JENG-HORNG CHEN

Person

Hsin-Chu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Mitigating pattern collapse
- Patent number 11,961,761
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Chih-Yuan Ting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask cleaning
- Patent number 11,921,434
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle assembly and method for advanced lithography
- Patent number 11,914,286
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Amo Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask cleaning
- Patent number 11,740,563
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interconnect structure and method of forming the same
- Patent number 11,682,580
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jeng-Shiou Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography system with an embedded cleaning module
- Patent number 11,378,894
- Issue date Jul 5, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shang-Chieh Chien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle assembly and method for advanced lithography
- Patent number 11,294,274
- Issue date Apr 5, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Amo Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask cleaning
- Patent number 11,256,179
- Issue date Feb 22, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interconnect structure and method of forming the same
- Patent number 11,088,021
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jeng-Shiou Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to mitigate defect printability for ID pattern
- Patent number 11,086,227
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Cheng Lu
- G02 - OPTICS
Information Patent Grant
Mask with multilayer structure and manufacturing method by using th...
- Patent number 11,073,755
- Issue date Jul 27, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of preventing pattern collapse
- Patent number 11,043,453
- Issue date Jun 22, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Yuan Ting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High durability extreme ultraviolet photomask
- Patent number 11,003,069
- Issue date May 11, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hao Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interconnect structure and method of forming the same
- Patent number 10,985,054
- Issue date Apr 20, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jeng-Shiou Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for performing lithography process in semiconduct...
- Patent number 10,976,672
- Issue date Apr 13, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jui-Ching Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography system, device, and method for prin...
- Patent number 10,976,655
- Issue date Apr 13, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mitigating pattern collapse
- Patent number 10,950,495
- Issue date Mar 16, 2021
- Taiwan Semiconductor Manufacturing Company Limited
- Chih-Yuan Ting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated key pressing device having two key pressing modules and a...
- Patent number 10,871,506
- Issue date Dec 22, 2020
- Quanta Computer Inc.
- Jeng-Jiun Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pellicle for EUV mask and fabrication thereof
- Patent number 10,831,094
- Issue date Nov 10, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material composition and methods thereof
- Patent number 10,825,684
- Issue date Nov 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask with multilayer structure and manufacturing method by using th...
- Patent number 10,747,097
- Issue date Aug 18, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interconnect structure and method of forming the same
- Patent number 10,714,383
- Issue date Jul 14, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jeng-Shiou Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet lithography system, device, and method for prin...
- Patent number 10,691,014
- Issue date Jun 23, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to mitigate defect printability for ID pattern
- Patent number 10,684,552
- Issue date Jun 16, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Cheng Lu
- G02 - OPTICS
Information Patent Grant
Semiconductor integrated circuit fabrication with pattern-reversing...
- Patent number 10,685,846
- Issue date Jun 16, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Chin Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect structure and method of forming the same
- Patent number 10,679,895
- Issue date Jun 9, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jeng-Shiou Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High durability extreme ultraviolet photomask
- Patent number 10,642,148
- Issue date May 5, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hao Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle assembly and method for advanced lithography
- Patent number 10,534,256
- Issue date Jan 14, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Amo Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography system and method with optimized throughput and sta...
- Patent number 10,520,823
- Issue date Dec 31, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for EUV mask and fabrication thereof
- Patent number 10,520,806
- Issue date Dec 31, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MITIGATING PATTERN COLLAPSE
- Publication number 20240258163
- Publication date Aug 1, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Chih-Yuan Ting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask Cleaning
- Publication number 20230124211
- Publication date Apr 20, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pellicle Assembly and Method for Advanced Lithography
- Publication number 20220229360
- Publication date Jul 21, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- AMO CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask Cleaning
- Publication number 20220179326
- Publication date Jun 9, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Interconnect Structure and Method of Forming the Same
- Publication number 20210366766
- Publication date Nov 25, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jeng-Shiou Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MITIGATING PATTERN COLLAPSE
- Publication number 20210202306
- Publication date Jul 1, 2021
- Taiwan Semiconductor Manufacturing Company Limited
- Chih-Yuan Ting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTOMATED KEY PRESSING DEVICE HAVING TWO KEY PRESSING MODULES AND A...
- Publication number 20200401233
- Publication date Dec 24, 2020
- QUANTA COMPUTER INC.
- Jeng-Jiun Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mask with Multilayer Structure and Manufacturing Method by Using th...
- Publication number 20200379335
- Publication date Dec 3, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Interconnect Structure and Method of Forming the Same
- Publication number 20200343128
- Publication date Oct 29, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jeng-Shiou Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme Ultraviolet Lithography System, Device, and Method for Prin...
- Publication number 20200319545
- Publication date Oct 8, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method to Mitigate Defect Printability for ID Pattern
- Publication number 20200310250
- Publication date Oct 1, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- G02 - OPTICS
Information Patent Application
Interconnect Structure and Method of Forming the Same
- Publication number 20200286779
- Publication date Sep 10, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jeng-Shiou Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Durability Extreme Ultraviolet Photomask
- Publication number 20200264503
- Publication date Aug 20, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Chia-Hao Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pellicle Assembly and Method for Advanced Lithography
- Publication number 20200150527
- Publication date May 14, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- AMO CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Preventing Pattern Collapse
- Publication number 20200126913
- Publication date Apr 23, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Yuan Ting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithography System With An Embedded Cleaning Module
- Publication number 20200064747
- Publication date Feb 27, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shang-Chieh Chien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Cleaning
- Publication number 20200050118
- Publication date Feb 13, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shu-Hao Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pellicle for EUV Mask and Fabrication Thereof
- Publication number 20200050100
- Publication date Feb 13, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Interconnect Structure and Method of Forming the Same
- Publication number 20190326156
- Publication date Oct 24, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jeng-Shiou Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR PERFORMING LITHOGRAPHY PROCESS IN SEMICONDUCT...
- Publication number 20190250522
- Publication date Aug 15, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jui-Ching Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Lithography System and Method with Optimized Throughput and Sta...
- Publication number 20190121241
- Publication date Apr 25, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- YEN-CHENG LU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Lithography System, Device, and Method for Prin...
- Publication number 20190121228
- Publication date Apr 25, 2019
- Taiwan Semiconductor Manufacturing Co., LTD
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask with Multilayer Structure and Manufacturing Method by Using th...
- Publication number 20190113835
- Publication date Apr 18, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Interconnect Structure and Method of Forming the Same
- Publication number 20190067090
- Publication date Feb 28, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jeng-Shiou Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Durability Extreme Ultraviolet Photomask
- Publication number 20180373138
- Publication date Dec 27, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- CHIA-HAO YU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV MASK AND FABRICATION THEREOF
- Publication number 20180341174
- Publication date Nov 29, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MITIGATING PATTERN COLLAPSE
- Publication number 20180342418
- Publication date Nov 29, 2018
- Taiwan Semiconductor Manufacturing Company Limited
- Chih-Yuan Ting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithography Patterning with a Gas Phase Resist
- Publication number 20180314167
- Publication date Nov 1, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Shu-Hao Chang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Method to Mitigate Defect Printability for ID Pattern
- Publication number 20180253008
- Publication date Sep 6, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- G02 - OPTICS
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, DEVICE, AND METHOD FOR PRIN...
- Publication number 20180173089
- Publication date Jun 21, 2018
- Taiwan Semiconductor Manufacturing Co., LTD
- Yen-Cheng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

JENG-HORNG CHEN

Person

Patents Grantslast 30 patents

Mitigating pattern collapse

Mask cleaning

Pellicle assembly and method for advanced lithography

Mask cleaning

Interconnect structure and method of forming the same

Lithography system with an embedded cleaning module

Pellicle assembly and method for advanced lithography

Mask cleaning

Interconnect structure and method of forming the same

Method to mitigate defect printability for ID pattern

Mask with multilayer structure and manufacturing method by using th...

Method of preventing pattern collapse

High durability extreme ultraviolet photomask

Interconnect structure and method of forming the same

System and method for performing lithography process in semiconduct...

Extreme ultraviolet lithography system, device, and method for prin...

Mitigating pattern collapse

Automated key pressing device having two key pressing modules and a...

Pellicle for EUV mask and fabrication thereof

Material composition and methods thereof

Mask with multilayer structure and manufacturing method by using th...

Interconnect structure and method of forming the same

Extreme ultraviolet lithography system, device, and method for prin...

Method to mitigate defect printability for ID pattern

Semiconductor integrated circuit fabrication with pattern-reversing...

Interconnect structure and method of forming the same

High durability extreme ultraviolet photomask

Pellicle assembly and method for advanced lithography

EUV lithography system and method with optimized throughput and sta...

Pellicle for EUV mask and fabrication thereof

Patents Applicationslast 30 patents

MITIGATING PATTERN COLLAPSE

Mask Cleaning

Pellicle Assembly and Method for Advanced Lithography

Mask Cleaning

Interconnect Structure and Method of Forming the Same

MITIGATING PATTERN COLLAPSE

AUTOMATED KEY PRESSING DEVICE HAVING TWO KEY PRESSING MODULES AND A...

Mask with Multilayer Structure and Manufacturing Method by Using th...

Interconnect Structure and Method of Forming the Same

Extreme Ultraviolet Lithography System, Device, and Method for Prin...

Method to Mitigate Defect Printability for ID Pattern

Interconnect Structure and Method of Forming the Same

High Durability Extreme Ultraviolet Photomask

Pellicle Assembly and Method for Advanced Lithography

Method of Preventing Pattern Collapse

Lithography System With An Embedded Cleaning Module

Mask Cleaning

Pellicle for EUV Mask and Fabrication Thereof

Interconnect Structure and Method of Forming the Same

SYSTEM AND METHOD FOR PERFORMING LITHOGRAPHY PROCESS IN SEMICONDUCT...

EUV Lithography System and Method with Optimized Throughput and Sta...

Extreme Ultraviolet Lithography System, Device, and Method for Prin...

Mask with Multilayer Structure and Manufacturing Method by Using th...

Interconnect Structure and Method of Forming the Same

High Durability Extreme Ultraviolet Photomask

PELLICLE FOR EUV MASK AND FABRICATION THEREOF

MITIGATING PATTERN COLLAPSE

Lithography Patterning with a Gas Phase Resist

Method to Mitigate Defect Printability for ID Pattern

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, DEVICE, AND METHOD FOR PRIN...