE LEARNING
- Publication number 20210271172
- Publication date Sep 2, 2021
- ASML NETHERLANDS B.V.
- Ya Luo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR IMPROVING A PROCESS FOR A PATTERNING PROCESS
- Publication number 20210208507
- Publication date Jul 8, 2021
- ASML NETHERLANDS B.V.
- Jen-Shiang WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING PROCESS MODELS BY MACHINE LEARNING
- Publication number 20200026196
- Publication date Jan 23, 2020
- ASML NETHERLANDE B.V.
- Ya LUO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS OF TUNING PROCESS MODELS
- Publication number 20190369498
- Publication date Dec 5, 2019
- ASML NETHERLANDS B.V.
- Mu FENG
- G05 - CONTROLLING REGULATING
Information Patent Application
ETCH BIAS CHARACTERIZATION AND METHOD OF USING THE SAME
- Publication number 20190354020
- Publication date Nov 21, 2019
- ASML NETHERLANDS B.V.
- Yongfa FAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTION OF SUBSTRATE MEASUREMENT RECIPES
- Publication number 20190258172
- Publication date Aug 22, 2019
- ASML NETHERLANDS B.V.
- Jen-Shiang WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE MEASUREMENT RECIPE CONFIGURATION TO IMPROVE DEVICE MATCHING
- Publication number 20190250519
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Ning GU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS BASED METROLOGY TARGET DESIGN
- Publication number 20180268093
- Publication date Sep 20, 2018
- ASML NETHERLANDS B.V.
- Guangqing CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
- Publication number 20180046737
- Publication date Feb 15, 2018
- ASML NETHERLANDS B.V.
- Lotte Marloes WILLEMS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET
- Publication number 20160252820
- Publication date Sep 1, 2016
- ASML NETHERLANDS B.V.
- Guangqing Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD AND APPARATUS
- Publication number 20160146740
- Publication date May 26, 2016
- ASML NETHERLANDS B.V.
- Yen-Wen Lu
- G01 - MEASURING TESTING
Information Patent Application
PROCESS BASED METROLOGY TARGET DESIGN
- Publication number 20160140267
- Publication date May 19, 2016
- ASML NETHERLANDS B.V.
- Guangqing CHEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET
- Publication number 20150186581
- Publication date Jul 2, 2015
- ASML NETHERLANDS B.V.
- Guangqing Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET
- Publication number 20150185626
- Publication date Jul 2, 2015
- ASML NETHERLANDS B.V.
- Guangqing CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURIN...
- Publication number 20120229786
- Publication date Sep 13, 2012
- ASML NETHERLANDS B.V.
- Adrianus Franciscus Petrus ENGELEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Jen-Shiang Wang

Person

Patents Grantslast 30 patents

Method for improving a process for a patterning process

Method for patterning process modelling

Etch bias characterization and method of using the same

Methods of tuning process models

Method and apparatus for inspection and metrology

Method for determining stochastic variation of printed patterns

Selection of substrate measurement recipes

Methods of determining process models by machine learning

Substrate measurement recipe configuration to improve device matching

Process based metrology target design

Process based metrology target design

Metrology method and apparatus

Method and apparatus for design of a metrology target

Method of controlling a lithographic apparatus, device manufacturin...

Method and apparatus for design of a metrology target

Method and apparatus for design of a metrology target

Patents Applicationslast 30 patents

METHOD FOR CONVERTING METROLOGY DATA

DETERMINING ROUNDED CONTOURS FOR LITHOGRAPHY RELATED PATTERNS

ETCH BIAS CHARACTERIZATION AND METHOD OF USING THE SAME

SYSTEMS, METHODS, AND PRODUCTS FOR DETERMINING PRINTING PROBABILITY...

METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

MACHINE LEARNING BASED IMAGE GENERATION FOR MODEL BASE ALIGNMENTS

UTILIZE MACHINE LEARNING IN SELECTING HIGH QUALITY AVERAGED SEM IMA...

METHODS FOR IMPROVING PROCESS BASED CONTOUR INFORMATION OF STRUCTUR...

METHOD FOR TRAINING MACHINE LEARNING MODEL FOR IMPROVING PATTERNING...

METHOD FOR PATTERNING PROCESS MODELLING

METHOD FOR DETERMINING PATTERN IN A PATTERNING PROCESS

METHOD FOR DETERMINING STOCHASTIC VARIATION OF PRINTED PATTERNS

MODELING POST-EXPOSURE PROCESSES

METHODS OF DETERMINING PROCESS MODELS BY MACHINE LEARNING

METHOD FOR IMPROVING A PROCESS FOR A PATTERNING PROCESS

METHODS OF DETERMINING PROCESS MODELS BY MACHINE LEARNING

METHODS OF TUNING PROCESS MODELS

ETCH BIAS CHARACTERIZATION AND METHOD OF USING THE SAME

SELECTION OF SUBSTRATE MEASUREMENT RECIPES

SUBSTRATE MEASUREMENT RECIPE CONFIGURATION TO IMPROVE DEVICE MATCHING

PROCESS BASED METROLOGY TARGET DESIGN

METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET

METROLOGY METHOD AND APPARATUS

PROCESS BASED METROLOGY TARGET DESIGN

METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET

METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET

METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURIN...