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Jennifer Shan
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San Jose, CA, US
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last 30 patents
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Patent Application
Doped Tantalum Nitride for Copper Barrier Applications
Publication number
20130140698
Publication date
Jun 6, 2013
Annamalai Lakshmanan
H01 - BASIC ELECTRIC ELEMENTS
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Patent Application
Method Of Processing Low K Dielectric Films
Publication number
20120122320
Publication date
May 17, 2012
Applied Materials, Inc.
Annamalai Lakshmanan
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...